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    MAGNETRON SPUTTERING GUN ASSEMBLY
    1.
    发明申请
    MAGNETRON SPUTTERING GUN ASSEMBLY 审中-公开
    MAGNETRON喷射枪组件

    公开(公告)号：US20160025871A1

    公开(公告)日：2016-01-28

    申请号：US14341885

    申请日：2014-07-28

    Applicant: National Applied Research Laboratories

    Inventor： Bo-Huei Liao ,  Chien-Nan Hsiao

    IPC: G01T1/36 ,  H01J37/34

    CPC classification number: H01J37/3405 ,  C23C14/3407 ,  G01T1/2018

    Abstract: A magnetron sputtering gun device used in vacuum for sputtering to form a thin film, which comprises a magnet copper seat, a magnetic element, a conductive element, a sputtering target, a target fixation assembly, a cylinder-shape protection mask, and a sputtering inclination assembly. By enhancing the magnet copper seat, the magnetron sputtering gun device is equipped with capability of increased film coating speed and increased compound ability between the thin film and the reaction gas. A ferromagnetic material may be coated. The magnet copper seat may be designed so that the sputtering target and strong magnets therewithin may be conveniently detached. In this structure, a cooling water tubing and the strong magnets are separated, lengthening a lifetime of the strong magnets and protecting the strong magnets from demagnetization. The sputtering inclination assembly may further increase a uniformity of the thin film thickness.

    Abstract translation: 用于溅射以形成薄膜的真空中的磁控溅射枪装置，其包括磁体铜座，磁性元件，导电元件，溅射靶，靶固定组件，圆柱形保护掩模和溅射 倾斜装配 通过增强磁体铜座，磁控溅射枪装置具有提高薄膜涂布速度和增加薄膜与反应气体之间复合能力的能力。 可以涂覆铁磁材料。 可以设计磁体铜座，使得其中的溅射靶和强磁体可以方便地分离。 在这种结构中，分离冷却水管和强磁体，延长强磁体的寿命并保护强磁体免于退磁。 溅射倾斜组件可以进一步增加薄膜厚度的均匀性。

    ENCLOSED-CHANNEL REACTOR METHOD TO MANUFACTURE CATALYSTS OR SUPPORT MATERIALS
    3.
    发明申请
    ENCLOSED-CHANNEL REACTOR METHOD TO MANUFACTURE CATALYSTS OR SUPPORT MATERIALS 审中-公开
    用于制造催化剂或支持材料的封闭式通道反应器

    公开(公告)号：US20160256863A1

    公开(公告)日：2016-09-08

    申请号：US15156916

    申请日：2016-05-17

    Applicant: National Applied Research Laboratories

    Inventor： Chi-Chung Kei ,  Bo-Heng Liu ,  Chien-Pao Lin ,  Chien-Nan Hsiao ,  Yang-Chih Hsueh ,  Tsong-Pyng Perng

    IPC: B01J37/02 ,  B01J35/04

    CPC classification number: B01J37/024 ,  B01J23/14 ,  B01J23/38 ,  B01J23/42 ,  B01J23/462 ,  B01J23/50 ,  B01J23/74 ,  B01J35/04 ,  B01J37/0201 ,  B01J37/0228 ,  B01J37/0244 ,  H01M4/9016 ,  H01M4/92

    Abstract: The present invention provides methods and designs of enclosed-channel reactor system for manufacturing catalysts or supports. Both of the configuration designs force the gaseous precursors and purge gas flow through the channel surface of reactor. The precursors will transform to thin film or particle catalysts or supports under adequate reaction temperature, working pressure and gas concentration. The reactor body is either sealed or enclosed for isolation from atmosphere. Another method using super ALD cycles is also proposed to grow alloy catalysts or supports with controllable concentration. The catalysts prepared by the method and system in the present invention are noble metals, such as platinum, palladium, rhodium, ruthenium, iridium and osmium, or transition metals such as iron, silver, cobalt, nickel and tin, while supports are silicon oxide, aluminum oxide, zirconium oxide, cerium oxide or magnesium oxide, or refractory metals, which can be chromium, molybdenum, tungsten or tantalum.

    Abstract translation: 本发明提供用于制造催化剂或载体的封闭通道反应器系统的方法和设计。 两种配置设计都迫使气态前体和吹扫气体流过反应器的通道表面。 前体将在足够的反应温度，工作压力和气体浓度下转化为薄膜或颗粒催化剂或载体。 反应器主体被密封或封闭以与大气隔离。 还提出使用超级ALD循环的另一种方法来生长具有可控浓度的合金催化剂或载体。 通过本发明的方法和系统制备的催化剂是贵金属，例如铂，钯，铑，钌，铱和锇，或过渡金属如铁，银，钴，镍和锡，而载体是氧化硅 ，氧化铝，氧化锆，氧化铈或氧化镁，或可以是铬，钼，钨或钽的难熔金属。

