Imprint lithography apparatus and method
    5.
    发明授权
    Imprint lithography apparatus and method 有权
    压印光刻设备及方法

    公开(公告)号:US09547235B2

    公开(公告)日:2017-01-17

    申请号:US12898084

    申请日:2010-10-05

    IPC分类号: G03F7/00 B82Y10/00 B82Y40/00

    摘要: An imprint lithography method is disclosed for forming a patterned layer from an imprintable liquid medium on a substrate by means of an imprint template having a patterned surface. The method involves contacting the patterned surface and imprintable liquid medium together for a filling period. Light emergent (e.g., scattered or reflected) from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an estimated end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be undertaken more rapidly, with reduced risk of defects arising from remnants of unfilled voids. An imprint lithography apparatus and component for putting the method into effect are also disclosed.

    摘要翻译: 公开了一种压印光刻方法,用于通过具有图案化表面的压印模板从衬底上的可压印液体介质形成图案化层。 该方法包括将图案化表面和可压印液体介质接合在一起,以达到填充时间。 在填充期间收集和测量从介质和图案化表面之间的界面出现的轻微的(例如,散射或反射)以获得关于界面处的一个或多个空隙的数据,并且导出填充时间的估计结束时间 从数据和时间之间的关系。 该方法可以允许更快速地进行随后的工艺步骤,同时减少由未填充的空隙残余物引起的缺陷的风险。 还公开了一种用于使该方法生效的压印光刻设备和组件。

    IMPRINT LITHOGRAPHY APPARATUS AND METHOD
    6.
    发明申请
    IMPRINT LITHOGRAPHY APPARATUS AND METHOD 有权
    IMPRINT LITHOGRAPHY APPARATUS和方法

    公开(公告)号:US20110079939A1

    公开(公告)日:2011-04-07

    申请号:US12898084

    申请日:2010-10-05

    IPC分类号: B29C59/16 B29B13/08

    摘要: An imprint lithography method is disclosed for forming a patterned layer from an imprintable liquid medium on a substrate by means of an imprint template having a patterned surface. The method involves contacting the patterned surface and imprintable liquid medium together for a filling period. Light emergent (e.g., scattered or reflected) from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an estimated end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be undertaken more rapidly, with reduced risk of defects arising from remnants of unfilled voids. An imprint lithography apparatus and component for putting the method into effect are also disclosed.

    摘要翻译: 公开了一种压印光刻方法,用于通过具有图案化表面的压印模板从衬底上的可压印液体介质形成图案化层。 该方法包括将图案化表面和可压印液体介质接合在一起,以达到填充时间。 在填充期间收集和测量从介质和图案化表面之间的界面出现的轻微的(例如,散射或反射)以获得关于界面处的一个或多个空隙的数据,并且导出填充时间的估计结束时间 从数据和时间之间的关系。 该方法可以允许更快速地进行随后的工艺步骤,同时减少由未填充的空隙残余物引起的缺陷的风险。 还公开了一种用于使该方法生效的压印光刻设备和组件。