公开(公告)号：US20230272279A1

公开(公告)日：2023-08-31

申请号：US18176215

申请日：2023-02-28

Applicant: DONGWOO FINE-CHEM CO., LTD. ,  SAMSUNG ELECTRONICS CO., LTD

Inventor： Ji-Won Kim ,  Jin-Kyu Roh ,  Hyo-Joong Yoon ,  Han-Woo Park ,  Min-Jae Sung ,  Soo-Jin Kim ,  Jung-Min Oh ,  Sang-Won Bae

IPC: C09K13/06

CPC classification number: C09K13/06 ,  H01L21/32134

Abstract: Disclosed is a ruthenium etchant composition containing periodic acid and ammonium ions and having a pH of 6 to 7.5. Further disclosed are a pattern formation method including a step of etching a ruthenium metal film using the etchant composition, a method of manufacturing a display device array substrate by employing the pattern formation method, and a display device array substrate manufactured by the method.

公开(公告)号：US09394509B2

公开(公告)日：2016-07-19

申请号：US14542973

申请日：2014-11-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sang-Won Bae ,  Yong-Sun Ko ,  Seok-Hoon Kim ,  In-Gi Kim ,  Jung-Min Oh ,  Kun-Tack Lee ,  Hyo-San Lee ,  Ji-Hoon Jeong ,  Yong-Jhin Cho

IPC: H01L21/20 ,  C11D11/00 ,  H01L21/02 ,  C11D7/08 ,  C11D7/50 ,  C11D7/10

CPC classification number: C11D11/0047 ,  C11D7/08 ,  C11D7/10 ,  C11D7/5022 ,  H01L21/02063 ,  H01L21/02068 ,  H01L21/02071

Abstract: A cleaning solution composition includes an organic solvent in which a metal fluoride does not dissolve, at least one fluoride compound that generates bifluoride (HF2−), and deionized water, wherein the deionized water may be included in a concentration of 1.5 wt % or lower based on the total weight of the cleaning solution composition.

Abstract translation: 清洗液组合物包括金属氟化物不溶解的有机溶剂，至少一种产生氟化氢的氟化物（HF2-）和去离子水，其中可以以1.5重量％以下的浓度包含去离子水 基于清洁溶液组合物的总重量。

公开(公告)号：US20150299629A1

公开(公告)日：2015-10-22

申请号：US14542973

申请日：2014-11-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sang-Won Bae ,  Yong-Sun Ko ,  Seok-Hoon Kim ,  In-Gi Kim ,  Jung-Min Oh ,  Kun-Tack Lee ,  Hyo-San Lee ,  Ji-Hoon Jeong ,  Yong-Jhin Cho

IPC: C11D11/00 ,  C11D7/08 ,  C11D7/50 ,  H01L21/02

CPC classification number: C11D11/0047 ,  C11D7/08 ,  C11D7/10 ,  C11D7/5022 ,  H01L21/02063 ,  H01L21/02068 ,  H01L21/02071

Abstract: A cleaning solution composition includes an organic solvent in which a metal fluoride does not dissolve, at least one fluoride compound that generates bifluoride (HF2−), and deionized water, wherein the deionized water may be included in a concentration of 1.5 wt % or lower based on the total weight of the cleaning solution composition.

Abstract translation: 清洗液组合物包括金属氟化物不溶解的有机溶剂，至少一种产生氟化氢的氟化物（HF2-）和去离子水，其中可以以1.5重量％以下的浓度包含去离子水 基于清洁溶液组合物的总重量。