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1.发明授权公开(公告)号：US12043812B2
公开(公告)日：2024-07-23
申请号：US17543801
申请日：2021-12-07
发明人： Sun Joo Kim , Mi So Kim , Ho Seong Lee , Min Gu Kim , Jae Hyun Park
IPC分类号： C10M129/40 , C10M149/18 , C10M149/22 , C10M169/04
CPC分类号： C10M129/40 , C10M149/18 , C10M149/22 , C10M169/04 , C10M2207/125 , C10M2217/044 , C10M2217/046
摘要： Provided is a lubricating composition for inhibiting plugging including a base oil and any one selected from a fatty acid and an emulsifier, with the lubricating composition forming a single phase even when a carboxylic acid-based monomer is introduced with respect to the base oil. The lubricating composition suppresses plugging occurring in a process of preparing a copolymer derived from the carboxylic acid-based monomer. In addition, also provided is a method of inhibiting plugging using the lubricating composition for inhibiting plugging.
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2.发明申请公开(公告)号：US20220177803A1
公开(公告)日：2022-06-09
申请号：US17543801
申请日：2021-12-07
发明人： Sun Joo Kim , Mi So Kim , Ho Seong Lee , Min Gu Kim , Jae Hyun Park
IPC分类号： C10M129/40 , C10M169/04 , C10M149/22 , C10M149/18
摘要： Provided is a lubricating composition for inhibiting plugging including a base oil and any one selected from a fatty acid and an emulsifier, with the lubricating composition forming a single phase even when a carboxylic acid-based monomer is introduced with respect to the base oil. The lubricating composition suppresses plugging occurring in a process of preparing a copolymer derived from the carboxylic acid-based monomer. In addition, also provided is a method of inhibiting plugging using the lubricating composition for inhibiting plugging.
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公开(公告)号：US11905346B2
公开(公告)日：2024-02-20
申请号：US17484015
申请日：2021-09-24
发明人： Byoung Kyu Kwak , Sun Joo Kim , Hong Chan Kim , Kyung Jin Ma , Doh Yeon Park , Jae Eun Lee , Ho Seong Lee , Juan Carlos Estevez Videira , Manuel David Recasens Alvaro , In Su Lee , Wan Ju Jeong
IPC分类号： C08F2/01 , C08F2/06 , C08F6/00 , C08F6/10 , C08F210/02 , C08F220/04 , B01J8/00 , B01J19/00 , B01J19/06 , B01J19/24 , B01J8/22 , B01J20/30 , C08F220/08 , C08F6/06
CPC分类号： C08F210/02 , B01J8/228 , B01J19/0053 , B01J19/06 , B01J19/2465 , B01J20/3071 , C08F2/01 , C08F2/06 , C08F6/005 , C08F6/008 , C08F6/06 , C08F6/10 , C08F220/04 , C08F220/08 , B01J2208/00761 , B01J2219/00353 , B01J2219/00389 , B01J2219/00418 , C08F2800/20
摘要： The present invention relates to a method for producing an ethylene-based copolymer, and more particularly, to a method for producing an ethylene-based copolymer capable of increasing process efficiency by preventing plugging and corrosion of a facility. The method for producing an ethylene-based copolymer includes a producing mode and a washing mode of which one is selectively performed. The producing mode includes: a) hyper-compressing primary compressed ethylene, and a mixture including a carboxylic acid-containing comonomer and a polar solvent to produce a compressed material; b) reacting the compressed material to produce a reaction product including an ethylene-based copolymer; and c) separating and recovering unreacted residues from the reaction product and introducing the unreacted residues into the mixture of step a). The washing mode includes: re-supplying the compressed material produced in step a) to step a) as a mixture, without performing step b).
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公开(公告)号：US11685795B2
公开(公告)日：2023-06-27
申请号：US17179938
申请日：2021-02-19
发明人： Ho Seong Lee , Sun Joo Kim , Jae Hyun Park , Min Gu Kim , Jang Hoon Ock
IPC分类号： C08F2/01 , C08F2/14 , C08F210/02
摘要： In a method of producing an ethylene-carboxylic acid copolymer, a monomer solution containing a carboxylic acid monomer is supplied from a discharging unit. The carboxylic acid monomer is copolymerized with an ethylene-based monomer. A coefficient of friction between the discharging unit and the monomer solution is maintained as 0.3 or less.
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公开(公告)号：US20220098340A1
公开(公告)日：2022-03-31
申请号：US17484015
申请日：2021-09-24
发明人： Byoung Kyu Kwak , Sun Joo Kim , Hong Chan Kim , Kyung Jin Ma , Doh Yeon Park , Jae Eun Lee , Ho Seong Lee , Juan Carlos Estevez Videira , Manuel David Recasens Alvaro , In Su Lee , Wan Ju Jeong
IPC分类号： C08F210/02 , B01J19/06 , B01J19/24
摘要： The present invention relates to a method for producing an ethylene-based copolymer, and more particularly, to a method for producing an ethylene-based copolymer capable of increasing process efficiency by preventing plugging and corrosion of a facility. The method for producing an ethylene-based copolymer includes a producing mode and a washing mode of which one is selectively performed. The producing mode includes: a) hyper-compressing primary compressed ethylene, and a mixture including a carboxylic acid-containing comonomer and a polar solvent to produce a compressed material; b) reacting the compressed material to produce a reaction product including an ethylene-based copolymer; and c) separating and recovering unreacted residues from the reaction product and introducing the unreacted residues into the mixture of step a). The washing mode includes: re-supplying the compressed material produced in step a) to step a) as a mixture, without performing step b).
