公开(公告)号：US20170032846A1

公开(公告)日：2017-02-02

申请号：US15249306

申请日：2016-08-26

Applicant: Silicon Storage Technology, Inc.

Inventor： Yuniarto Widjaja ,  John W. Cooksey ,  Changyuan Chen ,  Feng Gao ,  Ya-Fen Lin ,  Dana Lee

IPC: G11C16/34 ,  G11C16/26 ,  G11C16/14 ,  G11C16/10 ,  G11C16/04

CPC classification number: G11C16/0425 ,  G11C16/0483 ,  G11C16/10 ,  G11C16/12 ,  G11C16/14 ,  G11C16/26 ,  G11C16/3431 ,  G11C2216/18 ,  H01L21/28273 ,  H01L27/115 ,  H01L27/11517 ,  H01L27/11521 ,  H01L27/11524 ,  H01L27/11529 ,  H01L29/42328 ,  H01L29/66825 ,  H01L29/7887

Abstract: A split gate NAND flash memory structure is formed on a semiconductor substrate of a first conductivity type. The NAND structure comprises a first region of a second conductivity type in the substrate with a second region of the second conductivity type in the substrate, spaced apart from the first region. A continuous first channel region is defined between the first region and the second region. A plurality of floating gates are spaced apart from one another with each positioned over a separate portion of the channel region. A plurality of control gates are provided with each associated with and adjacent to a floating gate. Each control gate has two portions: a first portion over a portion of the channel region and a second portion over the associated floating gate and capacitively coupled thereto.

Abstract translation: 在第一导电类型的半导体衬底上形成分离栅极NAND闪速存储器结构。 NAND结构包括在衬底中具有第二导电类型的第二区域的第二导电类型的第一区域，与第一区域间隔开。 在第一区域和第二区域之间限定连续的第一通道区域。 多个浮动栅极彼此间隔开，每个浮置栅极位于沟道区域的独立部分上。 设置有多个控制栅极，每个与浮动栅极相关联并与其相邻。 每个控制栅极具有两个部分：沟道区域的一部分上的第一部分和相关联的浮动栅极上的第二部分，并与其电容耦合。

公开(公告)号：US20140340967A1

公开(公告)日：2014-11-20

申请号：US14318502

申请日：2014-06-27

Applicant: Silicon Storage Technology, Inc.

Inventor： Yuniarto Widjaja ,  John W. Cooksey ,  Changyuan Chen ,  Feng Gao ,  Ya-Fen Lin ,  Dana Lee

IPC: G11C16/10 ,  G11C16/14

CPC classification number: G11C16/0425 ,  G11C16/0483 ,  G11C16/10 ,  G11C16/12 ,  G11C16/14 ,  G11C16/26 ,  G11C16/3431 ,  G11C2216/18 ,  H01L21/28273 ,  H01L27/115 ,  H01L27/11517 ,  H01L27/11521 ,  H01L27/11524 ,  H01L27/11529 ,  H01L29/42328 ,  H01L29/66825 ,  H01L29/7887

Abstract: A split gate NAND flash memory structure is formed on a semiconductor substrate of a first conductivity type. The NAND structure comprises a first region of a second conductivity type in the substrate with a second region of the second conductivity type in the substrate, spaced apart from the first region. A continuous first channel region is defined between the first region and the second region. A plurality of floating gates are spaced apart from one another with each positioned over a separate portion of the channel region. A plurality of control gates are provided with each associated with and adjacent to a floating gate. Each control gate has two portions: a first portion over a portion of the channel region and a second portion over the associated floating gate and capacitively coupled thereto.

Abstract translation: 在第一导电类型的半导体衬底上形成分离栅极NAND闪速存储器结构。 NAND结构包括在衬底中具有第二导电类型的第二区域的第二导电类型的第一区域，与第一区域间隔开。 在第一区域和第二区域之间限定连续的第一通道区域。 多个浮动栅极彼此间隔开，每个浮置栅极位于沟道区域的独立部分上。 设置有多个控制栅极，每个与浮动栅极相关联并与其相邻。 每个控制栅极具有两个部分：沟道区域的一部分上的第一部分和相关联的浮动栅极上的第二部分，并与其电容耦合。

公开(公告)号：US09449693B2

公开(公告)日：2016-09-20

申请号：US14318502

申请日：2014-06-27

Applicant: Silicon Storage Technology, Inc.

Inventor： Yuniarto Widjaja ,  John W. Cooksey ,  Changyuan Chen ,  Feng Gao ,  Ya-Fen Lin ,  Dana Lee

IPC: G11C16/10 ,  G11C16/04 ,  H01L21/28 ,  H01L27/115 ,  H01L29/423 ,  H01L29/66 ,  H01L29/788 ,  G11C16/14

CPC classification number: G11C16/0425 ,  G11C16/0483 ,  G11C16/10 ,  G11C16/12 ,  G11C16/14 ,  G11C16/26 ,  G11C16/3431 ,  G11C2216/18 ,  H01L21/28273 ,  H01L27/115 ,  H01L27/11517 ,  H01L27/11521 ,  H01L27/11524 ,  H01L27/11529 ,  H01L29/42328 ,  H01L29/66825 ,  H01L29/7887

Abstract: A split gate NAND flash memory structure is formed on a semiconductor substrate of a first conductivity type. The NAND structure comprises a first region of a second conductivity type in the substrate with a second region of the second conductivity type in the substrate, spaced apart from the first region. A continuous first channel region is defined between the first region and the second region. A plurality of floating gates are spaced apart from one another with each positioned over a separate portion of the channel region. A plurality of control gates are provided with each associated with and adjacent to a floating gate. Each control gate has two portions: a first portion over a portion of the channel region and a second portion over the associated floating gate and capacitively coupled thereto.

公开(公告)号：US09892790B2

公开(公告)日：2018-02-13

申请号：US15249306

申请日：2016-08-26

Applicant: Silicon Storage Technology, Inc.

Inventor： Yuniarto Widjaja ,  John W. Cooksey ,  Changyuan Chen ,  Feng Gao ,  Ya-Fen Lin ,  Dana Lee

IPC: G11C11/34 ,  G11C16/04 ,  G11C16/12 ,  H01L27/11517 ,  H01L27/11529 ,  H01L21/28 ,  H01L27/115 ,  H01L27/11521 ,  H01L27/11524 ,  H01L29/423 ,  H01L29/66 ,  H01L29/788 ,  G11C16/10 ,  G11C16/14 ,  G11C16/26 ,  G11C16/34

CPC classification number: G11C16/0425 ,  G11C16/0483 ,  G11C16/10 ,  G11C16/12 ,  G11C16/14 ,  G11C16/26 ,  G11C16/3431 ,  G11C2216/18 ,  H01L21/28273 ,  H01L27/115 ,  H01L27/11517 ,  H01L27/11521 ,  H01L27/11524 ,  H01L27/11529 ,  H01L29/42328 ,  H01L29/66825 ,  H01L29/7887

Abstract: A split gate NAND flash memory structure is formed on a semiconductor substrate of a first conductivity type. The NAND structure comprises a first region of a second conductivity type in the substrate with a second region of the second conductivity type in the substrate, spaced apart from the first region. A continuous first channel region is defined between the first region and the second region. A plurality of floating gates are spaced apart from one another with each positioned over a separate portion of the channel region. A plurality of control gates are provided with each associated with and adjacent to a floating gate. Each control gate has two portions: a first portion over a portion of the channel region and a second portion over the associated floating gate and capacitively coupled thereto.