公开(公告)号：US11685989B2

公开(公告)日：2023-06-27

申请号：US16628355

申请日：2018-06-21

Applicant: THE SWATCH GROUP RESEARCH AND DEVELOPMENT LTD

Inventor： Csilla Miko ,  Jean-Luc Bazin

IPC: B22F1/02 ,  C23C14/22 ,  C23C14/48 ,  B22F1/16 ,  B22F1/05 ,  B22F1/052 ,  B22F1/17 ,  C23C14/06 ,  B22F1/054 ,  B22F1/00 ,  B22F3/11 ,  B22F1/065

CPC classification number: B22F1/16 ,  B22F1/00 ,  B22F1/05 ,  B22F1/052 ,  B22F1/054 ,  B22F1/065 ,  B22F1/09 ,  B22F1/17 ,  B22F3/1103 ,  C23C14/0635 ,  C23C14/0641 ,  C23C14/221 ,  C23C14/223 ,  C23C14/48 ,  B22F2302/00 ,  B22F2302/10 ,  B22F2302/15 ,  B22F2302/20 ,  B22F2302/35 ,  Y10T428/12028 ,  Y10T428/12181 ,  Y10T428/12576 ,  Y10T428/12625 ,  Y10T428/12729 ,  Y10T428/12736 ,  Y10T428/12806 ,  Y10T428/12875 ,  Y10T428/12889 ,  Y10T428/12896 ,  Y10T428/2495 ,  Y10T428/24942 ,  Y10T428/2982 ,  Y10T428/2991 ,  Y10T428/2993

Abstract: A method for surface treatment of a metal material in a powder state is provided, the method including obtaining a powder formed from a plurality of particles of the metal material to be treated; and subjecting the powder to an ion implantation process by directing a beam of singly-charged or multi-charged ions towards an outer surface of the particles, the beam being produced by a source of singly-charged or multi-charged ions, whereby the particles have an overall spherical shape with a radius (R). There is also provided a material in a powder state formed from a plurality of particles having a ceramic outer layer and a metal core, the particles having an overall spherical shape.

公开(公告)号：US20190189394A1

公开(公告)日：2019-06-20

申请号：US16210004

申请日：2018-12-05

Applicant: The Swatch Group Research and Development Ltd

Inventor： Csilla Miko ,  Pierry Vuille ,  Jean-Luc Bazin ,  Arne Kool ,  Alexis Boulmay

IPC: H01J37/317 ,  H01J37/08 ,  H01J37/32 ,  H01J37/18

CPC classification number: H01J37/3171 ,  C23C14/48 ,  G04B39/006 ,  G04D3/0074 ,  H01J37/08 ,  H01J37/18 ,  H01J37/32339 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/32678 ,  H01J37/32697

Abstract: A method for the implantation of mono- or multi-charged ions on a surface of an object to be treated placed in a vacuum chamber, wherein this method includes the step that consist simultaneously of: injecting into the vacuum chamber a beam of ions produced by a source of ions and directing this beam of ions towards the surface of the object to be treated, and illuminating the surface of the object to be treated with a source of ultraviolet radiation producing ultraviolet radiation that propagates in the vacuum chamber. An ion implantation installation for implementing the implantation method.

公开(公告)号：US11987869B2

公开(公告)日：2024-05-21

申请号：US17273918

申请日：2020-07-17

Applicant: The Swatch Group Research and Development Ltd

Inventor： Csilla Miko ,  Rémi Grosjean ,  Jean-Luc Bazin

IPC: C22C5/02 ,  B22F1/00 ,  B22F1/05 ,  B22F1/052 ,  B22F1/102 ,  B22F9/24 ,  B28B1/00 ,  B28B11/24 ,  B33Y10/00 ,  B33Y40/10 ,  B33Y70/00 ,  C01B35/04 ,  C22C29/14 ,  B22F10/14 ,  B22F10/28

