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1.发明申请METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING CHARGED PARTICLE BEAM LITHOGRAPHY 审中-公开使用充电颗粒光栅制作表面的方法和系统公开(公告)号：US20110089345A1
公开(公告)日：2011-04-21
申请号：US12898646
申请日：2010-10-05
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/36 , G03F1/78
摘要： In the field of semiconductor production using shaped beam charged particle beam lithography, a pattern is formed on a surface by dragging a charged particle beam across the surface in a single extended shot to form a track. In some embodiments, the track may form a straight path, a curved path, or a perimeter of a curvilinear shape. In other embodiments, the width of the track may be altered by varying the velocity of the dragged beam. The techniques may be used for manufacturing an integrated circuit by dragging a charged particle beam across a resist-coated wafer to transfer a pattern to the wafer, or by dragging a charged particle beam across a reticle, where the reticle is used to manufacture a photomask which is then used to transfer a pattern to a wafer using an optical lithographic process.
摘要翻译： 在使用成形束带电粒子束光刻的半导体生产领域中，通过在单个延伸射击中将带电粒子束拖过表面而形成轨迹，从而在表面上形成图案。 在一些实施例中，轨道可以形成曲线形状的直线路径，曲线路径或周边。 在其他实施例中，轨道的宽度可以通过改变拖曳梁的速度来改变。 这些技术可以用于通过将带电粒子束拖过抗蚀剂涂覆的晶片以将图案转移到晶片，或者通过将带电粒子束拖动通过掩模版来制造集成电路，其中掩模版用于制造光掩模 然后将其用于使用光学光刻工艺将图案转印到晶片。
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2.发明申请Method for Fracturing a Pattern for Writing with a Shaped Charged Particle Beam Writing System Using Dragged Shots 失效用成形的带电粒子束写入系统使用拖曳射击压缩图案的方法公开(公告)号：US20110089344A1
公开(公告)日：2011-04-21
申请号：US12603580
申请日：2009-10-21
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/78 , Y10S430/143
摘要： In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a shot determined for a shaped charged particle beam writer system comprises dragging the charged particle beam across a surface during the shot, so as to form a complex pattern in a single, extended shot. The dragging may be done with either variable shaped beam (VSB) or character projection (CP) shots. Methods for specifying in the shot data the path for the dragged shot are also disclosed. Other embodiments include using dragged shots with partial projection, varying the dragging velocity during a shot, and combining dragged shots with conventional shots. A method and system for creating glyphs which contain dragged shots is also disclosed.
摘要翻译： 在使用成形带电粒子束光刻的半导体生产领域中，公开了一种用于压裂或掩模数据准备或邻近效应校正的方法和系统，其中为成形带电粒子束写入器系统确定的镜头包括将带电粒子束拖过 在射击期间形成一个复杂的图案，在一个单一的延伸射击。 可以用可变形波束（VSB）或角色投影（CP）拍摄完成拖动。 还公开了在拍摄数据中指定用于拖动镜头的路径的方法。 其他实施例包括使用具有部分投影的拖动镜头，在拍摄期间改变拖动速度，以及将拖动的镜头与传统镜头组合。 还公开了一种用于创建包含拖动镜头的字形的方法和系统。
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3.发明授权Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shots 失效用成形带电粒子束书写系统使用拖曳镜头压印图案的方法公开(公告)号：US07985514B2
公开(公告)日：2011-07-26
申请号：US12603580
申请日：2009-10-21
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/78 , Y10S430/143
摘要： In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a shot determined for a shaped charged particle beam writer system comprises dragging the charged particle beam across a surface during the shot, so as to form a complex pattern in a single, extended shot. The dragging may be done with either variable shaped beam (VSB) or character projection (CP) shots. Methods for specifying in the shot data the path for the dragged shot are also disclosed. Other embodiments include using dragged shots with partial projection, varying the dragging velocity during a shot, and combining dragged shots with conventional shots. A method and system for creating glyphs which contain dragged shots is also disclosed.
摘要翻译： 在使用成形带电粒子束光刻的半导体生产领域中，公开了一种用于压裂或掩模数据准备或邻近效应校正的方法和系统，其中针对成形带电粒子束写入器系统确定的镜头包括将带电粒子束拖过 在射击期间形成一个复杂的图案，在一个单一的延伸射击。 可以用可变形波束（VSB）或角色投影（CP）拍摄完成拖动。 还公开了在拍摄数据中指定用于拖动镜头的路径的方法。 其他实施例包括使用具有部分投影的拖动镜头，在拍摄期间改变拖动速度，以及将拖动的镜头与传统镜头组合。 还公开了一种用于创建包含拖动镜头的字形的方法和系统。
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4.发明授权Method for fracturing and forming a pattern using shaped beam charged particle beam lithography 有权使用成形束带电粒子束光刻法压裂和形成图案的方法公开(公告)号：US08501374B2
公开(公告)日：2013-08-06
申请号：US13723329
申请日：2012-12-21
申请人： Akira Fujimura , Michael Tucker
发明人： Akira Fujimura , Michael Tucker
CPC分类号： G06F17/5081 , B82Y10/00 , B82Y40/00 , G03F1/36 , G03F1/68 , G03F1/70 , G03F1/78 , G03F7/2061 , G06F17/5045 , H01J37/3026 , H01J37/3174 , Y10S430/143
摘要： In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, in which a plurality of shaped beam shots is determined which will form a target pattern on a surface, within a predetermined tolerance, where the plurality of shaped beam shots includes a plurality of circular or nearly-circular character projection (CP) shots plus one or more non-circular shot, and where at least two shots in the plurality of circular or nearly-circular shots overlap. Methods for manufacturing a surface and for manufacturing a semiconductor device on a substrate are also disclosed.
