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公开(公告)号：US07106415B2
公开(公告)日：2006-09-12
申请号：US10731187
申请日：2003-12-09
摘要： A zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This simple but novel optics device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration.
摘要翻译： 安装在投影光路中的零功率相同的一对相反方向的弯月透镜元件用作弯曲的掩模支撑，同时补偿光学异常，例如由弯曲掩模的其他透明支撑产生的光束偏移和光束偏移。 零功率弯月透镜对，不影响透射光束特性，使得光束像普通的平面掩模一样有效地衍射，从而保持投影光刻的部分相干效应和分辨率概念。 这种简单但新颖的光学器件不仅预期能够清除弯曲掩模投影光刻的几个障碍，而且还可以发现在其中准直或会聚光束必须行进额外路径而没有显着像差的其他应用场合。
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公开(公告)号：US07158305B2
公开(公告)日：2007-01-02
申请号：US10879887
申请日：2004-06-29
CPC分类号： G03F7/70075 , G02B27/0927 , G02B27/0994
摘要： An optimized illumination system that efficiently produces uniform illumination for exposure, photoablation, and laser crystallization systems. The illumination system includes a homogenizer that uniformizes and shapes a light beam, which is directed onto a mask by condenser optics. The illumination system recycles radiation by directing light reflected by the mask back into the illumination system, where an apertured mirror situated at the input end re-directs it back toward the mask. The relative areas of the mirror and aperture affect recycling efficiency and system throughput, so the system features a larger-diameter recycling segment enabling greater mirror-to-aperture area ratios. An added segment at the output end of the homogenizer matches the homogenizer diameter to the projection imaging system object field size. This standardizes the homogenizer and condenser lens integration, reducing the need for customized parts and thus reducing manufacturing time and expense.
摘要翻译： 一种优化的照明系统，可有效地为曝光，光消融和激光结晶系统产生均匀的照明。 照明系统包括均匀化器，其使通过冷凝器光学器件引导到掩模上的光束均匀化并成形。 照明系统通过将由掩模反射的光引导回到照明系统中来回收辐射，其中位于输入端的多孔镜将其重新引向掩模。 镜面和孔径的相对面积影响回收效率和系统产量，因此该系统具有更大直径的回收部分，从而实现更大的镜面与孔径面积比。 在均化器的输出端附加的段将均匀器直径与投影成像系统对象场尺寸相匹配。 这使得均化器和聚光镜集成的标准化，减少了对定制零件的需求，从而缩短了制造时间和费用。
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公开(公告)号：US07670727B2
公开(公告)日：2010-03-02
申请号：US11512954
申请日：2006-08-30
摘要： A zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This simple but novel optics device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration.
摘要翻译： 安装在投影光路中的零功率相同的一对相反方向的弯月透镜元件用作弯曲的掩模支撑，同时补偿光学异常，例如由弯曲掩模的其他透明支撑产生的光束偏移和光束偏移。 零功率弯月透镜对，不影响透射光束特性，使得光束像普通的平面掩模一样有效地衍射，从而保持投影光刻的部分相干效应和分辨率概念。 这种简单但新颖的光学器件不仅预期能够清除弯曲掩模投影光刻的几个障碍，而且还可以发现在其中准直或会聚光束必须行进额外路径而没有显着像差的其他应用场合。
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公开(公告)号：US06621044B2
公开(公告)日：2003-09-16
申请号：US09764571
申请日：2001-01-18
申请人： Kanti Jain , Robert S. Sposili , Marc A. Klosner , Marc I. Zemel
发明人： Kanti Jain , Robert S. Sposili , Marc A. Klosner , Marc I. Zemel
IPC分类号： B23K2667
CPC分类号： G03F7/70216 , G03F7/70358
摘要： Apparatus and method for patterned sequential lateral solidification of a substrate surface, avoiding the need for demagnification to avoid mask damage from fluence sufficient to overcome the threshold for sequential lateral solidification, while using the high throughput of a common stage presenting both 1:1 mask and substrate simultaneously for patterning. The radiation source provides imaging beam and non-imaging beam, each of fluence below the threshold of sequential lateral solidification, but with aggregate fluence above the threshold. The imaging beam path includes a relatively delicate 1:1 mask and 1:1 projection subsystem, with optical elements including a final fold mirror proximate to the substrate surface, put the below-threshold mask pattern on the substrate surface. The non-imaging beam bypasses the delicate elements of imaging beam path, passing through or around the final fold mirror, to impinge on the substrate surface at the same location. Where the radiation patterns of the masked imaging beam and non-imaging beam coincide, their aggregate fluence exceeds the threshold for sequential lateral solidification. The dual selection provides pattern without damage to delicate optical elements.