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公开(公告)号：US11118129B2
公开(公告)日：2021-09-14
申请号：US16923202
申请日：2020-07-08
发明人： Ho Seong Lee , Sun Joo Kim , Jin Haek Yang
IPC分类号： C10M169/04 , C08F110/02 , C08F220/06 , C10M101/02 , C10M129/14 , C10M135/36 , C08J3/00
摘要： A lubricant composition includes a base oil, a phenothiazine-based polymerization inhibitor, and a polymerization inhibitory accelerator including a hindered phenol-based compound and a hydroquinone-based compound. A self-polymerization in a polymerizing process is suppressed by an interaction between the polymerization inhibitor and the polymerization inhibitory accelerator. A method of preparing a copolymer using the lubricant composition is also provided.
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公开(公告)号：US20210261695A1
公开(公告)日：2021-08-26
申请号：US17179938
申请日：2021-02-19
发明人： Ho Seong Lee , Sun Joo Kim , Jae Hyun Park , Min Gu Kim , Jang Hoon Ock
摘要： In a method of producing an ethylene-carboxylic acid copolymer, a monomer solution containing a carboxylic acid monomer is supplied from a discharging unit. The carboxylic acid monomer is copolymerized with an ethylene-based monomer. A coefficient of friction between the discharging unit and the monomer solution is maintained as 0.3 or less.
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公开(公告)号：US09695279B2
公开(公告)日：2017-07-04
申请号：US15133808
申请日：2016-04-20
发明人： Kwang Kuk Lee , Jin Su Ham , Sun Joo Kim , Hye Ryoung Lee , Min Ho Jung
IPC分类号： C08G65/38 , C07C323/18 , C07C39/17 , C07C39/42 , C07C43/225 , C07C43/23 , C09D171/00 , G03F7/11 , H01L21/027 , G03F7/09
CPC分类号： C08G65/38 , C07C39/17 , C07C39/42 , C07C43/225 , C07C43/23 , C07C323/18 , C07C2603/18 , C07C2603/40 , C09D171/00 , G03F7/094
摘要： Provided are a fluoreneol-based monomer, a polymer for preparing a resist underlayer film obtained therefrom, a resist underlayer film composition containing the polymer, and a method for forming a resist underlayer film using the resist underlayer film composition, wherein the fluoreneol-based monomer is represented by Chemical Formula 2 below:
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公开(公告)号：US20210009919A1
公开(公告)日：2021-01-14
申请号：US16923202
申请日：2020-07-08
发明人： Ho Seong Lee , Sun Joo Kim , Jin Haek Yang
IPC分类号： C10M169/04 , C10M101/02 , C10M135/36 , C10M129/14 , C08F110/02 , C08F220/06
摘要： A lubricant composition includes a base oil, a phenothiazine-based polymerization inhibitor, and a polymerization inhibitory accelerator including a hindered phenol-based compound and a hydroquinone-based compound. A self-polymerization in a polymerizing process is suppressed by an interaction between the polymerization inhibitor and the polymerization inhibitory accelerator. A method of preparing a copolymer using the lubricant composition is also provided.
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10.发明申请Polymer for Preparing Resist Underlayer Film, Resist Underlayer Film Composition Containing the Polymer and Method for Forming Resist Underlayer Film Using the Composition 有权用于制备抗蚀剂的下层膜的聚合物，含有聚合物的抗蚀剂下层膜组合物和使用组合物形成抗蚀剂底层膜的方法公开(公告)号：US20160311975A1
公开(公告)日：2016-10-27
申请号：US15133808
申请日：2016-04-20
发明人： Kwang Kuk Lee , Jin Su Ham , Sun Joo Kim , Hye Ryoung Lee , Min Ho Jung
IPC分类号： C08G65/38 , G03F7/11 , C07C39/17 , H01L21/027 , C07C43/225 , C07C43/23 , C07C323/18 , C09D171/00 , C07C39/42
CPC分类号： C08G65/38 , C07C39/17 , C07C39/42 , C07C43/225 , C07C43/23 , C07C323/18 , C07C2603/18 , C07C2603/40 , C09D171/00 , G03F7/094
摘要： Provided are a fluoreneol-based monomer, a polymer for preparing a resist underlayer film obtained therefrom, a resist underlayer film composition containing the polymer, and a method for forming a resist underlayer film using the resist underlayer film composition, wherein the fluoreneol-based monomer is represented by Chemical Formula 2 below:
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