Semiconductor laser
    2.
    发明授权
    Semiconductor laser 失效
    半导体激光器

    公开(公告)号:US4679200A

    公开(公告)日:1987-07-07

    申请号:US691917

    申请日:1985-01-16

    摘要: A semiconductor laser includes a current blocking layer formed on a substrate, a first cladding layer formed on the current blocking layer, an active layer formed on the first cladding layer, and a second cladding layer formed on the active layer. An indent is formed in the current blocking layer near the center of the laser element, and a V-shaped groove is formed in the current blocking layer across the indent. A gain guide structure is formed where the indent is formed, and an index guide structure is formed near the cleaved facet. A stable transverse mode laser emission is ensured without the influence of the return beam reflected from the disc surface, and the attendant mode competition noise is reduced.

    摘要翻译: 半导体激光器包括形成在基板上的电流阻挡层,形成在电流阻挡层上的第一覆盖层,形成在第一覆盖层上的有源层和形成在有源层上的第二覆层。 在激光元件的中心附近的电流阻挡层中形成凹口,并且在电流阻挡层中形成跨越凹口的V形槽。 在形成凹口的地方形成增益引导结构,并且在切割面附近形成引导引导结构。 确保稳定的横模式激光发射,而不受来自盘表面反射的返回光束的影响,并且伴随模式的竞争噪声降低。

    Semiconductor VSIS laser
    3.
    发明授权
    Semiconductor VSIS laser 失效
    半导体VSIS激光器

    公开(公告)号:US4901328A

    公开(公告)日:1990-02-13

    申请号:US380745

    申请日:1989-07-17

    摘要: A V-channeled substrate inner strip (VSIS) semiconductor laser includes a p-Ga.sub.1-31 y Al.sub.y As active layer sandwiched between a P-Ga.sub.1-x Al.sub.x As first cladding layer and an n-Ga.sub.1-x Al.sub.x As second cladding layer. The AlAs mole fraction x of the first and second cladding layers is selected between about 0.45 and 0.52 in order to minimize the mode competition noise at an operating temperature. In a preferred form, the cavity length is longer than 300 .mu.m so as to minimize the occurrence of the mode competition noise at the operating temperature. Furthermore, the reflectivity R.sub.1 of the front facet and the reflectivity R.sub.2 of the rear facet are selected to satisfy the condition 0.1.ltoreq.ln(1/R.sub.1 .multidot.R.sub.2).ltoreq.1.

    摘要翻译: V沟道衬底内条(VSIS)半导体激光器包括夹在P-Ga1-xAlxAs第一包层和n-Ga1-xAlxAs第二覆层之间的p-Ga1-31 yAlyAs有源层。 第一和第二包覆层的AlAs摩尔分数x在约0.45和0.52之间选择,以便使工作温度下的模式竞争噪声最小化。 在优选的形式中,空腔长度大于300μm,以便在工作温度下最小化模式竞争噪声的发生。 此外,选择前面的反射率R1和后面的反射率R2以满足条件0.1

    Method for producing a semiconductor laser device having a buried
heterostructure
    6.
    发明授权
    Method for producing a semiconductor laser device having a buried heterostructure 失效
    一种具有掩埋异质结构的半导体激光器件的制造方法

    公开(公告)号:US4692206A

    公开(公告)日:1987-09-08

    申请号:US830857

    申请日:1986-02-19

    摘要: A method for producing a semiconductor laser device having a buried heterostructure includes a multi-layered crystal structure, containing an active layer for laser oscillation, on a p-substrate, said multi-layered crystal structure having a striped mesa-portion, a p-n-p multi-layered structure surrounding said mesa-portion and a burying layer disposed on an upper face of said striped mesa-portion. The unique structure results in a heterojunction at each of both side faces of said active layer in said mesa-portion.

    摘要翻译: 一种具有掩埋异质结构的半导体激光器件的制造方法包括在p型基板上含有激光振荡用活性层的多层结晶结构体,具有条状台面部的多层结晶结构体,pnp多 围绕所述台面部分的层状结构以及设置在所述条状台面部分的上表面上的掩埋层。 独特的结构在所述台面部分中的所述有源层的两个侧面的每一个处产生异质结。

    Semiconductor laser device with a diffraction grating
    7.
    发明授权
    Semiconductor laser device with a diffraction grating 失效
    具有衍射光栅的半导体激光器件

    公开(公告)号:US4745616A

    公开(公告)日:1988-05-17

    申请号:US830864

    申请日:1986-02-19

    IPC分类号: H01S5/00 H01S5/12 H01S3/19

    CPC分类号: H01S5/12

    摘要: A semiconductor laser device comprising a GaAlAs first cladding layer, a Ga.sub.1-x Al.sub.x As (0.ltoreq.x.ltoreq.0.4) active layer for laser oscillation, an In.sub.1-y Ga.sub.y P.sub.1-z As.sub.z (z=2.04y-1.04, and 0.ltoreq.z.ltoreq.1) optical guiding layer with a diffraction grating thereon, a GaAlAs buffer layer disposed between said active layer and said optical guiding layer, and a GaAlAs second cladding layer, the width of the forbidden band of said buffer layer being greater than that of the active layer and smaller than that of the optical guiding layer.

    摘要翻译: 包括GaAlAs第一包层,用于激光振荡的Ga1-xAlxAs(0≤x≤0.4)有源层,In1-yGayP1-zAsz(z = 2.04y-1.04和0)的半导体激光器件, = z 1)具有衍射光栅的光导层,设置在所述有源层和所述光导层之间的GaAlAs缓冲层和GaAlAs第二包层,所述缓冲层的禁带的宽度更大 比活性层的厚度小,而且比光导层的面积小。