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公开(公告)号：US07164465B2
公开(公告)日：2007-01-16
申请号：US10890498
申请日：2004-07-13
申请人： Marc A. Klosner , Kanti Jain
发明人： Marc A. Klosner , Kanti Jain
CPC分类号： G03F7/70275 , G03F7/70291
摘要： A versatile maskless patterning system with capability for selecting rapidly among a plurality of projection lenses mounted on a turret. This provides the ability to rapidly select multiple choices for resolution and enables optimization of the combination of the imaging resolution and exposure throughput, making possible cost-effective fabrication of microelectronics packaging products. A preferred embodiment uses a digital micromirror device array spatial light modulator as a virtual mask. Another preferred embodiment use multiple closely spaced digital micromirror device array spatial light modulators to enhance throughput.
摘要翻译： 一种多用途无掩模图案化系统，具有在安装在转台上的多个投影透镜之间快速选择的能力。 这提供了快速选择多个选择以进行分辨率的能力，并且能够优化成像分辨率和曝光量的组合，从而使得可能具有成本效益的微电子封装产品的制造。 优选实施例使用数字微镜器件阵列空间光调制器作为虚拟掩模。 另一个优选实施例使用多个紧密间隔的数字微镜器件阵列空间光调制器来增加吞吐量。
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公开(公告)号：US06416908B1
公开(公告)日：2002-07-09
申请号：US09606914
申请日：2000-06-29
申请人： Marc A. Klosner , Marc I. Zemel , Kanti Jain , Nestor O. Farmiga
发明人： Marc A. Klosner , Marc I. Zemel , Kanti Jain , Nestor O. Farmiga
IPC分类号： G03F900
摘要： A microlithography system, capable of performing high resolution imaging on large-area curved surfaces, based on projection lithography. The system utilizes a high-resolution lens to image a curved mask directly onto a curved substrate. The system uses a curved mask which is identical in shape to the curved substrate, in order to achieve a constant track length for conjugate object and image points, thereby maintaining focus over the full area of curved substrates having height variations that greatly exceed the depth-of-focus of the imaging lens. Magnification errors are controlled by continuous adjustments of the z-position of the projection lens during scanning, with the adjustments depending upon the topography of the curved mask and substrate. By performing the lithography using a step-and-scan seamless-patterning microlithography system, it is possible to pattern over large areas, greater than the field size of the lens. When the mask and substrate are mounted on a common scanning platform, the system operates with an inverted mask. The system also has provisions for making the appropriate curved projection masks, using a planar contact printing technique to pattern high-resolution features on a flexible film which is stretched over a curved mask blank and secured by a frame, with the option of using the system itself to replicate the curved mask onto an indeterminate number of curved fused-silica mask blanks, by projection printing.
摘要翻译： 基于投影光刻技术的能够对大面积曲面进行高分辨率成像的微光刻系统。 该系统利用高分辨率透镜将弯曲的掩模直接成像到弯曲的基底上。 该系统使用与弯曲基板相同形状的弯曲掩模，以便为共轭物体和图像点实现恒定的轨道长度，从而在具有高度变化大大超过深度的高度变化的弯曲基底的整个区域上保持聚焦， 成像透镜的焦点。 通过在扫描期间连续调整投影透镜的z位置来控制放大率误差，其中调整取决于弯曲掩模和基板的形貌。 通过使用步进扫描无机图案化微光刻系统进行光刻，可以在比透镜的场大小大的区域上进行图案化。 当掩模和基板安装在共同的扫描平台上时，系统以倒置的掩模工作。 该系统还具有用于制作适当的弯曲投影掩模的规定，使用平面接触印刷技术在柔性膜上绘制高分辨率特征，该柔性膜在弯曲掩模坯料上被拉伸并被框架固定，具有使用该系统的选项 本身通过投影印刷将弯曲的掩模复制到不确定数量的弯曲熔融石英掩模坯料上。
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公开(公告)号：US06238852B1
公开(公告)日：2001-05-29
申请号：US09225385
申请日：1999-01-04
申请人： Marc A. Klosner
发明人： Marc A. Klosner
IPC分类号： G03F700
CPC分类号： G03F7/70291 , G03F7/2002 , G03F7/704
摘要： A maskless lithography system that provides large-area, seamless patterning using a reflective spatial light modulator such as a Deformable Micromirror Device (DMD) directly addressed by a control system so as to provide a first pattern, via a first projection subsystem, on a first photoresist-coated substrate panel, while simultaneously providing a duplicate pattern, which is a negative of the pattern on the first substrate panel, via a second projection subsystem, onto a second photosensitive substrate panel, thus using the normally-rejected non-pattern “off” pixel radiation reflected by the “off” pixel micromirrors of the DMD, to pattern a second substrate panel. Since the “off” pixel reflections create a pattern which is complementary to the “on” pixel pattern, using a complementary photoresist coating on the second substrate panel provides for a duplicate pattern, as is usually desired. Since both the “on” and “off” reflections are used from each pixel position, using the same selection, the result is the doubling of throughput.
