THIN FILM TRANSISTOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND DISPLAY DEVICE HAVING THE SAME
    1.
    发明申请
    THIN FILM TRANSISTOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND DISPLAY DEVICE HAVING THE SAME 有权
    薄膜晶体管基板,其制造方法及其显示装置

    公开(公告)号:US20140211117A1

    公开(公告)日:2014-07-31

    申请号:US13961714

    申请日:2013-08-07

    Abstract: A thin film transistor substrate is provided. The thin film transistor substrate includes a display area including a plurality of pixels, wherein the pixels are connected to gate lines and data lines, a gate driver connected to the gate lines, a plurality of data pads connected to the data lines, a plurality of dummy pattern parts formed of a same layer as the gate lines, and a non-display area in which the gate driver, data pads, and dummy pattern parts are disposed, and the dummy pattern parts are disposed in an area within the non-display area where the gate driver is not disposed, and one of the dummy pattern parts is disposed overlapping with the data pads.

    Abstract translation: 提供薄膜晶体管基板。 薄膜晶体管基板包括包括多个像素的显示区域,其中像素连接到栅极线和数据线,连接到栅极线的栅极驱动器,连接到数据线的多个数据焊盘,多个 由与栅极线相同的层形成的虚拟图形部分,以及设置栅极驱动器,数据焊盘和虚设图案部分的非显示区域,并且虚设图案部分设置在非显示器内的区域中 没有设置栅极驱动器的区域,并且虚设图案部分中的一个与数据焊盘重叠设置。

    OPTICAL SENSOR, ELECTRONIC APPARATUS INCLUDING THE SAME AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20210150177A1

    公开(公告)日:2021-05-20

    申请号:US16999672

    申请日:2020-08-21

    Abstract: An optical sensor includes: a sensing unit including a first sensing electrode, a second sensing electrode spaced apart from the first sensing electrode, and a sensing layer between the first sensing electrode and the second sensing electrode, the sensing layer containing amorphous silicon and germanium (Ge) ions impregnated in the amorphous silicon; and an optical pattern unit on the sensing unit and including a light shielding pattern and a plurality of transmission patterns in the light shielding pattern, wherein the sensing layer includes a first region, a second region, and a third region sequentially arranged from a boundary between the second sensing electrode and the sensing layer toward the first electrode, and a concentration of the germanium (Ge) ions in the amorphous silicon is relatively higher in the second region than in the first region and the third region.

    EXPOSURE APPARATUS AND METHOD THEREOF
    3.
    发明申请
    EXPOSURE APPARATUS AND METHOD THEREOF 有权
    曝光装置及其方法

    公开(公告)号:US20150049316A1

    公开(公告)日:2015-02-19

    申请号:US14226621

    申请日:2014-03-26

    CPC classification number: G03F7/70291 G03F7/70508 G03F7/7055

    Abstract: An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.

    Abstract translation: 曝光装置包括光源,照明构件,突出构件,台,检查构件和信息处理构件。 光源被配置为根据表示光辐射周期的脉冲事件生成(PEG)提供光。 照明构件被配置为将光改变为点光。 突出构件被配置为根据在各个方向上延伸的光致抗蚀剂形状来投射点光源。 点灯投射在舞台上。 检查构件被配置为检查由投影点光形成的光致抗蚀剂图案。 信息处理构件被配置为分析对应于不同PEG的不同光刻胶图案,以从不同的PEG中选择一个PEG。 一个PEG与各个方向上的最小误差相关联。

    METHOD OF MEASURING UNIFORMITY OF EXPOSING LIGHT AND EXPOSURE SYSTEM FOR PERFORMING THE SAME
    4.
    发明申请
    METHOD OF MEASURING UNIFORMITY OF EXPOSING LIGHT AND EXPOSURE SYSTEM FOR PERFORMING THE SAME 有权
    测量暴露光和曝光系统的均匀性的方法

    公开(公告)号:US20130141714A1

    公开(公告)日:2013-06-06

    申请号:US13669751

    申请日:2012-11-06

    CPC classification number: G01J1/00 G03F7/20 G03F7/70133

    Abstract: An exposure system includes an exposure apparatus, a mask, a test pattern portion and a uniformity measuring part. The exposure apparatus includes a first module and a second module. The first and second modules each emit light and are overlapped in an overlapping area. The mask includes a plurality of transmission portions which are spaced apart from each other. Each of the transmission portions has a width less than a width of the overlapping area. The test pattern portion includes a plurality of test patterns which are patterned by using the light transmitted through the transmission portions of the mask. The uniformity measuring part measures a uniformity of the test patterns.

