SEMICONDUCTOR OPTICAL ELEMENT
    1.
    发明公开

    公开(公告)号:US20240154390A1

    公开(公告)日:2024-05-09

    申请号:US18574646

    申请日:2021-07-09

    CPC classification number: H01S5/2231 H01S5/2275 H01S5/3211 H01S5/34353

    Abstract: A semiconductor optical element of the present disclosure includes: a ridge structure provided on a first-conductivity-type semiconductor substrate and including a first-conductivity-type cladding layer and an active layer; a buried structure provided on both side surfaces of the ridge structure; a second-conductivity-type cladding layer and a second-conductivity-type contact layer provided on a surface of the buried structure; a second-conductivity-type ridge upper cladding layer provided above the ridge structure; a recess having a bottom surface formed of an upper surface of the second-conductivity-type ridge upper cladding layer and side surfaces formed of the second-conductivity-type cladding layer and the second-conductivity-type contact layer; a mesa structure having both side surfaces formed by a mesa extending from the second-conductivity-type contact layer to the first-conductivity-type semiconductor substrate.

    Light emitting device
    4.
    发明授权

    公开(公告)号:US11817679B2

    公开(公告)日:2023-11-14

    申请号:US18162063

    申请日:2023-01-31

    Inventor: Takuya Hashimoto

    Abstract: A light emitting device includes: a substrate including a main surface; a first projection positioned on the main surface, the first projection including an upper surface and first and second lateral surfaces, wherein the first lateral surface of the first projection comprises a first reflective part, and the second lateral surface of the first projection comprises a second reflective part; a first laser element positioned on the main surface at a first reflective part side with respect to the first projection, the first laser element being configured to irradiate first laser light to the first reflective part; a second laser element positioned on the main surface at a second reflective part side with respect to the first projection, the second laser element being configured to irradiate second laser light to the second reflective part; and a first optical member bonded to the upper surface of the first projection.

    SEMICONDUCTOR LASER DEVICE WITH FIRST ORDER DIFFRACTION GRATING EXTENDING TO FACET

    公开(公告)号:US20230344197A1

    公开(公告)日:2023-10-26

    申请号:US17640646

    申请日:2021-11-11

    Applicant: NLIGHT, INC.

    Inventor: Manoj KANSKAR

    CPC classification number: H01S5/1203 H01S5/0287 H01S5/3211

    Abstract: Some embodiments may include a semiconductor laser device comprising: an active layer to generate light; a front facet positioned at a first end of said active layer, with an AR coating or PR coating; a rear facet positioned on a second opposite end of said active layer thereby forming a resonator between said front facet and said rear facet; and a first order diffraction grating positioned within said resonator along only a portion of the length of said active layer, wherein the semiconductor laser device is arranged to emit light from both ends, and the diffraction grating has two non-contiguous segments each extending to one of the facets; or a single end, wherein the rear facet is a rear light reflecting facet with an HR-coating. Other embodiments may be disclosed and/or claimed.

    Surface Emitting Laser With Hybrid Grating Structure

    公开(公告)号:US20230291177A1

    公开(公告)日:2023-09-14

    申请号:US18199960

    申请日:2023-05-21

    Abstract: The grating layer of a surface emitting laser is divided into a first grating region and a second grating region along a horizontal direction. The second grating region is located at a middle area of the grating layer, while the first grating region is located in an outer peripheral area of the grating layer. Each of the first and second grating regions comprises a plurality of micro-grating structures. The grating period of the micro-grating structures in the first grating region is in accordance with the following mathematical formula:




    Λ
    =
    m

    λ

    2


    n

    e
    f
    f




    ;




    in addition, the grating period of the micro-grating structures in the second grating region is in accordance with the following mathematical formula:




    Λ
    =
    O

    λ

    2


    n

    e
    f
    f




    .




    Wherein, Λ is the length of grating period, λ is the wavelength of the laser light, neff is the equivalent refractive index of semiconductor waveguide, m=1, and o=2. The first grating region is a first-order grating region, and the second grating region is a second-order grating region, so as to form a hybrid grating structure in the grating layer. The surface emitting laser emits laser light perpendicularly from a light-emitting surface defined by the second grating region.

    Semiconductor laser apparatus
    8.
    发明授权

    公开(公告)号:US10050413B2

    公开(公告)日:2018-08-14

    申请号:US15708531

    申请日:2017-09-19

    Abstract: A semiconductor laser apparatus is provided and has a substrate, a first type cladding layer, a first type waveguide layer, an active layer, a second type waveguide layer, a second type cladding layer, and a capping layer disposed in sequence. The active layer has a light producing portion and a light emitting portion. A laser produced by the light producing portion, emits along a direction from the light producing portion toward the light emitting portion. The light emitting portion includes a first inactive region, a light emitting region, and a second inactive region. A refractive index of the light emitting region is lower than a refractive index of the first inactive region, the refractive index of the light emitting region is lower than a refractive index of the second inactive region, and width of a first part of the light emitting region continuously increases along the direction.

    LIGHT EMITTING ELEMENT
    10.
    发明申请

    公开(公告)号:US20180109076A1

    公开(公告)日:2018-04-19

    申请号:US15832248

    申请日:2017-12-05

    Inventor: Toru TAKAYAMA

    Abstract: A light emitting element according to the present disclosure includes: a GaN substrate; a first strain correction layer disposed above the GaN substrate and including InxGa1-xN of a first conductivity type where x is greater than 0 and less than or equal to 1; a first low refractive index layer disposed above the first strain correction layer, including In1-a-bGaaAlbN of the first conductivity type, and having relationships of (a/0.98)+(b/0.8)≥1, (a/1.02)+(b/0.85)≤1, and (a/1.03)+(b/0.68)≥1; a first clad layer disposed above the first low refractive index layer, including AlxGa1-xN of the first conductivity type where z is greater than or equal to 0.03 and less than or equal to 0.06, and having a refractive index higher than a refractive index of the first low refractive index layer; and an active layer disposed above the first clad layer.

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