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公开(公告)号：US10648068B2
公开(公告)日：2020-05-12
申请号：US16313594
申请日：2018-04-12
Inventor： Pierry Vuille , Roger Cochand , Jean-Luc Bazin , Csilla Miko , Arne Kool
Abstract: A method for single or multiply charged ion implantation into a surface of a treated object, and a device for implementing the implantation method, the method including: directing towards the surface of the treated object an ion beam produced by an ion source of the electronic cyclotron resonance type; producing at least one primary electron beam and directing the primary electron beam so that it passes through the ion beam; and producing a secondary electron beam by reflecting the primary electron beam onto a target once the primary electron beam has traversed the ion beam, the target being oriented such that the secondary electron beam falls onto the surface of the treated object.
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2.发明申请公开(公告)号：US20190189394A1
公开(公告)日：2019-06-20
申请号：US16210004
申请日：2018-12-05
Inventor： Csilla Miko , Pierry Vuille , Jean-Luc Bazin , Arne Kool , Alexis Boulmay
IPC: H01J37/317 , H01J37/08 , H01J37/32 , H01J37/18
CPC classification number: H01J37/3171 , C23C14/48 , G04B39/006 , G04D3/0074 , H01J37/08 , H01J37/18 , H01J37/32339 , H01J37/32357 , H01J37/32422 , H01J37/32678 , H01J37/32697
Abstract: A method for the implantation of mono- or multi-charged ions on a surface of an object to be treated placed in a vacuum chamber, wherein this method includes the step that consist simultaneously of: injecting into the vacuum chamber a beam of ions produced by a source of ions and directing this beam of ions towards the surface of the object to be treated, and illuminating the surface of the object to be treated with a source of ultraviolet radiation producing ultraviolet radiation that propagates in the vacuum chamber. An ion implantation installation for implementing the implantation method.
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