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    Distortion inspecting method for projection optical system
    1.
    发明授权
    Distortion inspecting method for projection optical system 失效
    投影光学系统失真检测方法

    公开(公告)号：US5402224A

    公开(公告)日：1995-03-28

    申请号：US126393

    申请日：1993-09-24

    申请人： Shigeru Hirukawa ,  Nobutaka Magome ,  Kyoichi Suwa

    发明人： Shigeru Hirukawa ,  Nobutaka Magome ,  Kyoichi Suwa

    IPC分类号： G03F7/20 ,  G01B11/00

    CPC分类号： G01M11/0264 ,  G03F7/706 ,  G03F7/70633 ,  G03F7/70675

    摘要： A method for inspecting distortion characteristics of a projection optical system to be inspected by arranging a mask formed with measurement patterns at a plurality of predetermined positions on the object surface side of the projection optical system, transferring projected images of the plurality of measurement patterns onto a photosensitive substrate arranged on the image surface side of the projection optical system, and detecting transfer images of the measurement-patterns, includes:the step of exposing a mask, on which pairs of first and second measurement patterns are arranged adjacent to each other to be separated by a predetermined interval .DELTA.T in one direction at positions on the mask corresponding to a plurality of points at which distortion amounts are to be inspected in a projection view field of the projection optical system, onto the photosensitive substrate via the projection optical system;the step of exposing the mask onto the photosensitive substrate via the projection optical system after the mask and the photosensitive substrate are moved relative to each other by an amount determined by the interval .DELTA.T with respect to the state in the preceding step;the step of measuring relative displacements between overlapping images of the first and second measurement patterns at different image height points in the projection view field of the projection optical system; andthe step of calculating a value obtained by sequentially accumulating the measured relative displacements in units of image height values as a distortion amount at the corresponding image height point.

    摘要翻译： 一种用于通过在投影光学系统的物体表面上的多个预定位置处布置形成有测量图案的掩模来检查要检查的投影光学系统的失真特性的方法，将多个测量图案的投影图像转印到 布置在投影光学系统的图像表面侧的感光基板和检测测量图案的转印图像包括：曝光掩模的步骤，第一和第二测量图案对彼此相邻配置成为 通过投影光学系统在投影光学系统的投影视场中将与要在失真量被检查的多个点对应的位置上的一个方向上分离预定间隔DELTA T到感光基板上; 在掩模和感光基板相对于前一步骤中的状态由间隔DELTA T确定的量相对于彼此移动之后，通过投影光学系统将掩模曝光到感光基板上的步骤; 测量投影光学系统的投影视场中不同图像高度点处的第一和第二测量图案的重叠图像之间的相对位移的步骤; 并且计算通过以图像高度值为单位将所测量的相对位移顺序地累积为在相应图像高度点处的失真量而获得的值的步骤。

    Exposure apparatus and device manufacturing method
    2.
    发明授权
    Exposure apparatus and device manufacturing method 有权
    曝光装置和装置制造方法

    公开(公告)号：US07911582B2

    公开(公告)日：2011-03-22

    申请号：US12010824

    申请日：2008-01-30

    申请人： Shigeru Hirukawa ,  Nobutaka Magome ,  Issey Tanaka

    发明人： Shigeru Hirukawa ,  Nobutaka Magome ,  Issey Tanaka

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/58

    CPC分类号： G03F7/709 ,  G03F7/70341 ,  G03F7/70716

    摘要： An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. A supply mechanism supplies liquid to a space between the projection optical system and the substrate on the substrate stage. A recovery mechanism recovers the liquid and an auxiliary recovery mechanism recovers the liquid which could not be recovered by the recovery mechanism.

