公开(公告)号：US11913114B2

公开(公告)日：2024-02-27

申请号：US16983142

申请日：2020-08-03

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jae Hyun Yang ,  Sang Yub Ie ,  Tae Yong Kim ,  Phil Ouk Nam

IPC: C23C16/455 ,  H01L21/67 ,  H01L21/673

CPC classification number: C23C16/45578 ,  C23C16/45546 ,  C23C16/45595 ,  H01L21/67 ,  H01L21/673

Abstract: A semiconductor manufacturing apparatus including a process chamber and a boat having a support member supporting substrates arranged in a first direction. An inner tube encloses the boat and includes a slit along a side wall. A nozzle supplies a process gas and includes a gas injection port at a position corresponding to the slit. The gas injection port includes a first inlet and first outlet. The slit includes a second inlet and second outlet. A distance to an end of the first inlet from a center line that connects a center of the first inlet and a center of the second outlet is different from the distance from the center line to an end of the first outlet and/or a distance from the center line to an end of the second inlet is different from a distance from the center line to an end of the second outlet.

公开(公告)号：US20190228120A1

公开(公告)日：2019-07-25

申请号：US16127692

申请日：2018-09-11

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sang Yub Ie ,  Jung Geun Jee ,  Sung Youn Chung ,  Jae Myung Choe

IPC: G06F17/50 ,  C23C16/455

Abstract: An apparatus for generating 3D shape data of a showerhead includes: a data processor that generates data sets comprising information indicating values of a first distance between an upper surface of a wafer and a showerhead, information indicating positions on the wafer and information about a fluid flow physical quantity value and determines a function representing a relationship among the various information; an input unit that receives condition data comprising a target fluid flow physical quantity value for each of the positions; and a database that stores information about the function. The data processor obtains information about a second distance, which has the target fluid flow physical quantity value, between the upper surface of the wafer and the showerhead at each of the positions, extracts spatial coordinate information of a lower surface of the showerhead, and generates 3D shape data of the showerhead using the spatial coordinate information.

公开(公告)号：US11182518B2

公开(公告)日：2021-11-23

申请号：US16127692

申请日：2018-09-11

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sang Yub Ie ,  Jung Geun Jee ,  Sung Youn Chung ,  Jae Myung Choe

IPC: G06F30/20 ,  C23C16/455 ,  G06F30/17

Abstract: An apparatus for generating 3D shape data of a showerhead includes: a data processor that generates data sets comprising information indicating values of a first distance between an upper surface of a wafer and a showerhead, information indicating positions on the wafer and information about a fluid flow physical quantity value and determines a function representing a relationship among the various information; an input unit that receives condition data comprising a target fluid flow physical quantity value for each of the positions; and a database that stores information about the function. The data processor obtains information about a second distance, which has the target fluid flow physical quantity value, between the upper surface of the wafer and the showerhead at each of the positions, extracts spatial coordinate information of a lower surface of the showerhead, and generates 3D shape data of the showerhead using the spatial coordinate information.

公开(公告)号：US20190292664A1

公开(公告)日：2019-09-26

申请号：US16190558

申请日：2018-11-14

Applicant: Samsung Electronics Co., Ltd.

Inventor： Heon Bok Lee ,  Dae Yong Kim ,  Dong Woo Kim ,  Jun Ki Park ,  Sang Yub Ie ,  Sang Jin Hyun

IPC: C23C16/455 ,  H01L21/285

Abstract: A substrate processing apparatus is provided. The substrate processing apparatus includes a substrate chuck, a shower head structure over the substrate chuck, and a gas distribution apparatus connected to the shower head structure. The gas distribution apparatus includes a dispersion container including a first dispersion space and a gas inlet section on the dispersion container. The gas inlet section includes a first inlet pipe including a first inlet path fluidly connected to the first dispersion space and a second inlet pipe including a second inlet path fluidly connected to the first dispersion space. The second inlet pipe surrounds at least a portion of a sidewall of the first inlet pipe.

公开(公告)号：US10557198B2

公开(公告)日：2020-02-11

申请号：US16190558

申请日：2018-11-14

Applicant: Samsung Electronics Co., Ltd.

Inventor： Heon Bok Lee ,  Dae Yong Kim ,  Dong Woo Kim ,  Jun Ki Park ,  Sang Yub Ie ,  Sang Jin Hyun

IPC: H01L21/285 ,  C23C16/455

Abstract: A substrate processing apparatus is provided. The substrate processing apparatus includes a substrate chuck, a shower head structure over the substrate chuck, and a gas distribution apparatus connected to the shower head structure. The gas distribution apparatus includes a dispersion container including a first dispersion space and a gas inlet section on the dispersion container. The gas inlet section includes a first inlet pipe including a first inlet path fluidly connected to the first dispersion space and a second inlet pipe including a second inlet path fluidly connected to the first dispersion space. The second inlet pipe surrounds at least a portion of a sidewall of the first inlet pipe.