公开(公告)号：US10006120B2

公开(公告)日：2018-06-26

申请号：US15099557

申请日：2016-04-14

Applicant: Samsung Display Co., Ltd.

Inventor： Junghan Seo ,  Sungmin Hur ,  Gyoseung Ku ,  Hyungjong Lee

IPC: H01L21/00 ,  C23C16/04 ,  C23C16/458 ,  C23C16/50 ,  C23C16/455 ,  H01J37/32 ,  H01L51/00

CPC classification number: C23C16/042 ,  C23C16/455 ,  C23C16/458 ,  C23C16/50 ,  H01J37/32366 ,  H01J37/3244 ,  H01L51/0008

Abstract: A plasma-enhanced chemical vapor deposition device includes: a sprayer to spray a gas onto a substrate; a lift to support a mask including a pattern through which the gas to be sprayed by the sprayer passes, and to raise or lower the mask; and a susceptor to support the substrate on which the gas to be passed through the mask is to be deposited, and to raise or lower the substrate, wherein the susceptor includes a first ground to electrically contact the mask during a deposition process during which the gas is deposited on the substrate.

公开(公告)号：US11739420B2

公开(公告)日：2023-08-29

申请号：US16892415

申请日：2020-06-04

Applicant: Samsung Display Co., LTD.

Inventor： Hyosung Kim ,  JinYoung Choi ,  Sungmin Hur ,  Hyunsang Seo ,  Hyun-Ju Lee ,  Manjae Park ,  Nari Ahn ,  Hyeongsuk Yoo ,  Dongwon Han

IPC: C23C16/04 ,  H01L27/32 ,  C22C38/08 ,  H10K50/844 ,  H10K59/12 ,  H10K71/00 ,  H10K71/10

CPC classification number: C23C16/042 ,  C22C38/08 ,  H10K50/844 ,  H10K59/12 ,  H10K71/00 ,  H10K71/10 ,  H10K59/1201

Abstract: A deposition mask includes a metal mask body in which a deposition opening is defined; and a coating layer including aluminum oxynitride, on an outer surface of the metal mask body.

公开(公告)号：US20160372715A1

公开(公告)日：2016-12-22

申请号：US15099557

申请日：2016-04-14

Applicant: Samsung Display Co., Ltd.

Inventor： Junghan Seo ,  Sungmin Hur ,  Gyoseung Ku ,  Hyungjong Lee

IPC: H01L51/56 ,  C23C16/04 ,  C23C16/455 ,  C23C16/458 ,  C23C16/50

CPC classification number: C23C16/042 ,  C23C16/455 ,  C23C16/458 ,  C23C16/50 ,  H01J37/32366 ,  H01J37/3244 ,  H01L51/0008

Abstract: A plasma-enhanced chemical vapor deposition device includes: a sprayer to spray a gas onto a substrate; a lift to support a mask including a pattern through which the gas to be sprayed by the sprayer passes, and to raise or lower the mask; and a susceptor to support the substrate on which the gas to be passed through the mask is to be deposited, and to raise or lower the substrate, wherein the susceptor includes a first ground to electrically contact the mask during a deposition process during which the gas is deposited on the substrate.

Abstract translation: 等离子体增强化学气相沉积装置包括：将气体喷射到基底上的喷雾器; 用于支撑包括通过喷雾器喷射的气体通过的图案的面罩的升降机，并且升高或降低面罩; 以及用于支撑要沉积通过掩模的气体的基底的基座，并且升高或降低基底，其中所述基座包括第一接地以在沉积过程期间电气接触所述掩模，在所述基底 沉积在基底上。