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18 条记录 (耗时 0.051 秒)

    EXPANDABLE MEMBER WITH WAVE INHIBITOR AND METHODS OF USING THE SAME
    3.
    发明申请
    EXPANDABLE MEMBER WITH WAVE INHIBITOR AND METHODS OF USING THE SAME 有权
    具有波形抑制剂的可膨胀构件及其使用方法

    公开(公告)号：US20100000280A1

    公开(公告)日：2010-01-07

    申请号：US12399817

    申请日：2009-03-06

    申请人： Leonard Frederick Reid ,  James Ross ,  Tim Johnson ,  Taeksun Nam ,  Doug Glenn ,  Matt Shultz

    发明人： Leonard Frederick Reid ,  James Ross ,  Tim Johnson ,  Taeksun Nam ,  Doug Glenn ,  Matt Shultz

    IPC分类号： B21D39/08

    CPC分类号： B23P9/025 ,  B21D24/02 ,  B21D39/06 ,  B21J15/04

    摘要： A member has a wave inhibitor adapted to control the effects of a wave of longitudinally displaced material positioned ahead of an expansion mandrel used to expand the member. The wave inhibitor has a decreasing transverse cross-sectional area to diminish the effects attributable to the wave, such as workpiece distortions, material upset of the workpiece, lengthening of the member, and excessively high strains in the workpiece. The wave inhibitor can also induce radially compressive stresses in the workpiece and produce an interference fit.

    摘要翻译： 一个构件具有适于控制位于用于膨胀构件的膨胀心轴前方的纵向置换材料的波的影响的波浪抑制器。 波形抑制剂具有减小的横截面积，以减少归因于波的影响，例如工件变形，工件的材料镦粗，构件的延长以及工件中的过大的应变。 波浪抑制剂还可以在工件中引起径向压缩应力并产生干涉配合。

    Multiple species sputtering for improved bottom coverage and improved sputter rate
    4.
    发明授权
    Multiple species sputtering for improved bottom coverage and improved sputter rate 失效
    用于改善底部覆盖和改善溅射速率的多种溅射

    公开(公告)号：US6083358A

    公开(公告)日：2000-07-04

    申请号：US53354

    申请日：1998-04-01

    申请人： P. J. Ireland ,  Howard Rhodes ,  Sujit Sharan ,  Sukesh Sandhu ,  Tim O'Brien ,  Tim Johnson

    发明人： P. J. Ireland ,  Howard Rhodes ,  Sujit Sharan ,  Sukesh Sandhu ,  Tim O'Brien ,  Tim Johnson

    IPC分类号： C23C14/04 ,  C23C14/35 ,  H01L21/762 ,  H01L21/768 ,  C23C14/34

    CPC分类号： C23C14/35 ,  C23C14/046 ,  H01L21/762 ,  H01L21/76877

    摘要： An improved sputtering process increases the perpendicularity of the sputtered flux to the target surface by bombarding the target with both low and high mass ions, with low mass ions predominating, packing the target with both low and high mass implanted ions, and causing target atoms ejected as a result of high mass incident ions to have a higher probability of perpendicular or near perpendicular ejection. An alternative improved sputtering process bombards the target with both low and high mass ions, with high mass ions predominating, resulting in a higher sputter rate than achievable with either the high or low mass species alone. Including in either process as the high or the low mass species a species having a lower ionization energy than a standard species allows a reduced pressure plasma, resulting in less scattering of the sputtered flux. A low ionization energy species may also be employed to assist in striking a plasma before sputtering by a single species during deposition.

