METHOD FOR PRODUCING THIN LAYERS AND CORRESPONDING LAYER
    4.
    发明申请
    METHOD FOR PRODUCING THIN LAYERS AND CORRESPONDING LAYER 审中-公开
    生产薄层和相应层的方法

    公开(公告)号:US20100173167A1

    公开(公告)日:2010-07-08

    申请号:US12598087

    申请日:2008-04-30

    IPC分类号: B32B27/28 C08F2/48 C08F2/46

    摘要: The invention relates to a coating method comprising the following steps a) providing a mixture or a pure substance comprising or consisting of inactive, liquid precursors, b) applying a liquid layer made up of the mixture or the pure substance to a surface to be coated, c) crosslinking the liquid precursors by means of radiation having a wavelength of ≦250 nm, so that a solid layer is produced from the mixture and the layer comprises ≧10 atomic % of C, based on the quantity of the atoms contained in the layer without H and F, and so that the C contained in the layer is at most 50 atomic % of the C, based on the quantity of the C atoms contained in the layer, constituent of a methoxy group. The invention further relates to layers which can be produced or are generated by means of this method and the uses thereof and also to corresponding coated items and the uses thereof.

    摘要翻译: 本发明涉及一种包括以下步骤的涂覆方法:a)提供包含或由无活性的液体前体组成的混合物或纯物质,b)将由混合物或纯物质组成的液体层施加到待涂覆的表面 ,c)通过波长为≦̸ 250nm的辐射使液体前体交联,使得从混合物产生固体层,并且该层包含≥10原子%的C,基于包含在 不含H和F的层,并且使得包含在该层中的C为基于层中所含的C原子数量为至多50原子%的甲氧基的组分。 本发明还涉及可以通过该方法及其用途以及相应的涂覆物品及其用途产生或产生的层。

    SCRATCH-RESISTANT AND EXPANDABLE CORROSION PREVENTION LAYER FOR LIGHT METAL SUBSTRATES
    6.
    发明申请
    SCRATCH-RESISTANT AND EXPANDABLE CORROSION PREVENTION LAYER FOR LIGHT METAL SUBSTRATES 审中-公开
    轻金属基材的防切割和可扩展防腐层

    公开(公告)号:US20120003483A1

    公开(公告)日:2012-01-05

    申请号:US12740022

    申请日:2008-10-31

    摘要: The present invention relates to a method for coating the surface of a light metal substrate, including the following steps: A. preparing the light metal substrate and optionally cleaning the substrate surface to be coated, B. coating the substrate surface optionally cleaned in step A in a plasma polymerization reactor by means of plasma polymerization, wherein one or more organosilicon and also (a) no further or (b) further compounds are used in step B as the precursor(s) for the plasma and in step B the light metal substrate is arranged in the plasma polymerization reactor in such a way that it (i) is located between the zone in which the plasma is formed and the cathode or (ii) acts as a cathode, characterized in that the method is conducted in such a way that the coating produced by the method displays a carbon content, which can be determined by XPS measurement, of from 5 to 20 atom %, preferably 10 to 15 atom %, based on the total number of carbon, silicon and oxygen atoms contained in the coating, a yellow index, determined in accordance with ASTM D 1925, of ≦3, preferably ≦2.5 and a hardness, to be measured by means of nanoindentation, in the range of from 2.5 to 6 GPa, preferably 3.1 to 6 GPa.

    摘要翻译: 本发明涉及一种涂覆轻金属基材表面的方法,包括以下步骤:A.制备轻金属基材并任选地清洗待涂布的基材表面; B.涂​​覆步骤A中任选地清洁的基材表面 在等离子体聚合反应器中,其中一个或多个有机硅和(a)在步骤B中不再使用(b)另外的化合物作为等离子体的前体,在步骤B中,轻金属 衬底被布置在等离子体聚合反应器中,使得其(i)位于形成等离子体的区域和阴极之间,或(ii)用作阴极,其特征在于,该方法以这样的方式进行 通过该方法制备的涂层以基于碳,硅和氧原子总数的总数显示出5至20原子%,优选10至15原子%的可通过XPS测量确定的碳含量的方法 固定在涂层中,根据ASTM D 1925测定的黄色指数为n1E,3,优选为n1E,2.5,通过纳米压痕测量的硬度为2.5至6GPa,优选为3.1 至6 GPa。

    SEALING ARTICLE
    9.
    发明申请
    SEALING ARTICLE 审中-公开
    密封文章

    公开(公告)号:US20110148050A1

    公开(公告)日:2011-06-23

    申请号:US12997974

    申请日:2009-06-18

    IPC分类号: F16J15/02 C23C16/50 C23C16/56

    摘要: The present invention relates to a sealing article comprising an elastomeric and/or polymeric substrate and a plasma polymeric coating arranged thereon and consisting of carbon, silicon, oxygen, hydrogen and (i) fluorine or (ii) no fluorine and optionally usual impurities, the following relationships applying to the substance amount ratios in the plasma polymeric coating: 1.3:1≦n(O):n(Si)≦3.0:1 0.3:1≦n(C):n(Si)≦5.0:1 and preferably 0.5:1≦(n(H)+n(F)):n(C)≦3.0:1.

    摘要翻译: 本发明涉及一种密封制品,其包括弹性体和/或聚合物基质和其上布置有由碳,硅,氧,氢和(i)氟或(ii)不含氟和任选通常的杂质组成的等离子体聚合物涂层, 以下关系适用于等离子体聚合物涂层中的物质量比:1.3:1≦̸ n(O):n(Si)≦̸ 3.0:1 0.3:1≦̸ n(C):n(Si)≦̸ 5.0:1 优选为0.5:1≦̸(n(H)+ n(F)):n(C)≦̸ 3.0:1。

    Metal substrate with a corrosion-resistant coating produced by means of plasma polymerization
    10.
    发明授权
    Metal substrate with a corrosion-resistant coating produced by means of plasma polymerization 失效
    具有通过等离子体聚合法生产的耐腐蚀涂层的金属基材

    公开(公告)号:US06528170B2

    公开(公告)日:2003-03-04

    申请号:US09859200

    申请日:2001-05-16

    IPC分类号: B32B904

    摘要: The invention relates to a metal substrate with a corrosion-resistant coating produced by means of plasma polymerization, wherein the substrate is subjected to mechanical, chemical and/or electrochemical smoothing in a pre-treatment step and is subsequently exposed to a plasma at a temperature of less than 200° C. and at a pressure of 10−5 bis 100 mbars, whereby in a first step the surface is activated in a reducing plasma and in a second step the polymer is separated from a plasma containing at least one hydrocarbon or silico-organic compound which can be vaporized in plasma conditions, optionally contains oxygen, nitrogen or sulphur and can contain fluorine.

    摘要翻译: 本发明涉及具有通过等离子体聚合制备的耐腐蚀涂层的金属基材,其中基材在预处理步骤中经受机械,化学和/或电化学平滑化,随后在温度下暴露于等离子体 小于200℃,压力为10-5双100mbar,由此在第一步骤中,表面在还原性等离子体中活化,在第二步骤中,将聚合物与含有至少一种烃的等离子体或 可以在等离子体条件下汽化的硅 - 有机化合物,任选地含有氧,氮或硫并且可以含氟。