公开(公告)号：US20150262787A1

公开(公告)日：2015-09-17

申请号：US14656132

申请日：2015-03-12

Applicant: SEN Corporation

Inventor： Haruka Sasaki ,  Kazuhiro Watanabe ,  Hiroyuki Kariya

IPC: H01J37/244 ,  H01J37/147 ,  H01J37/317

CPC classification number: H01J37/244 ,  H01J37/3171 ,  H01J2237/057 ,  H01J2237/24514 ,  H01J2237/24528 ,  H01J2237/31703

Abstract: A beam energy measuring device in an ion implanter includes a parallelism measuring unit that measures a parallelism of an ion beam at a downstream of a beam collimator of the ion implanter and an energy calculating unit that calculates an energy of the ion beam from the measured parallelism. The ion implanter may further include a control unit that controls a high energy multistage linear acceleration unit based on the measured energy of the ion beam so that the ion beam has a target energy.

Abstract translation: 离子注入机中的光束能量测量装置包括平行度测量单元，其测量在离子注入机的光束准直器的下游处的离子束的平行度，以及能量计算单元，其计算来自所测量的平行度的离子束的能量 。 离子注入机还可以包括控制单元，其基于所测量的离子束的能量来控制高能量多级线性加速单元，使得离子束具有目标能量。

公开(公告)号：US20150056366A1

公开(公告)日：2015-02-26

申请号：US14463041

申请日：2014-08-19

Applicant: SEN Corporation

Inventor： Hiroyuki Kariya

IPC: H01J37/24 ,  H01J37/147 ,  C23C14/48 ,  H01J37/317 ,  G01R33/07 ,  C23C14/54

CPC classification number: H01J37/243 ,  G01R33/07 ,  G01R33/072 ,  H01J37/05 ,  H01J37/147 ,  H01J37/3171 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/152 ,  H01J2237/24514 ,  H01J2237/248 ,  H01J2237/3045

Abstract: An ion implanter includes an energy analyzer electromagnet provided between an ion source and a processing chamber. The energy analyzer electromagnet includes a Hall probe configured to generate a measurement output in response to a deflecting magnetic field and an NMR probe configured to generate an NMR output. A control unit of the ion implanter includes a magnetic field measurement unit configured to measure the deflecting magnetic field in accordance with a known correspondence between the deflecting magnetic field and the measurement output, a magnetic field determination unit configured to determine the deflecting magnetic field from the NMR output, and a Hall probe calibration unit configured to update the known correspondence by using the deflecting magnetic field determined from the NMR output and a new measurement output of the Hall probe corresponding to the determined deflecting magnetic field.

Abstract translation: 离子注入机包括设置在离子源和处理室之间的能量分析仪电磁体。 能量分析仪电磁体包括霍尔探针，其被配置为响应于偏转磁场产生测量输出，并且NMR探针被配置为产生NMR输出。 离子注入机的控制单元包括磁场测量单元，其被配置为根据偏转磁场和测量输出之间的已知对应度来测量偏转磁场;磁场确定单元，被配置为确定偏转磁场的偏转磁场， NMR输出以及霍尔探头校准单元，其被配置为通过使用从NMR输出确定的偏转磁场和对应于所确定的偏转磁场的霍尔探头的新测量输出来更新已知对应关系。

公开(公告)号：US08692216B2

公开(公告)日：2014-04-08

申请号：US13839753

申请日：2013-03-15

Applicant: Sen Corporation

Inventor： Hiroyuki Kariya ,  Masaki Ishikawa ,  Yoshiaki Inda ,  Takeshi Kurose ,  Takanori Yagita ,  Toshio Yumiyama

IPC: H01J37/147 ,  H01L21/265 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/147 ,  H01J37/304 ,  H01J2237/24521 ,  H01J2237/24535 ,  H01J2237/24542 ,  H01L21/265 ,  H01L21/67213

Abstract: A vertical profile, a horizontal profile, and an integrated current value of an ion beam are measured by a plurality of stationary beam measuring instruments and a movable or stationary beam measuring device. At a beam current adjustment stage before ion implantation, a control device simultaneously performs at least one of adjustment of a beam current to a preset value of the beam current, adjustment of a horizontal beam size that is necessary to secure uniformity of the horizontal ion beam density, and adjustment of a vertical beam size that is necessary to secure the uniformity of the vertical ion implantation distribution on the basis of a measurement value of the stationary beam measuring instruments and the movable or stationary beam measuring device.

Abstract translation: 通过多个静止光束测量仪器和可移动或静止的光束测量装置测量离子束的垂直分布，水平分布和积分电流值。 在离子注入之前的光束电流调节阶段，控制装置同时执行将束电流调节到束电流的预设值中的至少一个，调整水平射束尺寸，以确保水平离子束的均匀性 基于静止光束测量仪器和可动或静止光束测量装置的测量值确保垂直离子注入分布的均匀性所必需的垂直光束尺寸的密度和密度和调整。