    摘要翻译： 曝光装置用能量束照射图案，并经由投影光学系统将图案转印到基板上。 曝光装置包括其上安装有基板并且在保持基板的二维平面内移动的基板台。 供给机构将液体供给到基板台上的投影光学系统与基板之间的空间。 回收机构回收液体，辅助回收机构回收回收机构无法回收的液体。

    Exposure apparatus and device manufacturing method
    5.
    发明申请
    Exposure apparatus and device manufacturing method 有权
    曝光装置和装置制造方法

    公开(公告)号：US20080151203A1

    公开(公告)日：2008-06-26

    申请号：US12010824

    申请日：2008-01-30

    申请人： Shigeru Hirukawa ,  Nobutaka Magome ,  Issey Tanaka

    发明人： Shigeru Hirukawa ,  Nobutaka Magome ,  Issey Tanaka

    IPC分类号： G03B27/52

    CPC分类号： G03F7/709 ,  G03F7/70341 ,  G03F7/70716

    摘要： An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. A supply mechanism supplies liquid to a space between the projection optical system and the substrate on the substrate stage. A recovery mechanism recovers the liquid and an auxiliary recovery mechanism recovers the liquid which could not be recovered by the recovery mechanism.

    摘要翻译： 曝光装置用能量束照射图案，并经由投影光学系统将图案转印到基板上。 曝光装置包括其上安装有基板并且在保持基板的二维平面内移动的基板台。 供给机构将液体供给到基板台上的投影光学系统与基板之间的空间。 回收机构回收液体，辅助回收机构回收回收机构无法回收的液体。

    Exposure apparatus and device manufacturing method
    6.
    发明申请
    Exposure apparatus and device manufacturing method 有权
    曝光装置和装置制造方法

    公开(公告)号：US20070115447A1

    公开(公告)日：2007-05-24

    申请号：US11655083

    申请日：2007-01-19

    申请人： Shigeru Hirukawa ,  Nobutaka Magome ,  Issey Tanaka

    发明人： Shigeru Hirukawa ,  Nobutaka Magome ,  Issey Tanaka

    IPC分类号： G03B27/42

    CPC分类号： G03F7/709 ,  G03F7/70341 ,  G03F7/70716

    摘要： An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. In addition, a supply mechanism supplies liquid to locally fill a space between the projection optical system and the substrate on the substrate stage with the liquid, and a recovery mechanism recovers the liquid. A plate is provided in at least a part of the periphery of a mounted area of the substrate on the substrate stage. The plate has a surface arranged at substantially the same height as a surface of the substrate mounted on the substrate stage.

    摘要翻译： 曝光装置用能量束照射图案，并经由投影光学系统将图案转印到基板上。 曝光装置包括其上安装有基板并且在保持基板的二维平面内移动的基板台。 此外，供给机构用液体供给液体以局部填充基板台上的投影光学系统与基板之间的空间，回收机构回收液体。 在衬底台上的衬底的安装区域的周边的至少一部分中设置有板。 板具有布置成与安装在基板台上的基板的表面基本相同的高度的表面。

    Exposure apparatus and device manufacturing method
    9.
    发明申请
    Exposure apparatus and device manufacturing method 审中-公开
    曝光装置和装置制造方法

    公开(公告)号：US20090015807A1

    公开(公告)日：2009-01-15

    申请号：US12230988

    申请日：2008-09-09

    申请人： Shigeru Hirukawa ,  Nobutaka Magome ,  Issey Tanaka

    发明人： Shigeru Hirukawa ,  Nobutaka Magome ,  Issey Tanaka

    IPC分类号： G03B27/42 ,  G03B27/52

    CPC分类号： G03F7/709 ,  G03F7/70341 ,  G03F7/70716

    摘要： An immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation, includes: a source emitting electromagnetic radiation onto an object plane; a mask arranged at the object plane to relay the electromagnetic radiation toward the work piece; and an immersion medium contacting at least a portion of an immersion optics of the lithographic system and a portion of the work piece. The immersion medium is supplied through at least one orifice arranged in the immersion optics.

    摘要翻译： 一种浸没式光刻系统，用于对布置在图像平面上并且至少部分地覆盖对电磁辐射敏感的层进行图案化的工件，包括：将电磁辐射发射到物平面上的源; 布置在物平面上的掩模，以将电磁辐射中继到工件; 以及浸没介质接触光刻系统的浸没光学元件的至少一部分和工件的一部分。 浸没介质通过布置在浸没光学器件中的至少一个孔提供。