公开(公告)号：US09540230B2

公开(公告)日：2017-01-10

申请号：US13535180

申请日：2012-06-27

申请人： Michael Daneman ,  Martin Lim ,  Kegang Huang ,  Igor Tchertkov

发明人： Michael Daneman ,  Martin Lim ,  Kegang Huang ,  Igor Tchertkov

IPC分类号： H01L23/02 ,  H01L21/54 ,  H01L29/84 ,  B81B7/02 ,  B81C1/00

CPC分类号： B81B7/02 ,  B81C1/0023 ,  B81C1/00293 ,  B81C2203/0145 ,  B81C2203/019

摘要： A Microelectromechanical systems (MEMS) structure comprises a MEMS wafer. A MEMS wafer includes a handle wafer with cavities bonded to a device wafer through a dielectric layer disposed between the handle and device wafers. The MEMS wafer also includes a moveable portion of the device wafer suspended over a cavity in the handle wafer. Four methods are described to create two or more enclosures having multiple gas pressure or compositions on a single substrate including, each enclosure containing a moveable portion. The methods include: A. Forming a secondary sealed enclosure, B. Creating multiple ambient enclosures during wafer bonding, C. Creating and breaching an internal gas reservoir, and D. Forming and subsequently sealing a controlled leak/breach into the enclosure.

摘要翻译： 微机电系统（MEMS）结构包括MEMS晶片。 MEMS晶片包括具有通过布置在手柄和器件晶片之间的电介质层与器件晶片结合的空腔的手柄晶片。 MEMS晶片还包括悬挂在处理晶片中的空腔上的器件晶片的可移动部分。 描述了四种方法以在单个基底上产生具有多个气体压力或组成的两个或更多个外壳，包括每个外壳包含可移动部分。 方法包括：A.形成二次密封外壳，B.在晶片接合期间创建多个环境外壳，C.创建和破坏内部气体储存器，以及D.形成并随后将受控的泄漏/泄漏密封到外壳中。

公开(公告)号：US08350346B1

公开(公告)日：2013-01-08

申请号：US13541306

申请日：2012-07-03

申请人： Kegang Huang ,  Martin Lim ,  Steven S. Nasiri

发明人： Kegang Huang ,  Martin Lim ,  Steven S. Nasiri

IPC分类号： H01L29/84

CPC分类号： B81B3/0051 ,  B81B7/02 ,  B81B2201/025 ,  B81B2201/0271 ,  B81C1/00293 ,  H01L29/0657

摘要： An integrated MEMS device comprises a wafer where the wafer contains two or more cavities of different depths. The MEMS device includes one movable structure within a first cavity of a first depth and a second movable structure within a second cavity of a second depth. The cavities are sealed to maintain different pressures for the different movable structures for optimal operation. MEMS stops can be formed in the same multiple cavity depth processing flow. The MEMS device can be integrated with a CMOS wafer.

公开(公告)号：US20070128771A1

公开(公告)日：2007-06-07

申请号：US11670362

申请日：2007-02-01

申请人： Xiao Yang ,  Dongmin Chen ,  Kegang Huang

发明人： Xiao Yang ,  Dongmin Chen ,  Kegang Huang

IPC分类号： H01L21/00

CPC分类号： G02B26/0841

摘要： A method of fabricating an integrated spatial light modulator. The method includes providing a first substrate including a bonding surface and processing a device substrate to form at least an electrode layer. The method also includes depositing a first portion of a multi-layer standoff layer on the electrode layer, depositing a second portion of the multi-layer standoff layer on the first portion of the multi-layer standoff layer, and forming electrically insulating standoff structures from the multi-layer standoff layer. The method further includes joining the bonding surface of the first substrate to the standoff structures on the device substrate, thinning the first substrate, patterning the first substrate to form a mask, and forming a plurality of moveable structures from the first substrate. The moveable structures are aligned with at least one of the plurality of electrodes and adapted to rotate with respect to the standoff structures.

摘要翻译： 一种制造集成空间光调制器的方法。 该方法包括提供包括接合表面的第一基底和处理器件基底以形成至少一个电极层。 该方法还包括在电极层上沉积多层间隔层的第一部分，在多层间隔层的第一部分上沉积多层间隔层的第二部分，并且形成电绝缘的支架结构 多层间隔层。 该方法还包括将第一衬底的接合表面连接到器件衬底上的间隔结构，使第一衬底变薄，图案化第一衬底以形成掩模，以及从第一衬底形成多个可移动结构。 可移动结构与多个电极中的至少一个对准，并适于相对于间隔结构旋转。

公开(公告)号：US06794311B2

公开(公告)日：2004-09-21

申请号：US09902518

申请日：2001-07-10

申请人： Kegang Huang ,  Judy H Huang ,  Ping Xu

发明人： Kegang Huang ,  Judy H Huang ,  Ping Xu

IPC分类号： H01L2131

CPC分类号： C23C16/325 ,  C23C16/56 ,  H01L21/3105 ,  H01L21/314 ,  H01L21/318 ,  H01L21/3185 ,  H01L21/76826 ,  H01L21/76828 ,  H01L21/76829 ,  H01L21/76832 ,  Y10S438/931

摘要： Methods and apparatus for depositing low dielectric constant layers that are resistant to oxygen diffusion and have low oxygen contents are provided. The layers may be formed by exposing a low dielectric constant layer to a plasma of an inert gas to densify the low dielectric constant layer, by exposing the low dielectric constant layer to a nitrating plasma to form a passivating nitride surface on the layer, or by depositing a thin passivating layer on the low dielectric constant layer to reduce oxygen diffusion therein. The low dielectric constant layer may be deposited and treated in situ.