摘要翻译： 一种无掩模光刻系统，其使用诸如由控制系统直接寻址的可变形微镜器件（DMD）的反射空间光调制器提供大面积的无缝图案，以便经由第一投影子系统在第一 同时通过第二投影子系统将第一衬底板上的图案的负的副本图案提供到第二感光衬底面板上，从而使用正常拒绝的非图案“关闭” “由DMD的”关“像素微镜反射的像素辐射，以图形化第二衬底面板。 由于“关闭”像素反射产生与“开”像素图案互补的图案，所以在第二基板面板上使用互补的光致抗蚀剂涂层提供如通常需要的重复图案。 由于从每个像素位置使用“开”和“关”反射，所以使用相同的选择，结果是吞吐量翻倍。
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公开(公告)号：US06188076B1
公开(公告)日：2001-02-13
申请号：US09466818
申请日：1999-12-17
IPC分类号： G21G400
CPC分类号： H05G2/003 , B82Y10/00 , G01J3/10 , G03F7/70016 , G03F7/70033 , G03F7/70916 , G03F7/70983 , H01J61/12 , H01J61/28 , H01J61/30 , H05G2/005
摘要： Capillary discharge extreme ultraviolet lamp sources for EUV microlithography and other applications. The invention covers operating conditions for a pulsed capillary discharge lamp for EUVL and other applications such as resist exposure tools, microscopy, interferometry, metrology, biology and pathology. Techniques and processes are described to mitigate against capillary bore erosion, pressure pulse generation, and debris formation in capillary discharge-powered lamps operating in the EUV. Additional materials are described for constructing capillary discharge devices fore EUVL and related applications. Further, lamp designs and configurations are described for lamps using gasses and metal vapors as the radiating species.
摘要翻译： 毛细管放电极紫外灯源用于EUV微光刻等应用。 本发明涵盖用于EUVL的脉冲毛细管放电灯和诸如抗蚀剂曝光工具，显微镜，干涉测量，计量学，生物学和病理学的其它应用的操作条件。 描述了技术和过程，以减轻在EUV中操作的毛细管放电动力灯中的毛细管孔侵蚀，压力脉冲产生和碎片形成。 描述了用于在EUVL和相关应用之前构建毛细管放电装置的附加材料。 此外，对于使用气体和金属蒸气作为辐射种类的灯描述了灯的设计和配置。
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9.发明授权Configurations, materials and wavelengths for EUV lithium plasma discharge lamps 失效EUV锂等离子体放电灯的配置，材料和波长
公开(公告)号：US5963616A
公开(公告)日：1999-10-05
申请号：US815283
申请日：1997-03-11
CPC分类号： H05G2/003 , B82Y10/00 , G01J3/10 , G03F7/70033 , G03F7/70916 , G03F7/70983 , H01J61/12 , H01J61/28 , H01J61/30 , H05G2/005
摘要： This invention relates to Lithium Plasma discharge sources, and in particular to methods of making and producing pulsed and continuous discharge sources for plasma soft-x-ray or EUV projection lithography. Specifically, novel configurations, metal and ceramic material combinations and efficient wavelengths over and including 11.4 nm are disclosed for EUV lithium plasma discharge lamps.
摘要翻译： 本发明涉及锂离子放电源，特别涉及制造和生产用于等离子体软X射线或EUV投影光刻的脉冲和连续放电源的方法。 具体地，对于EUV锂等离子体放电灯，公开了新颖的配置，金属和陶瓷材料组合以及超过11.4nm的有效波长。
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