Array substrate and manufacturing method thereof

    公开(公告)号:US11380716B2

    公开(公告)日:2022-07-05

    申请号:US16648259

    申请日:2019-11-11

    Inventor: Meng Chen

    Abstract: An array substrate and manufacturing method thereof are provided. The array substrate includes: a substrate; a first gate electrode insulating layer disposed on the substrate, wherein the first gate electrode insulating layer has a recess therein; a gate electrode layer disposed in the recess of the first gate electrode insulating layer; a second gate electrode insulating layer covering the first gate electrode insulating layer and the gate electrode layer; and an active layer disposed on the second gate electrode insulating layer.

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