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公开(公告)号:US20240413631A1
公开(公告)日:2024-12-12
申请号:US18733208
申请日:2024-06-04
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Kyoungil DO , Chanhee JEON , Jooyoung SONG , Jinwoo JUNG
IPC: H02H9/04 , H01L27/02 , H03K17/60 , H03K17/687
Abstract: A device includes: a first silicon-controlled rectifier comprising a first PNP bipolar junction transistor (BJT) and a first NPN BJT in which bases and collectors are cross-coupled; and a field effect transistor (FET) configured to, based on an electrostatic discharge occurring between an anode of the first silicon-controlled rectifier and a cathode of the first silicon-controlled rectifier, trigger the first silicon-controlled rectifier. An emitter of the first PNP BJT corresponds to a plurality of first p+ regions being spaced apart from each other in a first direction. The FET is connected to the first silicon-controlled rectifier through at least one first n+ region disposed between the plurality of first p+ regions.
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公开(公告)号:US20240312985A1
公开(公告)日:2024-09-19
申请号:US18515524
申请日:2023-11-21
Applicant: Samsung Electronics Co., Ltd.
Inventor: JONGKYU SONG , JIN HEO , Minho KIM , Jooyoung SONG , EUNSUK LEE , CHANHEE JEON
CPC classification number: H01L27/067 , H01L27/0817
Abstract: Disclosed is an electrostatic discharge protection device which includes a substrate including a first well having a first conductivity type and a second well surrounding the first well, first to fifth diffusion regions formed on the first well, and sixth and seventh diffusion regions formed on the second well. The second diffusion region surrounds the first diffusion region, the fourth diffusion region surrounds the fifth diffusion region, and the fifth diffusion region surrounds the second diffusion region and the fourth diffusion region. The sixth diffusion region surrounds the fifth diffusion region, and the seventh diffusion region surrounds the sixth diffusion region. The sixth and seventh diffusion regions are connected to an anode electrode, and the first to fifth diffusion regions are connected a cathode electrode.
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公开(公告)号:US20240105711A1
公开(公告)日:2024-03-28
申请号:US18361892
申请日:2023-07-30
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: JONGKYU SONG , Minho KIM , JIN HEO , Kyoungil DO , Jooyoung SONG , CHANHEE JEON
CPC classification number: H01L27/0262 , H01L27/0255 , H01L27/0292 , H02H9/046
Abstract: An electro-static discharge protection device includes a substrate that includes a first well that has a first conductive type and a second well that has a second conductive type, and first to eighth diffusion regions formed on the first well and the second well. At least a portion of the diffusion regions formed in the first well are connected to a first electrode, and at least a portion of diffusion regions formed in a second well are connected to a second electrode. The contact between one of diffusion regions formed in the first well and an N well forms a trigger diode. A junction between one of diffusion regions formed in a second well and a P well forms a trigger diode. The trigger diodes are electrically connected to each other.
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公开(公告)号:US20240145463A1
公开(公告)日:2024-05-02
申请号:US18384677
申请日:2023-10-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Kyoungil DO , Jinwoo JUNG , Jooyoung SONG , Mijin LEE , Chanhee JEON
CPC classification number: H01L27/0262 , H01L29/7408
Abstract: A device including a silicon controlled rectifier including an anode and a cathode; at least one first transistor connected between the anode and a gate of the silicon controlled rectifier; and a second transistor including a source connected to one from among the cathode or the anode, and a drain connected to a body of the at least one first transistor.
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公开(公告)号:US20230357123A1
公开(公告)日:2023-11-09
申请号:US18119388
申请日:2023-03-09
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jonghoon KIM , Suk Koo HONG , Young Gyu KIM , Jooyoung SONG , Hae Min YANG , Gumhye JEON , Juhee KIM , Sunah LEE , Ahhyun LEE , Hong Won LEE
IPC: C07C205/06 , G03F7/038 , G03F7/004 , G03F7/029
CPC classification number: C07C205/06 , G03F7/0382 , G03F7/0048 , G03F7/029
Abstract: A photoresist composition, a method of forming a pattern, and a method of synthesizing 6-nitrochrysene, the photoresist composition includes a polymer resin; a photo acid generator; a quencher; an organic solvent; and an etching resistance enhancer, wherein the etching resistance enhancer is represented by the following Chemical Formula 1,
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