    Abstract translation: 曝光系统包括曝光装置,掩模,测试图案部分和均匀度测量部分。 曝光装置包括第一模块和第二模块。 第一和第二模块各自发光并且在重叠区域中重叠。 掩模包括彼此间隔开的多个传输部分。 每个传输部分具有小于重叠区域的宽度的宽度。 测试图形部分包括通过使用透过掩模的透射部分的光而构图的多个测试图案。 均匀度测量部件测量测试图案的均匀性。

    DISPLAY DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE

    公开(公告)号:US20220059513A1

    公开(公告)日:2022-02-24

    申请号:US17520153

    申请日:2021-11-05

    Abstract: A display device including a pixel circuit, an insulation layer covering the pixel circuit, an etching prevention layer disposed on the insulation layer, a first guide layer, a second guide layer, a first electrode, a second electrode, and a light emitting element. The first guide layer and the second guide layer may be disposed on the etching prevention layer and spaced apart from each other. The first electrode may be disposed on the first guide layer and electrically connected to the pixel circuit. The second electrode may be disposed on the first guide layer and insulated from the first electrode. The light emitting element may be in contact with the top surface of the etching prevention layer, disposed between the first guide layer and the second guide layer on a plane, and electrically connected to the first electrode and the second electrode.

    DISPLAY DEVICE
    7.
    发明公开
    DISPLAY DEVICE 审中-公开

    公开(公告)号:US20240049554A1

    公开(公告)日:2024-02-08

    申请号:US18309610

    申请日:2023-04-28

    Abstract: A display device includes: a substrate; a transistor on the substrate; a light-emitting device connected to the transistor; an encapsulation layer on the light-emitting device; a sensing electrode on the encapsulation layer; a first insulating layer on the sensing electrode and including an opening; a second insulating layer on the encapsulation layer and the first insulating layer; and a third insulating layer between the first insulating layer and the second insulating layer, wherein a refractive index of the second insulating layer is greater than a refractive index of the first insulating layer.

    STAGE TRANSFERRING DEVICE AND POSITION MEASURING METHOD THEREOF
    8.
    发明申请
    STAGE TRANSFERRING DEVICE AND POSITION MEASURING METHOD THEREOF 有权
    阶段传送装置及其位置测量方法

    公开(公告)号:US20140204392A1

    公开(公告)日:2014-07-24

    申请号:US13959864

    申请日:2013-08-06

    CPC classification number: G03F7/70775

    Abstract: A stage transferring device invention includes: a transferring stage upon which an object is mounted and which transfers the object in an x-y plane; and a stage position measuring device. The stage position measuring device includes a one-dimensional scale on the transferring stage; a one-dimensional scale reading head which is configured to overlap the one-dimensional scale, irradiate a measuring beam to the overlapped one-dimensional scale and measure a 1D y-axis coordinate of the transferring stage; a two-dimensional encoder on the transferring stage; and a two-dimensional encoder reading head which is configured to overlap the two-dimensional encoder, irradiate a measuring beam to the overlapped two-dimensional encoder and measure a 2D x-axis coordinate and a 2D y-axis coordinate of the transferring stage.

    Abstract translation: 舞台转移装置发明包括:传送台,物体安装在该传送台上,并在x-y平面内传送物体; 和台架位置测量装置。 舞台位置测量装置在转印台上包括一维刻度; 被配置为与一维刻度重叠的一维刻度读取头,将测量光束照射到重叠的一维刻度并测量转印台的1Dy轴坐标; 转印台上的二维编码器; 以及被构造成与二维编码器重叠的二维编码器读取头,将测量光束照射到重叠的二维编码器,并测量转印台的2D x轴坐标和2D y轴坐标。

    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME
    9.
    发明申请
    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME 审中-公开
    显示装置及其制造方法

    公开(公告)号:US20140176847A1

    公开(公告)日:2014-06-26

    申请号:US13856713

    申请日:2013-04-04

    CPC classification number: H01L51/5246 G02F1/1337 G02F1/1339 Y10T156/10

    Abstract: A method of manufacturing a display device includes: providing an outline frame on a first substrate; and providing a thin film by dropping a thin film material inside a boundary defined by the outline frame. The outline frame limits a boundary of the thin film, and the frame material of the outline frame includes a material having a surface energy that is less than a surface energy of the thin film material of the thin film.

    Abstract translation: 一种制造显示装置的方法包括:在第一基板上提供轮廓框架; 以及通过在由轮廓框限定的边界内放置薄膜材料来提供薄膜。 轮廓框架限制了薄膜的边界,并且轮廓框架的框架材料包括具有小于薄膜的薄膜材料的表面能的表面能的材料。

Patent Agency Ranking