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    Imprint lithography method and apparatus
    1.
    发明授权
    Imprint lithography method and apparatus 有权
    压印光刻方法和装置

    公开(公告)号：US08696969B2

    公开(公告)日：2014-04-15

    申请号：US12698368

    申请日：2010-02-02

    申请人： Sander Frederik Wuister ,  Johan Frederik Dijksman ,  Yvonne Wendela Kruijt-Stegeman ,  Jeroen Herman Lammers ,  Leendert Van Der Tempel

    发明人： Sander Frederik Wuister ,  Johan Frederik Dijksman ,  Yvonne Wendela Kruijt-Stegeman ,  Jeroen Herman Lammers ,  Leendert Van Der Tempel

    IPC分类号： B29C59/02

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： An imprint lithography method is provided. The method includes undertaking first and second imprints, which comprises for each imprint: for an area of a substrate provided with a plurality of drops of imprintable medium in respectively first and second configurations, imprinting a pattern in the imprintable medium using a same imprint template, pockets being formed between the drops of the imprintable medium, the imprint template and the substrate during the imprinting of the pattern, wherein the first configuration of drops of imprintable medium is different from the second configuration of drops of imprintable medium, such that pockets formed during the second imprint are formed at different locations relative to the imprint template to pockets formed during the first imprint.

    摘要翻译： 提供压印光刻方法。 该方法包括进行第一和第二印记，其包括用于每个印记：对于分别具有多个可压印介质的第一和第二配置的液滴的基板的区域，使用相同的印模模板将图案压印在可压印介质中， 在压印图案期间，在可压印介质的液滴，压印模板和基板之间形成凹穴，其中可压印介质的液滴的第一配置不同于可压印介质的液滴的第二配置， 第二印记形成在相对于印模模板的不同位置，形成在第一印记中形成的凹坑。

    IMPRINT LITHOGRAPHY METHOD AND APPARATUS
    2.
    发明申请
    IMPRINT LITHOGRAPHY METHOD AND APPARATUS 有权
    印刷方法和装置

    公开(公告)号：US20100193994A1

    公开(公告)日：2010-08-05

    申请号：US12698368

    申请日：2010-02-02

    申请人： Sander Frederik WUISTER ,  Johan Frederik Dijksman ,  Yvonne Wendela Kruijt-Stegeman ,  Jeroen Herman Lammers ,  Leendert Van Der Tempel

    发明人： Sander Frederik WUISTER ,  Johan Frederik Dijksman ,  Yvonne Wendela Kruijt-Stegeman ,  Jeroen Herman Lammers ,  Leendert Van Der Tempel

    IPC分类号： B29C59/02

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： An imprint lithography method is provided. The method includes undertaking first and second imprints, which comprises for each imprint: for an area of a substrate provided with a plurality of drops of imprintable medium in respectively first and second configurations, imprinting a pattern in the imprintable medium using a same imprint template, pockets being formed between the drops of the imprintable medium, the imprint template and the substrate during the imprinting of the pattern, wherein the first configuration of drops of imprintable medium is different from the second configuration of drops of imprintable medium, such that pockets formed during the second imprint are formed at different locations relative to the imprint template to pockets formed during the first imprint.

    摘要翻译： 提供压印光刻方法。 该方法包括进行第一和第二印记，其包括用于每个印记：对于分别具有多个可压印介质的第一和第二配置的液滴的基板的区域，使用相同的印模模板将图案压印在可压印介质中， 在压印图案期间，在可压印介质的液滴，压印模板和基板之间形成凹穴，其中可压印介质的液滴的第一配置不同于可压印介质的液滴的第二配置， 第二印记形成在相对于印模模板的不同位置，形成在第一印记中形成的凹坑。

    Imprint lithography
    7.
    发明申请
    Imprint lithography 有权
    印刷光刻

    公开(公告)号：US20080018875A1

    公开(公告)日：2008-01-24

    申请号：US11488171

    申请日：2006-07-18

    申请人： Ivar Schram ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Jeroen Herman Lammers

    发明人： Ivar Schram ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Jeroen Herman Lammers

    IPC分类号： G03B27/54

    CPC分类号： B05D5/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate and moving the substrate, the print head, or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets.

    摘要翻译： 公开了一种将可压印介质沉积到用于压印光刻的基板的目标区域上的方法。 该方法包括移动基板，包括喷嘴的打印头，以在横过目标区域的第一方向上相对于另一方弹出可压印介质，同时将可压印介质的第一系列液滴喷射到基板上 以及相对于另一个相对于第二相对方向移动所述基底，所述打印头或两者，跨过所述目标区域，同时在所述第一系列液滴的液滴上或邻近所述基底上喷射可压印介质的第二系列液滴。

    Imprint lithography
    8.
    发明授权
    Imprint lithography 有权
    印刷光刻

    公开(公告)号：US08707890B2

    公开(公告)日：2014-04-29

    申请号：US11488171

    申请日：2006-07-18

    申请人： Ivar Schram ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Jeroen Herman Lammers

    发明人： Ivar Schram ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Jeroen Herman Lammers

    IPC分类号： B05C7/06

    CPC分类号： B05D5/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate and moving the substrate, the print head, or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets.

    摘要翻译： 公开了一种将可压印介质沉积到用于压印光刻的基板的目标区域上的方法。 该方法包括移动基板，包括喷嘴的打印头，以在横过目标区域的第一方向上相对于另一方弹出可压印介质，同时将可压印介质的第一系列液滴喷射到基板上 以及相对于另一个相对于第二相对方向移动所述基底，所述打印头或两者，跨过所述目标区域，同时在所述第一系列液滴的液滴上或邻近所述基底上喷射可压印介质的第二系列液滴。