    In Situ Manufacturing Process Monitoring System of Extreme Smooth Thin Film and Method Thereof
    4.
    发明申请
    In Situ Manufacturing Process Monitoring System of Extreme Smooth Thin Film and Method Thereof 审中-公开
    极光滑膜薄膜原位制造工艺监控系统及方法

    公开(公告)号：US20130256262A1

    公开(公告)日：2013-10-03

    申请号：US13663230

    申请日：2012-10-29

    Applicant: NATIONAL APPLIED RESEARCH LABORATORIES

    Inventor： Chien-Nan Hsiao ,  Po-Kai Chiu ,  Da-Ren Liu ,  James Su ,  Fong-Zhi Chen

    IPC: B05D3/10

    CPC classification number: G01B11/0683 ,  C23C14/221 ,  C23C14/547 ,  C23C14/5873 ,  C23C14/5893 ,  C23C16/45591 ,  H01L22/12 ,  H01L22/26

    Abstract: An in situ manufacturing process monitoring system of extreme smooth thin film and method thereof, comprising a coating device for coating a thin film on at least one substrate during a coating process, an ion figuring device for processing a surface polishing process on the thin film, a control device electrically coupled to the coating device and the ion figuring device respectively for controlling the coating device and the ion figuring device processing the coating process and surface polishing process by adjusting at least one device parameter of the coating device and the ion figuring device, and an in situ monitoring device electrically coupled to the control device for in situ monitoring at least one optical parameter of the thin film.

    Abstract translation: 一种极端光滑薄膜的原位制造工艺监控系统及其方法，包括在涂覆过程中在至少一个基底上涂覆薄膜的涂层装置，用于处理薄膜上的表面抛光工艺的离子计数装置， 电耦合到涂覆装置和离子计数装置的控制装置，分别用于通过调节涂覆装置和离子计数装置的至少一个装置参数来控制涂覆装置和离子计数装置处理涂布过程和表面抛光工艺， 以及电耦合到控制装置的原位监测装置，用于原位监测薄膜的至少一个光学参数。

    ENCLOSED-CHANNEL REACTOR SYSTEM AND METHOD TO MANUFACTURE CATALYSTS OR SUPPORT
    7.
    发明申请
    ENCLOSED-CHANNEL REACTOR SYSTEM AND METHOD TO MANUFACTURE CATALYSTS OR SUPPORT 有权
    封装的通道反应器系统和制造催化剂或支持的方法

    公开(公告)号：US20140140904A1

    公开(公告)日：2014-05-22

    申请号：US13948499

    申请日：2013-07-23

    Applicant: National Applied Research Laboratories

    Inventor： Chi-Chung Kei ,  Bo-Heng Liu ,  Chien-Pao Lin ,  Chien-Nan Hsiao ,  Yang-Chih Hsueh ,  Tsong-Pyng Perng

    IPC: B01J35/04 ,  B01J37/02

    CPC classification number: B01J37/024 ,  B01J23/14 ,  B01J23/38 ,  B01J23/42 ,  B01J23/462 ,  B01J23/50 ,  B01J23/74 ,  B01J35/04 ,  B01J37/0201 ,  B01J37/0228 ,  B01J37/0244 ,  H01M4/9016 ,  H01M4/92

    Abstract: The present invention provides methods and designs of enclosed-channel reactor system for manufacturing catalysts or supports. Both of the configuration designs force the gaseous precursors and purge gas flow through the channel surface of reactor. The precursors will transform to thin film or particle catalysts or supports under adequate reaction temperature, working pressure and gas concentration. The reactor body is either sealed or enclosed for isolation from atmosphere. Another method using super ALD cycles is also proposed to grow alloy catalysts or supports with controllable concentration. The catalysts prepared by the method and system in the present invention are noble metals, such as platinum, palladium, rhodium, ruthenium, iridium and osmium, or transition metals such as iron, silver, cobalt, nickel and tin, while supports are silicon oxide, aluminum oxide, zirconium oxide, cerium oxide or magnesium oxide, or refractory metals, which can be chromium, molybdenum, tungsten or tantalum.

    Abstract translation: 本发明提供用于制造催化剂或载体的封闭通道反应器系统的方法和设计。 两种配置设计都迫使气态前体和吹扫气体流过反应器的通道表面。 前体将在足够的反应温度，工作压力和气体浓度下转化为薄膜或颗粒催化剂或载体。 反应器主体被密封或封闭以与大气隔离。 还提出使用超级ALD循环的另一种方法来生长具有可控浓度的合金催化剂或载体。 通过本发明的方法和系统制备的催化剂是贵金属，例如铂，钯，铑，钌，铱和锇，或过渡金属如铁，银，钴，镍和锡，而载体是氧化硅 ，氧化铝，氧化锆，氧化铈或氧化镁，或可以是铬，钼，钨或钽的难熔金属。

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