公开(公告)号：US20250135510A1

公开(公告)日：2025-05-01

申请号：US18929782

申请日：2024-10-29

Applicant: SEMES CO., LTD.

Inventor： Si Nae SONG ,  Ho Jin JEONG ,  Kyung Min KIM ,  Sung Bum PARK ,  Dong Ho LIM ,  Soo Young PARK

IPC: B08B3/04 ,  B08B3/08 ,  H01L21/02

Abstract: Disclosed is a substrate treating apparatus including: a substrate support unit for supporting and rotating a substrate; a liquid supply unit for supplying a treatment solution onto the substrate; a collection cup provided to surround the substrate support unit, and having a plurality of collection spaces for collecting a treatment solution scattered from the substrate; a lifting unit for changing a relative position between the collection cup and the substrate; and a controller for controlling the lifting unit to vary a relative height between the substrate and the collection cup in accordance with a process recipe for treating the substrate.

公开(公告)号：US20230076790A1

公开(公告)日：2023-03-09

申请号：US17896782

申请日：2022-08-26

Applicant: SEMES CO., LTD.

Inventor： Kyung Min KIM ,  In Hwang PARK ,  Joo Jib PARK ,  Hyun Jin YANG ,  Ji Hyeong LEE

IPC: B08B15/04 ,  B08B3/02 ,  B08B13/00 ,  B08B3/08

Abstract: According to an embodiment of the present invention, there are provided an exhaust assembly capable of uniformly forming an air flow in an exhaust step of discharging a gas to the outside, and a liquid processing apparatus and substrate processing equipment including the exhaust assembly. According to the present invention, the exhaust assembly that discharges a gas generated in a substrate processing process includes at least two or more intake ports into which the gas flows, a body portion that communicates with the intake ports and provides symmetrical paths for discharging the gas, a guide portion that is installed to guide a flow of the gas at the body portion, and an exhaust port from which the gas is discharged. The guide portion includes a flow guide that is installed to be adjacent to at least one of the intake ports and guides a direction of the gas to equally divide the flow of the gas, and a flow-rate guide that is installed around the intake port most adjacent to the exhaust port among the intake ports and is formed to reduce a cross-sectional area of a flow path of the gas.

公开(公告)号：US20240216939A1

公开(公告)日：2024-07-04

申请号：US18343242

申请日：2023-06-28

Applicant: SEMES CO., LTD.

Inventor： Soon Hyun KIM ,  Kyung Min KIM

IPC: B05B13/04 ,  H01L21/67

CPC classification number: B05B13/0421 ,  H01L21/67051 ,  H01L21/6708

Abstract: The inventive concept provides a liquid supply unit which may implement a rotation (swing) of a plurality of nozzles by a single motor, and which has simple structure. The liquid supply unit includes a first nozzle, a second nozzle, a motor, and a first belt. The first nozzle includes a first supply pipe for supplying a liquid, a first rotation part provided at a bottom part of the first supply pipe, and a first electromagnetic clutch provided at a bottom part of the first rotation part. The second nozzle includes a second supply pipe for supplying a liquid, a second rotation part provided at a bottom part of the second supply pipe, and a second electromagnetic clutch provided at a bottom part of the second rotation part. The motor provides a rotation force to the first electromagnetic clutch. The first belt which interlocks a rotation of the first electromagnetic clutch and the second electromagnetic clutch.

公开(公告)号：US20210125841A1

公开(公告)日：2021-04-29

申请号：US17080581

申请日：2020-10-26

Applicant: SEMES CO., LTD.

Inventor： In Hwang PARK ,  Sung Pil KIM ,  Kuk Saeng KIM ,  Kyung Min KIM

IPC: H01L21/67 ,  H01L21/687

Abstract: A substrate processing apparatus includes a rotation unit supporting and rotating a substrate, a chemical ejection unit ejecting a chemical fluid toward the rotation unit, a chemical recovery unit disposed close to the rotation unit and collecting a chemical fluid scattered from the rotation unit, a first lifting unit coupled to the chemical recovery unit and moving upward and downward the chemical recovery unit relative to the rotation unit, and a first position correction member allowing the chemical recovery unit to be elastically supported by the first lifting unit and changing a relative position of the chemical recovery unit with respect to the lifting unit.

公开(公告)号：US20240216958A1

公开(公告)日：2024-07-04

申请号：US18395574

申请日：2023-12-24

Applicant: SEMES CO., LTD.

Inventor： Soon Hyun KIM ,  Kyung Min KIM

IPC: B08B3/02 ,  B08B3/08

CPC classification number: B08B3/024 ,  B08B3/08 ,  B08B2203/02

Abstract: Proposed are a substrate treatment apparatus and a substrate treatment method, and a technology capable of reducing a nozzle driving deviation between facilities by feedback a repetitive operation of a nozzle driving cylinder of the substrate treatment apparatus and by correcting an air input flow rate of the nozzle driving cylinder according to an error in the operation of the nozzle driving cylinder is provided.