    摘要翻译： 改进的溅射工艺通过以低质量离子和高质量离子轰击靶，通过以低质量离子为主来增加溅射通量对目标表面的垂直度，用低质量和高质量注入离子填充目标，并引起目标原子喷出 作为高质量入射离子的结果具有更高的垂直或近似垂直喷射的概率。 一种替代的改进的溅射工艺用低和高质量离子轰击靶，以高质量离子为主，导致比单独使用高质量或低质量物质可实现的更高的溅射速率。 在任一过程中，作为高质量或低质量物质，具有比标准物质更低的电离能的物质允许减压等离子体，导致溅射通量的较少散射。 也可以使用低电离能种来在沉积期间通过单一物质在溅射之前帮助击打等离子体。

    Over-the-cab loader and carrier
    5.
    发明授权
    Over-the-cab loader and carrier 失效
    超车驾驶员和承运人

    公开(公告)号：US5846045A

    公开(公告)日：1998-12-08

    申请号：US929384

    申请日：1997-09-15

    申请人： Tim Johnson ,  Ron Johnson ,  Robert Ellis

    发明人： Tim Johnson ,  Ron Johnson ,  Robert Ellis

    IPC分类号： B60P1/64 ,  B60P3/10 ,  B60R9/042 ,  B60R9/00

    CPC分类号： B60R9/042 ,  B60P1/6454 ,  B60P3/1025

    摘要： An over-the-cab transporting device, including a pair of tracks extending from a position adjacent the vehicle-supporting surface over the cab to a position aft of the cab. A load-carrying platform moves from a position partly supported by the vehicle-supporting surface for loading and unloading to a position above the cab, where it is secured for transport.

    摘要翻译： 一种驾驶室外传送装置，包括从驾驶室附近的车辆支撑表面的位置延伸到驾驶室后方的位置的一对轨道。 承载平台从部分由车辆支撑表面支撑的位置移动以用于装载和卸载到驾驶室上方的位置，在该位置被固定用于运输。

    Fluid jet PMR
    6.
    发明授权
    Fluid jet PMR 失效
    流体喷射PMR

    公开(公告)号：US06544220B2

    公开(公告)日：2003-04-08

    申请号：US09780698

    申请日：2001-02-14

    申请人： Brandon J. Shuman ,  Tim Johnson ,  Joseph Pearce ,  Zihong Guo

    发明人： Brandon J. Shuman ,  Tim Johnson ,  Joseph Pearce ,  Zihong Guo

    IPC分类号： A61M2900

    CPC分类号： A61B17/32037 ,  A61B2017/00247 ,  A61B2018/00392

    摘要： A system for performing fluid jet myocardial revascularization includes a catheter having a proximal region, a distal region, a lumen extending therethrough and a valve disposed in the lumen for allowing the passage of fluids in the lumen to create holes in the myocardium. A valve control means extends through the proximal region of the catheter to open and close the valve. In one embodiment, the valve also includes a biasing mechanism for biasing the valve in a closed position. The valve may be controlled using an electrically actuated device that is heated with an electrical current to open and close the valve. In one embodiment of the invention, the catheter has a wall that can be expanded within a guide catheter to anchor the catheter during revascularization.

    摘要翻译： 用于进行流体射流心肌血运重建的系统包括具有近端区域，远端区域，延伸穿过其中的腔的导管和设置在内腔中的阀，用于允许腔内的流体通过以在心肌中产生孔。 阀控制装置延伸穿过导管的近端区域以打开和关闭阀。 在一个实施例中，阀还包括用于将阀偏置在关闭位置的偏置机构。 可以使用电动致动装置来控制阀，该电驱动装置用电流加热以打开和关闭阀。 在本发明的一个实施例中，导管具有可以在引导导管内扩张以在血运重建期间锚定导管的壁。

    PLASMA METHOD AND APPARATUS FOR RECOVERY OF PRECIOUS METALS
    8.
    发明申请
    PLASMA METHOD AND APPARATUS FOR RECOVERY OF PRECIOUS METALS 有权
    用于回收重金属的等离子体方法和装置

