公开(公告)号：US20220115532A1

公开(公告)日：2022-04-14

申请号：US17417677

申请日：2019-12-23

Applicant: SOUTHEAST UNIVERSITY ,  CSMC TECHNOLOGIES FAB2 CO., LTD.

Inventor： Weifeng SUN ,  Rongcheng LOU ,  Kui XIAO ,  Feng LIN ,  Jiaxing WEI ,  Sheng LI ,  Siyang LIU ,  Shengli LU ,  Longxing SHI

IPC: H01L29/78 ,  H01L29/16 ,  H01L29/10 ,  H01L21/04 ,  H01L29/66

Abstract: A power semiconductor device includes a substrate; drain metal; a drift region; a base region; a gate structure; a first conductive type doped region contacting the base region on the side of the base region distant from the gate structure; a source region provided in the base region and between the first conductive type doped region and the gate structure; contact metal that is provided on the first conductive type doped region and forms a contact barrier having rectifying characteristics together with the first conductive type doped region below; and source metal wrapping the contact metal and contacting the source region.

公开(公告)号：US20210234030A1

公开(公告)日：2021-07-29

申请号：US16969437

申请日：2019-10-21

Applicant: SOUTHEAST UNIVERSITY

Inventor： Weifeng SUN ,  Siyang LIU ,  Sheng LI ,  Chi ZHANG ,  Xinyi TAO ,  Ningbo LI ,  Longxing SHI

IPC: H01L29/778

Abstract: A heterojunction semiconductor device comprises a substrate; a second barrier layer is disposed on the second channel layer and a second channel is formed; a trench gate structure is disposed in the second barrier layer; the trench gate structure is embedded into the second barrier layer and is composed of a gate medium and a gate metal located in the gate medium; an isolation layer is disposed in the second channel layer and separates the second channel layer into an upper layer and a lower layer; a first barrier layer is disposed between the lower layer of the second channel layer and the first channel layer and a first channel is formed; a bottom of the metal drain is flush with a bottom of the first barrier layer; and a first metal source is disposed between the second metal source and the first channel layer.

公开(公告)号：US20210336009A1

公开(公告)日：2021-10-28

申请号：US16486494

申请日：2018-09-25

Applicant: SOUTHEAST UNIVERSITY

Inventor： Weifeng SUN ,  Siyang LIU ,  Lizhi TANG ,  Sheng LI ,  Chi ZHANG ,  Jiaxing WEI ,  Shengli LU ,  Longxing SHI

IPC: H01L29/16 ,  H01L29/06 ,  H01L29/78

Abstract: The invention provides a graphene channel silicon carbide power semiconductor transistor, and its cellular structure thereof. Characterized in that, a graphene strip serving as a channel is embedded in a surface of the P-type body region and two ends of the graphene strip are respectively contacted with a boundary between the N+-type source region and the P-type body region and a boundary between the P-type body region and the N-type drift region, and the graphene strip is distributed in a cellular manner in a gate width direction, a conducting channel of a device is still made of graphene; in the case of maintaining basically invariable on-resistance and current transmission capacity, the P-type body regions are separated by the graphene strip, thus enhancing a function of assisting depletion, which further reduces an overall off-state leakage current of the device, and improves a breakdown voltage.