CONTINUOUS PRODUCTION SYSTEMS FOR THERMOCHEMICAL REACTIONS

    公开(公告)号:US20240359155A1

    公开(公告)日:2024-10-31

    申请号:US18644948

    申请日:2024-04-24

    IPC分类号: B01J19/12 B01J19/00 B01J37/34

    摘要: Methods, devices, and systems are described for a system including a concentrated light source configured to focus light energy along a line of focus and a moving platform configured to face the concentrated light source and suspend a reactants mixture. The system also includes a controller coupled to the concentrated light source and the moving platform. The controller is configured to drive the moving platform at a first speed and a second speed. Suspending the reactants mixture within the line of focus of the concentrated light source as the moving platform is driven at the first speed converts the reactants mixture to slag. Suspending the reactants mixture as the moving platform is driven at the second speed does not convert the reactants mixture to slag.

    CHAMBER WALL POLYMER PROTECTION SYSTEM AND METHOD

    公开(公告)号:US20240271286A1

    公开(公告)日:2024-08-15

    申请号:US18647384

    申请日:2024-04-26

    摘要: In an etch process chamber, oscillators are positioned a predetermined distance away from an outer wall and coupled to a microwave generator. An inner wall of the process chamber on which particulates such as polymers adhere from the etch process is vibrated via operations of the oscillators. A gas flows into the cavity defined by the inner wall to collect the displaced particulates, which is then pumped out of the cavity to clean the process chamber. A controller identifies the polymer recipe used during the etch process and selects an oscillation program from memory. A microwave generator, controlled by the controller, is directed to generate microwaves at preselected frequencies determined from the program. The microwave frequencies are communicated to the oscillators, which then vibrate the inner wall at such received frequencies.