摘要翻译： 在使用成形带电粒子束光刻的半导体生产领域中，公开了一种用于压裂或掩模数据准备或接近效应校正的方法和系统，其中确定将在表面上形成目标图案的多个成形射束， 在预定的公差范围内，其中多个成形射束包括多个圆形或近圆形的字符投影（CP）镜头加上一个或多个非圆形镜头，并且其中多个圆形或近似圆形的镜头中的至少两个镜头， 圆形镜头重叠。 还公开了用于制造表面和用于制造衬底上的半导体器件的方法。
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5.发明申请Method for Integrated Circuit Manufacturing and Mask Data Preparation Using Curvilinear Patterns 有权使用曲线模式的集成电路制造和掩模数据准备的方法公开(公告)号：US20120094219A1
公开(公告)日：2012-04-19
申请号：US13269618
申请日：2011-10-09
申请人： Akira Fujimura , Michael Tucker
发明人： Akira Fujimura , Michael Tucker
CPC分类号： G06F17/5081 , G03F7/70441 , G06F17/5077 , G06F2217/12
摘要： A method for manufacturing a semiconductor device is disclosed, wherein during the physical design process, a curvilinear path is designed to represent an interconnecting wire on the fabricated semiconductor device. A method for fracturing or mask data preparation (MDP) is also disclosed in which a manhattan path which is part of the physical design of an integrated circuit is modified to create a curvilinear pattern, and where a set of charged particle beam shots is generated, where the set of shots is capable of forming the curvilinear pattern on a resist-coated surface.
摘要翻译： 公开了一种用于制造半导体器件的方法，其中在物理设计过程期间，设计曲线路径以表示制造的半导体器件上的互连线。 还公开了一种用于压裂或掩模数据准备（MDP）的方法，其中作为集成电路的物理设计的一部分的曼哈顿路径被修改以产生曲线图案，并且在产生一组带电粒子束照射的情况下， 其中一组镜头能够在抗蚀剂涂覆的表面上形成曲线图案。
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6.发明申请Method for Fracturing and Forming a Pattern Using Circular Characters with Charged Particle Beam Lithography 有权用带电粒子束光刻技术的圆形断裂和形成图案的方法公开(公告)号：US20120034554A1
公开(公告)日：2012-02-09
申请号：US13274346
申请日：2011-10-16
申请人： Akira Fujimura , Michael Tucker
发明人： Akira Fujimura , Michael Tucker
CPC分类号： G06F17/5081 , B82Y10/00 , B82Y40/00 , G03F1/36 , G03F1/68 , G03F1/70 , G03F1/78 , G03F7/2061 , G06F17/5045 , H01J37/3026 , H01J37/3174 , Y10S430/143
摘要： In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a plurality of shots of circular or nearly-circular character projection characters, having at least two shots that overlap, can form a non-circular pattern on a surface. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming non-circular patterns on a surface using a plurality of circular or nearly-circular character projection shots, where at least two shots overlap, is also disclosed.
摘要翻译： 在使用成形带电粒子束光刻的半导体制造领域中，公开了一种用于压裂或掩模数据准备或邻近效应校正的方法和系统，其中多个圆形或近圆形字符投影字符的镜头具有至少两个镜头 重叠，可以在表面上形成非圆形图案。 还公开了用于制造掩模版和用于通过使用多个圆形或几乎圆形的角色投影镜在表面上形成非圆形图案来制造诸如硅晶片的基板的方法，其中至少两个重叠。
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7.发明申请Method for Fracturing and Forming a Pattern Using Curvilinear Characters with Charged Particle Beam Lithography 有权使用具有带电粒子束光刻的曲线字符压缩和形成图案的方法公开(公告)号：US20120025108A1
公开(公告)日：2012-02-02
申请号：US13269497
申请日：2011-10-07
申请人： Akira Fujimura , Michael Tucker
发明人： Akira Fujimura , Michael Tucker
CPC分类号： G06F17/5081 , B82Y10/00 , B82Y40/00 , G03F1/36 , G03F1/68 , G03F1/70 , G03F1/78 , G03F7/2061 , G06F17/5045 , H01J37/3026 , H01J37/3174 , Y10S430/143
摘要： In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a series of curvilinear character projection shots are determined for a charged particle beam writer system, such that the set of shots can form a continuous track, possibly of varying width, on a surface. A method for forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed.