CPC classification number: C22C5/02 ,  B22F1/05 ,  B22F1/052 ,  B22F1/09 ,  B22F1/102 ,  B22F9/24 ,  B28B1/001 ,  B28B11/243 ,  B33Y10/00 ,  B33Y40/10 ,  B33Y70/00 ,  C01B35/04 ,  C22C29/14 ,  B22F10/14 ,  B22F10/28 ,  B22F2301/255 ,  B22F2302/05 ,  B22F2304/10 ,  C01P2004/50

Abstract: A method for manufacturing an alloy formed from a boride of a precious metal, may involve reacting a source of the precious metal with a source of boron in a salt or a mixture of salts in the molten state. An alloy formed from a boride of a precious metal may include crystalline nanoparticles of MxBy with M being a precious metal, distributed in an amorphous matrix of B or in an amorphous matrix of B and of MzBa.

公开(公告)号：US12179272B2

公开(公告)日：2024-12-31

申请号：US17977198

申请日：2022-10-31

Applicant: The Swatch Group Research and Development Ltd

Inventor： Csilla Miko ,  Rémi Grosjean ,  Jean-Luc Bazin ,  David Portehault ,  Yann Le Godec ,  Simon Delacroix ,  Fernando Igoa Saldana

IPC: B22F3/15 ,  B22F1/07 ,  B22F3/10 ,  B22F3/105 ,  B22F10/12 ,  B22F10/14 ,  B22F10/16 ,  B22F10/18 ,  B22F10/20 ,  B22F10/28 ,  B22F10/34 ,  B33Y10/00 ,  B33Y70/00 ,  B82Y40/00 ,  C22C1/04 ,  C22C1/051 ,  C22C5/02

Abstract: A method for manufacturing a part by alloying a precious metal with boron, wherein: a quantity of precious metal reduced to powder form is provided; a quantity of a nano-structured micrometric boron powder is provided; the precious metal powder is mixed with the nano-structured micrometric boron powder to obtain a mixture; the mixture is compacted by applying a uniaxial pressure; the mixture is subjected to a spark plasma sintering or flash sintering treatment, or to a hot isostatic pressing (HIP) treatment, to obtain an ingot of a precious metal/boron alloy, and the ingot is machined to obtain the part, or the ingot is reduced to powder form by a micronisation treatment and the powder is treated to obtain the part. Additionally, a gold/boron alloy.

公开(公告)号：US11692100B2

公开(公告)日：2023-07-04

申请号：US16486933

申请日：2018-02-26

Applicant: The Swatch Group Research and Development Ltd

Inventor： Jean-Luc Bazin ,  Csilla Miko

IPC: C09C1/00 ,  C09C1/62

CPC classification number: C09C1/0015 ,  C09C1/62 ,  C09C2200/1054 ,  C09C2200/301 ,  C09C2200/303 ,  C09C2200/307

Abstract: A multilayered interference pigment containing, in succession:
a metal core in the form of a flake, the metal core containing a material selected from gold, silver, palladium, rhodium, ruthenium, platinum, osmium, iridium and an alloy thereof;
a first layer of transparent dielectric material; and
a second discontinuous metal layer making it possible to both reflect a portion of the light beam and to transmit another portion of this beam onto the metal core.

公开(公告)号：US10648068B2

公开(公告)日：2020-05-12

申请号：US16313594

申请日：2018-04-12

Applicant: The Swatch Group Research and Development Ltd

Inventor： Pierry Vuille ,  Roger Cochand ,  Jean-Luc Bazin ,  Csilla Miko ,  Arne Kool

IPC: C23C14/00 ,  C23C14/48 ,  G02B1/113 ,  G02B1/12 ,  H01J37/32

Abstract: A method for single or multiply charged ion implantation into a surface of a treated object, and a device for implementing the implantation method, the method including: directing towards the surface of the treated object an ion beam produced by an ion source of the electronic cyclotron resonance type; producing at least one primary electron beam and directing the primary electron beam so that it passes through the ion beam; and producing a secondary electron beam by reflecting the primary electron beam onto a target once the primary electron beam has traversed the ion beam, the target being oriented such that the secondary electron beam falls onto the surface of the treated object.