摘要翻译： 提供了用于沉积耐氧扩散和氧含量低的低介电常数层的方法和装置。 可以通过将低介电常数层暴露于惰性气体的等离子体来致密化低介电常数层，通过将低介电常数层暴露于硝化等离子体以在层上形成钝化氮化物表面，或通过 在低介电常数层上沉积薄钝化层以减少其中的氧扩散。 低介电常数层可以原位沉积和处理。

公开(公告)号：USD451936S1

公开(公告)日：2001-12-11

申请号：US29137877

申请日：2001-03-02

申请人： Jian Ma ,  Biao Li ,  Qiang Xu ,  Kegang Huang

设计人： Jian Ma ,  Biao Li ,  Qiang Xu ,  Kegang Huang

公开(公告)号：US07670880B2

公开(公告)日：2010-03-02

申请号：US11670362

申请日：2007-02-01

申请人： Xiao Yang ,  Dongmin Chen ,  Kegang Huang

发明人： Xiao Yang ,  Dongmin Chen ,  Kegang Huang

IPC分类号： H01L21/00

CPC分类号： G02B26/0841

摘要： A method of fabricating an integrated spatial light modulator. The method includes providing a first substrate including a bonding surface and processing a device substrate to form at least an electrode layer. The method also includes depositing a first portion of a multi-layer standoff layer on the electrode layer, depositing a second portion of the multi-layer standoff layer on the first portion of the multi-layer standoff layer, and forming electrically insulating standoff structures from the multi-layer standoff layer. The method further includes joining the bonding surface of the first substrate to the standoff structures on the device substrate, thinning the first substrate, patterning the first substrate to form a mask, and forming a plurality of moveable structures from the first substrate. The moveable structures are aligned with at least one of the plurality of electrodes and adapted to rotate with respect to the standoff structures.

摘要翻译： 一种制造集成空间光调制器的方法。 该方法包括提供包括接合表面的第一基底和处理器件基底以形成至少一个电极层。 该方法还包括在电极层上沉积多层间隔层的第一部分，在多层间隔层的第一部分上沉积多层间隔层的第二部分，并且形成电绝缘的支架结构 多层间隔层。 该方法还包括将第一衬底的接合表面连接到器件衬底上的间隔结构，使第一衬底变薄，图案化第一衬底以形成掩模，以及从第一衬底形成多个可移动结构。 可移动结构与多个电极中的至少一个对准，并适于相对于间隔结构旋转。

公开(公告)号：US07666319B1

公开(公告)日：2010-02-23

申请号：US11264898

申请日：2005-11-01

申请人： Kegang Huang

发明人： Kegang Huang

IPC分类号： C23F1/00

CPC分类号： G02B26/0841 ,  B81B2201/042 ,  B81B2203/0109 ,  B81C1/00484

摘要： A spatial light modulator structure is fabricated by forming moveable reflecting elements through plasma etching of silicon in a chlorine ambient. In accordance with one particular embodiment, a mirror comprising single crystal silicon is released from the surrounding material by plasma etching in an ambient including chlorine (Cl2), sulfur hexafluoride (SF6), and boron trichloride (BCl3). Cl2 serves as a source of reactive chlorine etching species for the plasma. SF6 provides a source of fluorine, a reactive species enhancing the rate of etching single crystal silicon. BCl3 provides boron, which becomes incorporated on the surface of the etched single crystal silicon as a passivation layer controlling etch profile. Plasma etching of the single crystal silicon to release the mirrors takes place in the absence of oxygen, in order to avoid unwanted formation of silicon oxide residue that can adversely affect mechanical and optical properties of the resulting device.

