METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

    公开(公告)号:US20170373234A1

    公开(公告)日:2017-12-28

    申请号:US15632513

    申请日:2017-06-26

    Inventor: Yoshiharu NAGAE

    Abstract: A method of manufacturing at least one semiconductor device includes: providing a substrate having a flat lower surface, and an upper surface that allows mounting of at least one semiconductor element or an upper surface having at least one semiconductor mounted thereon; providing a work table having a support plate with a flat support surface for placing the substrate, and having a plurality of support pins arranged at a support surface side and configured to move along an up-and-down direction; abutting the lower surface of the substrate upon tip portions of the plurality of support pins to press down so that the lower surface of the substrate abuts upon the support surface of the support plate; and fixing the substrate on the support plate and performing one or more operations on the substrate.

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