摘要翻译： 在使用成形带电粒子束光刻的半导体生产领域中，公开了一种用于压裂或掩模数据准备或邻近效应校正的方法和系统，其中为带电粒子束写入器系统确定了一系列曲线角色投影镜头，使得 一组镜头可以在表面上形成可能具有不同宽度的连续轨迹。 还公开了使用一系列曲线角色投影镜头在表面上形成连续轨道的方法。 还公开了用于制造掩模版和用于通过使用一系列曲线字符投影镜在表面上形成连续轨迹来制造诸如硅晶片的基板的方法。
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公开(公告)号：US08057970B2
公开(公告)日：2011-11-15
申请号：US12540322
申请日：2009-08-12
申请人： Akira Fujimura , Michael Tucker
发明人： Akira Fujimura , Michael Tucker
IPC分类号： G03F9/00
CPC分类号： G03F1/70 , B82Y10/00 , B82Y40/00 , G03F1/20 , G03F1/78 , G03F7/20 , G03F7/2037 , G03F7/2063 , G03F7/7025 , G06F17/50 , G06F17/5068 , G06F17/5081 , G06F2217/12 , H01J37/3174 , Y10S430/143
摘要： A method for forming circular patterns on a surface using a character projection (CP) charged particle beam writer is disclosed, wherein circular patterns of different sizes may be formed using a single CP character, by varying dosage. A method for forming circular patterns on a surface using a variable shaped beam (VSB) charged particle beam writer is also disclosed, wherein the dosages of the shots may vary, and wherein the union of the shots is different than the set of target patterns. A method for forming circular patterns on a surface using a library of glyphs is also disclosed, wherein the glyphs are pre-calculated dosage maps that can be formed by one or more charged particle beam shots.
摘要翻译： 公开了一种使用字符投影（CP）带电粒子束写入器在表面上形成圆形图案的方法，其中可以通过改变剂量使用单个CP字符形成不同尺寸的圆形图案。 还公开了一种使用可变形波束（VSB）带电粒子束写入器在表面上形成圆形图案的方法，其中射击的剂量可以变化，并且其中镜头的联合不同于目标图案的集合。 还公开了使用字形库在表面上形成圆形图案的方法，其中所述字形是可以由一个或多个带电粒子束照射形成的预先计算的剂量图。
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9.发明授权Method for fracturing and forming a pattern using circular characters with charged particle beam lithography 有权使用带有带电粒子束光刻的圆形特征压裂和形成图案的方法公开(公告)号：US08283094B2
公开(公告)日：2012-10-09
申请号：US13274346
申请日：2011-10-16
申请人： Akira Fujimura , Michael Tucker
发明人： Akira Fujimura , Michael Tucker
CPC分类号： G06F17/5081 , B82Y10/00 , B82Y40/00 , G03F1/36 , G03F1/68 , G03F1/70 , G03F1/78 , G03F7/2061 , G06F17/5045 , H01J37/3026 , H01J37/3174 , Y10S430/143
摘要： In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a plurality of shots of circular or nearly-circular character projection characters, having at least two shots that overlap, can form a non-circular pattern on a surface. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming non-circular patterns on a surface using a plurality of circular or nearly-circular character projection shots, where at least two shots overlap, is also disclosed.
摘要翻译： 在使用成形带电粒子束光刻的半导体制造领域中，公开了一种用于压裂或掩模数据准备或邻近效应校正的方法和系统，其中多个圆形或近圆形字符投影字符的镜头具有至少两个镜头 重叠，可以在表面上形成非圆形图案。 还公开了用于制造掩模版和用于通过使用多个圆形或几乎圆形的角色投影镜在表面上形成非圆形图案来制造诸如硅晶片的基板的方法，其中至少两个重叠。
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10.发明授权Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography 失效使用具有带电粒子束光刻的曲线字符压裂和形成图案的方法公开(公告)号：US08039176B2
公开(公告)日：2011-10-18
申请号：US12618722
申请日：2009-11-14
申请人： Akira Fujimura , Michael Tucker
发明人： Akira Fujimura , Michael Tucker
CPC分类号： G06F17/5081 , B82Y10/00 , B82Y40/00 , G03F1/36 , G03F1/68 , G03F1/70 , G03F1/78 , G03F7/2061 , G06F17/5045 , H01J37/3026 , H01J37/3174 , Y10S430/143
摘要： In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a series of curvilinear character projection shots are determined for a charged particle beam writer system, such that the set of shots can form a continuous track, possibly of varying width, on a surface. A method for forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed.
摘要翻译： 在使用成形带电粒子束光刻的半导体生产领域中，公开了一种用于压裂或掩模数据准备或邻近效应校正的方法和系统，其中为带电粒子束写入器系统确定了一系列曲线角色投影镜头，使得 一组镜头可以在表面上形成可能具有不同宽度的连续轨迹。 还公开了使用一系列曲线角色投影镜头在表面上形成连续轨道的方法。 还公开了用于制造掩模版和用于通过使用一系列曲线字符投影镜在表面上形成连续轨迹来制造诸如硅晶片的基板的方法。
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