PHOTODIODE INSULATION
    1.
    发明申请

    公开(公告)号:US20220005850A1

    公开(公告)日:2022-01-06

    申请号:US17363345

    申请日:2021-06-30

    Abstract: An optoelectronic device includes a photodiode. At least a portion of an active area of the photodiode is separated from a neighboring photodiode by a first wall including a conductive core and an insulating sheath and by a second optical insulation wall. The first wall and second optical insulation wall further extend parallel to each other and separate the active area from a memory area of the photodiode.

    VIA MANUFACTURING METHOD
    7.
    发明公开

    公开(公告)号:US20230178479A1

    公开(公告)日:2023-06-08

    申请号:US18075087

    申请日:2022-12-05

    CPC classification number: H01L23/5226 H01L21/76834 H01L21/76897

    Abstract: A method is presented for manufacturing an insulated conductive via. The via crosses a first stack of layers to reach a first layer. A first cavity is formed partially extending into the first stack of layers. A second stack of layers is formed over the first stack of layers and in the first cavity. The second stack of layers includes an etch stop layer and an insulating layer. A second cavity is then formed extending completely through first and second stacks of layers to reach the first layer. An insulating liner then covers the walls and bottom of the second cavity. The insulating liner is then anisotropically etched, and the second cavity is filled by a conductive material forming the core of the via.

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