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公开(公告)号：US07270932B2
公开(公告)日：2007-09-18
申请号：US10773990
申请日：2004-02-06
CPC分类号： G03C1/73 , G03C1/732 , Y10S430/127 , Y10S430/163
摘要： Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be used in methods of marking.
摘要翻译： 公开了使用组合物的成像组合物和方法。 成像组合物对低水平的能量敏感，使得当施加低水平的能量时，组合物改变颜色或阴影。 组合物可用于标记方法。
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公开(公告)号：US08053160B2
公开(公告)日：2011-11-08
申请号：US11180184
申请日：2005-07-13
IPC分类号： G03C1/00
摘要： An imaging composition, article and method of imaging are disclosed. The imaging composition is energy sensitive such that upon application of a sufficient amount of energy to the composition a color or shade change is affected. The imaging composition is coated on an article to form an energy sensitive article, which may be used in marking work pieces.
摘要翻译： 公开了成像组合物，制品和成像方法。 成像组合物是能量敏感的，使得当对组合物施加足够量的能量时，颜色或阴影变化受到影响。 将成像组合物涂覆在制品上以形成可用于标记工件的能量敏感物品。
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公开(公告)号：US07615335B2
公开(公告)日：2009-11-10
申请号：US11378919
申请日：2006-03-17
IPC分类号： G03C1/00
CPC分类号： G03C1/73 , G03C1/732 , Y10S430/146 , Y10S430/155
摘要： An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
摘要翻译： 公开了一种成像方法。 将成像组合物涂覆在工件上，然后从3-D成像系统施加足够量的能量以在涂覆的工件上形成图像。 图像可以是用于对准部件的标志或标记。
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公开(公告)号：US08048606B2
公开(公告)日：2011-11-01
申请号：US11378933
申请日：2006-03-17
CPC分类号： G03C1/73 , G03C1/732 , Y10S430/146 , Y10S430/155
摘要： An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
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公开(公告)号：US07977026B2
公开(公告)日：2011-07-12
申请号：US10773989
申请日：2004-02-06
IPC分类号： G03C1/00
CPC分类号： G03C1/73 , G03C1/732 , Y10S430/146 , Y10S430/155
摘要： An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
摘要翻译： 公开了一种成像方法。 将成像组合物涂覆在工件上，然后从3-D成像系统施加足够量的能量以在涂覆的工件上形成图像。 图像可以是用于对准部件的标志或标记。
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公开(公告)号：US07749685B2
公开(公告)日：2010-07-06
申请号：US11378918
申请日：2006-03-17
IPC分类号： G03C1/00
CPC分类号： G03C1/73 , G03C1/732 , Y10S430/146 , Y10S430/155
摘要： An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
摘要翻译： 公开了一种成像方法。 将成像组合物涂覆在工件上，然后从3-D成像系统施加足够量的能量以在涂覆的工件上形成图像。 图像可以是用于对准部件的标志或标记。
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公开(公告)号：US5320933A
公开(公告)日：1994-06-14
申请号：US979349
申请日：1992-11-20
CPC分类号： G03F7/085 , Y10S430/155
摘要： A photoimageable composition contains from 0.5 to 5 wt. percent of a compound of the formula: ##STR1## wherein R=alkyl, aryl, aralkyl, alkenyl, alkynyl, and substituted forms thereofX=OR', SR', NR'.sub.2, R'R'=H, R, CO--R,G=nothing or C.sub.1 -C.sub.8 alipathic hydrocarbon, andY=COOH, PO.sub.3 H, SO.sub.3 H, SO.sub.2 H and SOH. X'=R'to promote adhesion of the photoimageable composition to metal.
摘要翻译： 可光成像组合物含有0.5至5wt。 其中R =烷基，芳基，芳烷基，烯基，炔基及其取代形式X = OR'，SR'，NR'2，R'R'= H，R，CO -R，G =无或C 1 -C 8脂族烃，Y = COOH，PO 3 H，SO 3 H，SO 2 H和SOH。 X'= R'以促进可光成像组合物与金属的粘附。
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公开(公告)号：US06887654B2
公开(公告)日：2005-05-03
申请号：US10431002
申请日：2003-05-07
CPC分类号： G03F7/322
摘要： A composition and method to reduce or to prevent residue and scum formation on a substrate or in a solution. The composition contains an aromatic alkoxylate in combination with a polyol or ether or ester of a polyol. The composition also reduces or prevents foam formation such as in developing processes in the manufacturing of printed wiring boards.
摘要翻译： 减少或防止底物或溶液中残留物和浮渣形成的组合物和方法。 该组合物含有多元醇或多元醇的醚或酯的芳族烷氧基化物。 组合物还可以减少或防止泡沫形成，例如印刷线路板的制造中的显影过程。
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公开(公告)号：US07223519B2
公开(公告)日：2007-05-29
申请号：US11180950
申请日：2005-07-13
申请人： Robert K. Barr , Corey O'Connor
发明人： Robert K. Barr , Corey O'Connor
CPC分类号： G03C1/73 , G03C1/732 , Y10S430/127 , Y10S430/163
摘要： Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be applied to a work piece to mark it and removed from the work piece by peeling.
摘要翻译： 公开了使用组合物的成像组合物和方法。 成像组合物对低水平的能量敏感，使得当施加低水平的能量时，组合物改变颜色或阴影。 组合物可以施加到工件上以将其标记并通过剥离从工件移除。
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10.发明申请TEXTURING OF MONOCRYSTALLINE SEMICONDUCTOR SUBSTRATES TO REDUCE INCIDENT LIGHT REFLECTANCE 有权单晶半导体衬底的纹理化以减少偶发的光反射公开(公告)号：US20140065836A1
公开(公告)日：2014-03-06
申请号：US13597244
申请日：2012-08-28
申请人： Michael P. TOBEN , Robert K. Barr , Corey O'Connor
发明人： Michael P. TOBEN , Robert K. Barr , Corey O'Connor
IPC分类号： C09K13/00 , H01L21/3063
CPC分类号： C09K13/06 , A01N35/08 , A01N43/28 , C07D275/04 , C09K13/00 , C09K13/02 , C23C18/38 , C23C18/40 , G02B1/111 , H01L31/02363 , Y02E10/50
摘要： Monocrystalline semiconductor substrates are textured with alkaline solutions to form pyramid structures on their surfaces to reduce incident light reflectance and improve light absorption of the wafers. The alkaline baths include hydantoin compounds and derivatives thereof in combination with alkoxylated glycols to inhibit the formation of flat areas between pyramid structures to improve the light absorption.
摘要翻译： 单晶半导体衬底用碱性溶液织构，以在其表面上形成金字塔结构，以减少入射光反射率并改善晶片的光吸收。 碱性浴包括乙内酰脲化合物及其衍生物与烷氧基化二醇的组合，以抑制在金字塔结构之间形成平坦区域以改善光吸收。
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