公开(公告)号：US20250046587A1

公开(公告)日：2025-02-06

申请号：US18636099

申请日：2024-04-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Taehyun Kim ,  Chansoo Kang ,  Minju Kim ,  Daewon Kang ,  Dougyong Sung ,  Jungmo Yang ,  Sejin Oh

IPC: H01J37/32 ,  H01L21/67

Abstract: The present disclosure relates to plasma diagnostic devices. An example plasma diagnostic device includes a pinhole through which a first optical signal passes, an optical device in which the first optical signal is incident and the first optical signal is converted into a second optical signal, a filter configured to filter the second optical signal and to output a third optical signal of a specific wavelength band, and a sensor configured to monitor a distribution of the first optical signal, the second optical signal, and the third optical signal.

公开(公告)号：US12087550B2

公开(公告)日：2024-09-10

申请号：US17874475

申请日：2022-07-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Vladimir Vsevolodovich Protopopov ,  Vasily Grigorievich Pashkovskiy ,  Chansoo Kang ,  Youngdo Kim ,  Hoonseop Kim ,  Sangki Nam ,  Sejin Oh ,  Changsoon Lim

IPC: H01J37/32

CPC classification number: H01J37/32201 ,  H01J37/32935

Abstract: A device for measuring a density of plasma is provided. The device includes a first sensor configured to measure a microwave spectrum of an input port reflection parameter of plasma, the first sensor having a probe including a conductive material and a flat plate shape, and a second sensor configured to measure an optical signal generated from the plasma, the second sensor being configured to detect the optical signal through the probe of the first sensor.

公开(公告)号：US11996275B2

公开(公告)日：2024-05-28

申请号：US17942368

申请日：2022-09-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sungyong Lim ,  Chansoo Kang ,  Youngdo Kim ,  Namkyun Kim ,  Sungyeol Kim ,  Sangki Nam ,  Seungbo Shim ,  Kyungmin Lee

IPC: H01J37/32 ,  G01J1/44

CPC classification number: H01J37/32935 ,  G01J1/44 ,  H01J37/32174 ,  G01J2001/446

Abstract: A diagnostic device for diagnosing distribution of a radical in a plasma processing chamber, the diagnostic device, may include a spectrometer receiving an optical signal through at least one optical channel connected to the plasma processing chamber, and performing spectral analysis on the optical signal in response to a synchronization signal corresponding to each of states of a multi-level pulse applied to the plasma processing chamber and a synchronizer generating the synchronization signal corresponding to each of the states of the multi-level pulse.

公开(公告)号：US20250085445A1

公开(公告)日：2025-03-13

申请号：US18633031

申请日：2024-04-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Chansoo Kang ,  Daewon Kang ,  Minju Kim ,  Tae-Hyun Kim ,  Sang Ki Nam ,  Dougyong Sung ,  Jungmo Yang ,  Sejin Oh ,  Keonhee Lim ,  Junho Im

IPC: G01T1/36 ,  G01T1/20 ,  H01L21/67

Abstract: A substrate processing apparatus includes a process chamber providing a process space, a stage located in the process chamber and configured to support a substrate, a window coupled to a side of the process chamber, and a scintillator layer coupled to one side surface of the window. The scintillator layer covers a portion of the one side surface of the window which is less than the full window surface. A second surface corresponding to another portion of the one side surface of the window is exposed. Light emitted by a plasma in the process space passes through the window and is collected by an optical system and analyzed. Ultraviolet light passing through the scintillator is converted to longer wavelength, generally visible, light. Comparing the light passing through the bare window with the light passing through the scintillator layer enables analysis of the plasma.

公开(公告)号：US11940620B2

公开(公告)日：2024-03-26

申请号：US17508224

申请日：2021-10-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Changsoon Lim ,  Youngdo Kim ,  Daewon Kang ,  Chansoo Kang ,  Hoonseop Kim ,  Sangki Nam ,  Youngduk Suh ,  Donghyub Lee ,  Jonghun Pi

IPC: G02B27/00 ,  B08B7/00 ,  B08B7/04 ,  G01N33/00 ,  G03F7/00 ,  G06T7/00

CPC classification number: G02B27/0006 ,  B08B7/0035 ,  B08B7/04 ,  G01N33/0027 ,  G03F7/70033 ,  G03F7/7085 ,  G03F7/70925 ,  G06T7/001

Abstract: A method of cleaning a collector of an extreme ultraviolet light source system includes introducing the collector separated from the extreme ultraviolet light source system into a chamber; capturing an optical image of a reflective surface of the collector; measuring a contamination level of the reflective surface by comparing the optical image with a prestored standard image; performing a first cleaning operation if the contamination level exceeds a preset first reference value, the first cleaning operation including cleaning the reflective surface by spraying dry ice particles onto the reflective surface; and performing a second cleaning operation if the contamination level is less than or equal to the preset first reference value. The second cleaning operation includes cleaning the reflective surface by radiating atmospheric plasma onto the reflective surface and measuring a microcontamination level and a damage level of the reflective surface.

公开(公告)号：US20230109672A1

公开(公告)日：2023-04-13

申请号：US17850257

申请日：2022-06-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Changsoon Lim ,  Youngdo Kim ,  Daewon Kang ,  Chansoo Kang ,  Kyunghyun Kim ,  Sangki Nam ,  Kyunjin Lee ,  Sungho Jang ,  Jonghun Pi

IPC: H01J37/32

Abstract: An apparatus includes first and second VI sensors, an optical sensor, and an arcing detector. The first VI sensor is disposed in a power filter or on a power supply line connected to a heater disposed in a lower electrode of a process chamber in which a plasma process is performed. The first VI sensor senses a harmonic generated from a first power supply supplying power to the lower electrode and outputs a first signal. The optical sensor senses an intensity of light generated from the process chamber and outputs a second signal. The second VI sensor is disposed on a power supply line connected to an upper electrode and senses a harmonic generated from a second power supply supplying power to the upper electrode and outputs a third signal. The arcing detector determines whether arcing occurs based on one or more of the first, second, and third signals.