NON-VOLATILE ANTI-FUSE WITH CONSISTENT RUPTURE
    2.
    发明申请
    NON-VOLATILE ANTI-FUSE WITH CONSISTENT RUPTURE 审中-公开
    具有一致性破坏的非易失性抗熔丝

    公开(公告)号:US20140239409A1

    公开(公告)日:2014-08-28

    申请号:US14268493

    申请日:2014-05-02

    Abstract: In an embodiment of the invention, a non-volatile anti-fuse memory cell is disclosed. The memory cell consists of a programmable n-channel diode-connectable transistor. The poly-silicon gate of the transistor has two portions. One portion is doped more highly than a second portion. The transistor also has a source with two portions where one portion of the source is doped more highly than a second portion. The portion of the gate that is physically closer to the source is more lightly doped than the other portion of the poly-silicon gate. The portion of the source that is physically closer to the lightly doped portion of the poly-silicone gate is lightly doped with respect to the other portion of the source. When the transistor is programmed, a rupture in the insulator will most likely occur in the portion of the poly-silicone gate that is heavily doped.

    Abstract translation: 在本发明的实施例中,公开了一种非易失性反熔丝存储器单元。 存储单元由可编程的n沟道二极管连接晶体管组成。 晶体管的多晶硅栅极具有两部分。 一部分掺杂比第二部分更高。 晶体管还具有源的两部分,其中源的一部分被掺杂得比第二部分更高。 物理上更接近源极的栅极的部分比多晶硅栅极的其他部分更轻掺杂。 物理上更靠近聚硅氧烷栅极的轻掺杂部分的源的部分相对于源的另一部分被轻掺杂。 当晶体管被编程时,在重掺杂的聚硅氧烷栅极的部分中绝大多数情况下会发生破裂。

    Non-volatile anti-fuse with consistent rupture
    4.
    发明授权
    Non-volatile anti-fuse with consistent rupture 有权
    不挥发性反熔丝具有一致的破裂

    公开(公告)号:US09257440B2

    公开(公告)日:2016-02-09

    申请号:US14268493

    申请日:2014-05-02

    Abstract: In an embodiment of the invention, a non-volatile anti-fuse memory cell is disclosed. The memory cell consists of a programmable n-channel diode-connectable transistor. The poly-silicon gate of the transistor has two portions. One portion is doped more highly than a second portion. The transistor also has a source with two portions where one portion of the source is doped more highly than a second portion. The portion of the gate that is physically closer to the source is more lightly doped than the other portion of the poly-silicon gate. The portion of the source that is physically closer to the lightly doped portion of the poly-silicone gate is lightly doped with respect to the other portion of the source. When the transistor is programmed, a rupture in the insulator will most likely occur in the portion of the poly-silicone gate that is heavily doped.

    Abstract translation: 在本发明的实施例中,公开了一种非易失性反熔丝存储器单元。 存储单元由可编程的n沟道二极管连接晶体管组成。 晶体管的多晶硅栅极具有两部分。 一部分掺杂比第二部分更高。 晶体管还具有源的两部分,其中源的一部分被掺杂得比第二部分更高。 物理上更接近源极的栅极的部分比多晶硅栅极的其他部分更轻掺杂。 物理上更靠近聚硅氧烷栅极的轻掺杂部分的源的部分相对于源的另一部分被轻掺杂。 当晶体管被编程时,在重掺杂的聚硅氧烷栅极的部分中绝大多数情况下会发生破裂。

    ULTRAVIOLET ENERGY SHIELD FOR NON-VOLATILE CHARGE STORAGE MEMORY
    5.
    发明申请
    ULTRAVIOLET ENERGY SHIELD FOR NON-VOLATILE CHARGE STORAGE MEMORY 审中-公开
    用于非挥发性充电存储器的超级能量屏蔽

    公开(公告)号:US20130040449A1

    公开(公告)日:2013-02-14

    申请号:US13652558

    申请日:2012-10-16

    Abstract: An integrated circuit with non-volatile memory cells shielded from ultraviolet light by a shielding structure compatible with chemical-mechanical processing. The disclosed shielding structure includes a roof structure with sides; along each side are spaced-apart contact posts, each with a width on the order of the wavelength of ultraviolet light to be shielded, and spaced apart by a distance that is also on the order of the wavelength of ultraviolet light to be shielded. The contact posts may be provided in multiple rows, and extending to a diffused region or to a polysilicon ring or both. The multiple rows may be aligned with one another or staggered relative to one another.

    Abstract translation: 一种具有非易失性存储单元的集成电路,通过与化学机械处理兼容的屏蔽结构来屏蔽紫外线。 所公开的屏蔽结构包括具有侧面的屋顶结构; 沿着每一侧具有间隔开的接触柱,每个接触柱具有要被屏蔽的紫外线的波长的宽度,并隔开一定距离,该距离也在要被屏蔽的紫外线的波长的数量级上。 接触柱可以设置成多排,并且延伸到扩散区域或多晶硅环或两者。 多行可以彼此对准或相互交错排列。

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