摘要翻译： 通过在氯气氛中通过等离子体蚀刻硅来形成可移动反射元件来制造空间光调制器结构。 根据一个特定实施例，包括单晶硅的反射镜通过在包括氯（Cl 2），六氟化硫（SF 6）和三氯化硼（BCl 3）的环境中的等离子体蚀刻从周围材料释放。 Cl2用作等离子体的反应性氯蚀刻物质的来源。 SF6提供氟源，一种提高单晶硅蚀刻速率的反应性物质。 BCl 3提供硼，其被掺入蚀刻的单晶硅的表面上作为控制蚀刻轮廓的钝化层。 在不存在氧的情况下，单晶硅的等离子体蚀刻以释放反射镜，以避免不期望地形成可能不利地影响所得器件的机械和光学性质的氧化硅残余物。

公开(公告)号：US20080192325A1

公开(公告)日：2008-08-14

申请号：US12110209

申请日：2008-04-25

申请人： Kegang Huang ,  Xiao Yang ,  Dongmin Chen

发明人： Kegang Huang ,  Xiao Yang ,  Dongmin Chen

IPC分类号： G02B26/08

CPC分类号： G02B26/0841

摘要： The contrast offered by a spatial light modulator device may be enhanced by positioning nonreflective elements such as supporting posts and moveable hinges, behind the reflecting surface of the pixel. In accordance with one embodiment, the reflecting surface is suspended over and underlying hinge-containing layer by integral ribs of the reflecting material defined by gaps in a sacrificial layer. In accordance with an alternative embodiment, the reflecting surface is separated from the underlying hinge by a gap formed in an intervening layer, such as oxide. In either embodiment, walls separating adjacent pixel regions may be recessed beneath the reflecting surface to further reduce unwanted scattering of incident light and thereby enhance contrast.

摘要翻译： 通过在像素的反射表面之后定位非反射元件（例如支撑柱和可移动铰链）可以增强由空间光调制器装置提供的对比度。 根据一个实施例，反射表面通过由牺牲层中的间隙限定的反射材料的整体肋悬挂在铰链包含层的下面和下面。 根据替代实施例，反射表面通过形成在中间层（例如氧化物）中的间隙与下面的铰链分离。 在任一实施例中，分离相邻像素区域的壁可以凹陷在反射表面下方，以进一步减少入射光的不期望的散射，从而增强对比度。

公开(公告)号：US07911678B2

公开(公告)日：2011-03-22

申请号：US12344172

申请日：2008-12-24

申请人： Kegang Huang

发明人： Kegang Huang

IPC分类号： G02B26/00 ,  G02F1/29

CPC分类号： G02B26/0841

摘要： A reflective spatial light modulator device features two pairs of electrodes formed on different metallization layers. Elevation of the upper electrode pair reduces its distance from the overlying reflecting surface, thereby requiring a smaller applied voltage to generate an equivalent electrostatic attractive force for altering or maintaining physical orientation of the reflecting surface relative to incident light. In one embodiment, the reduced distance between the electrode and reflecting surface allows operation at lower voltages, reducing the possibility of breakdown and avoiding the need for complex device designs to eliminate such breakdown. In another embodiment, the reduced distance between the electrode and the reflecting surface allows the use of stiffer hinges for the reflecting surface, thereby increasing the speed of device operation. Other embodiments can employ both reduced voltage operation and the use of stiffer hinge structures.

摘要翻译： 反射空间光调制器器件具有形成在不同金属化层上的两对电极。 上电极对的高度减小其与上覆反射表面的距离，从而需要较小的施加电压以产生相对于入射光改变或维持反射表面的物理取向的等效静电吸引力。 在一个实施例中，电极和反射表面之间的距离减小允许在较低电压下操作，降低了击穿的可能性，并避免了复杂的器件设计以消除这种击穿的需要。 在另一个实施例中，电极和反射表面之间的距离减小允许使用较硬的铰链用于反射表面，从而增加了设备操作的速度。 其他实施例可以采用降低电压操作和使用更僵硬的铰链结构。

公开(公告)号：US07477440B1

公开(公告)日：2009-01-13

申请号：US11400299

申请日：2006-04-06

申请人： Kegang Huang

发明人： Kegang Huang

IPC分类号： G02B26/00 ,  G02B26/08

CPC分类号： G02B26/0841

摘要： A reflective spatial light modulator device features two pairs of electrodes formed on different metallization layers. Elevation of the upper electrode pair reduces its distance from the overlying reflecting surface, thereby requiring a smaller applied voltage to generate an equivalent electrostatic attractive force for altering or maintaining physical orientation of the reflecting surface relative to incident light. In one embodiment, the reduced distance between the electrode and reflecting surface allows operation at lower voltages, reducing the possibility of breakdown and avoiding the need for complex device designs to eliminate such breakdown. In another embodiment, the reduced distance between the electrode and the reflecting surface allows the use of stiffer hinges for the reflecting surface, thereby increasing the speed of device operation. Other embodiments can employ both reduced voltage operation and the use of stiffer hinge structures.

摘要翻译： 反射空间光调制器器件具有形成在不同金属化层上的两对电极。 上电极对的高度减小其与上覆反射表面的距离，从而需要较小的施加电压以产生相对于入射光改变或维持反射表面的物理取向的等效静电吸引力。 在一个实施例中，电极和反射表面之间的距离减小允许在较低电压下操作，降低了击穿的可能性，并避免了复杂的器件设计以消除这种击穿的需要。 在另一个实施例中，电极和反射表面之间的距离减小允许使用较硬的铰链用于反射表面，从而增加了设备操作的速度。 其他实施例可以采用降低电压操作和使用更僵硬的铰链结构。