    公开(公告)号：US20110274580A1

    公开(公告)日：2011-11-10

    申请号：US13130886

    申请日：2009-11-24

    申请人： David Deegan ,  Tim Johnson

    发明人： David Deegan ,  Tim Johnson

    IPC分类号： C22B1/00 ,  B22D11/14 ,  B22D45/00 ,  B22D23/00

    CPC分类号： C22B11/021 ,  C22B4/005 ,  C22B9/226 ,  C22B11/02 ,  C22B11/026 ,  Y02P10/214 ,  Y02P10/234

    摘要： The present invention relates to a method, and apparatus for the recovery of precious metals. Accordingly, it provides a continuous process for obtaining a precious metal composition from a feedstock material, the process comprising the steps of: (i) heating a feedstock material in a plasma furnace to form an upper slag layer and a lower molten metal layer; (ii) removing the slag layer; (iii) removing the molten metal layer; (iv) allowing the removed molten metal layer to solidify; (v) fragmenting the solidified metal layer to form fragments; and (vi) recovering a precious metal composition from the fragments; wherein the feedstock material comprises a precious metal containing material and a collector metal, said collector metal being a metal or an alloy that is capable of forming a solid solution, an alloy or an intermetallic compound with one or more precious metals. This allows for high recovery yields of precious metals. The apparatus comprises a plasma furnace, a casting table enabling continuous casting of the molten metal pool to form a solidified sheet, a fragmentation device and a separation unit for recovering precious-metal-rich alloy from the sheet fragments.

    摘要翻译： 本发明涉及一种回收贵金属的方法和装置。 因此，其提供了从原料材料获得贵金属组合物的连续方法，该方法包括以下步骤：（i）在等离子体炉中加热原料以形成上熔渣层和下熔融金属层; （ii）除去渣层; （iii）去除熔融金属层; （iv）允许去除的熔融金属层固化; （v）使固化的金属层破碎以形成碎片; 和（vi）从碎片中回收贵金属组合物; 其中所述原料材料包含含贵金属的材料和集电器金属，所述集电极金属是能够形成固溶体，合金或金属间化合物与一种或多种贵金属的金属或合金。 这允许贵金属的高回收率。 该装置包括等离子体炉，能够连续铸造熔融金属池以形成固化片的铸造台，碎片装置和用于从片材片中回收富含金属的合金的分离单元。

    Multiple species sputtering method
    10.
    发明授权
    Multiple species sputtering method 失效
    多种溅射法

    公开(公告)号：US06398923B1

    公开(公告)日：2002-06-04

    申请号：US09609441

    申请日：2000-07-03

    申请人： P. J. Ireland ,  Howard Rhodes ,  Sujit Sharan ,  Sukesh Sandhu ,  Tim O'Brien ,  Tim Johnson

    发明人： P. J. Ireland ,  Howard Rhodes ,  Sujit Sharan ,  Sukesh Sandhu ,  Tim O'Brien ,  Tim Johnson

    IPC分类号： C23C1434

    CPC分类号： C23C14/35 ,  C23C14/046 ,  H01L21/762 ,  H01L21/76877

    摘要： An improved sputtering process increases the perpendicularity of the sputtered flux to the target surface by bombarding the target with both low and high mass ions, with low mass ions predominating, packing the target with both low and high mass implanted ions, and causing target atoms ejected as a result of high mass incident ions to have a higher probability of perpendicular or near perpendicular ejection. An alternative improved sputtering process bombards the target with both low and high mass ions, with high mass ions predominating, resulting in a higher sputter rate than achievable with either the high or low mass species alone. Including in either process as the high or the low mass species a species having a lower ionization energy than a standard species allows a reduced pressure plasma, resulting in less scattering of the sputtered flux. A low ionization energy species may also be employed to assist in striking a plasma before sputtering by a single species during deposition.

    摘要翻译： 改进的溅射工艺通过以低质量离子和高质量离子轰击靶，通过以低质量离子为主来增加溅射通量对目标表面的垂直度，用低质量和高质量注入离子填充目标，并引起目标原子喷出 作为高质量入射离子的结果具有更高的垂直或近似垂直喷射的概率。 一种替代的改进的溅射工艺用低和高质量离子轰击靶，以高质量离子为主，导致比单独使用高质量或低质量物质可实现的更高的溅射速率。 在任一过程中，作为高质量或低质量物质，具有比标准物质更低的电离能的物质允许减压等离子体，导致溅射通量的较少散射。 也可以使用低电离能种来在沉积期间通过单一物质在溅射之前帮助击打等离子体。