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    RECORDING MATERIAL MOVING DEVICE AND IMAGE FORMING DEVICE
    4.
    发明申请
    RECORDING MATERIAL MOVING DEVICE AND IMAGE FORMING DEVICE 有权
    记录材料移动装置和图像形成装置

    公开(公告)号：US20090257074A1

    公开(公告)日：2009-10-15

    申请号：US12332033

    申请日：2008-12-10

    申请人： Toshiyuki Kazama ,  Ryoji Watanabe ,  Shouichi Maeda ,  Makoto Ochiai ,  Tatsunori Izawa ,  Naoto Nishi ,  Yoshinobu Nakamura ,  Satoshi Kanou ,  Shun Yashima ,  Michio Tada

    发明人： Toshiyuki Kazama ,  Ryoji Watanabe ,  Shouichi Maeda ,  Makoto Ochiai ,  Tatsunori Izawa ,  Naoto Nishi ,  Yoshinobu Nakamura ,  Satoshi Kanou ,  Shun Yashima ,  Michio Tada

    IPC分类号： H04N1/60

    CPC分类号： H04N1/053 ,  H04N1/12 ,  H04N2201/02439 ,  H04N2201/04712 ,  H04N2201/04734 ,  H04N2201/04737 ,  H04N2201/04756 ,  H04N2201/04794

    摘要： A recording material moving device comprises: a position adjuster that moves a recording material in a direction which is parallel to a recording surface of the recording material and orthogonal to a transporting direction, in an upstream side of a recording position along the transport direction of the recording material; a reference position specifying unit that specifies a reference position; a determination unit that determines whether a range of a predetermined width centered on the reference position exceeds a movable range of the recording material within which the recording material can be moved by the position adjuster; and a controller that causes, if the determination unit determines that the movable range is not exceeded, the position adjuster to sequentially move the recording material within the movable range of the predetermined width centered on the reference position each time a condition for moving the recording material is satisfied.

    摘要翻译： 记录材料移动装置包括：位置调节器，其沿着沿着记录材料的传送方向在记录位置的上游侧沿着与记录材料的记录表面平行的方向并且与传送方向垂直的方向移动记录材料 录音材料; 参考位置指定单元，其指定参考位置; 确定单元，其确定以所述基准位置为中心的预定宽度的范围是否超过所述记录材料的可移动范围，所述记录材料可通过所述位置调节器移动到所述可移动范围内; 以及控制器，如果所述确定单元确定未超过所述可移动范围，则所述位置调整器在每次所述记录材料的移动条件时，将所述记录材料顺序地移动到以所述基准位置为中心的所述预定宽度的可移动范围内 满意

    METHOD OF FORMING RESIST PATTERN
    8.
    发明申请
    METHOD OF FORMING RESIST PATTERN 失效
    形成电阻图案的方法

    公开(公告)号：US20100035192A1

    公开(公告)日：2010-02-11

    申请号：US12533685

    申请日：2009-07-31

    申请人： Tomoyuki Ando ,  Sho Abe ,  Ryoji Watanabe ,  Komei Hirahara

    发明人： Tomoyuki Ando ,  Sho Abe ,  Ryoji Watanabe ,  Komei Hirahara

    IPC分类号： G03F7/20

    CPC分类号： G03F7/2022 ,  G03F7/095

    摘要： A method of forming a resist pattern including: forming a resist film on a substrate using a chemically amplified negative resist composition; forming a latent image of a first line and space pattern by subjecting the resist film to first exposure through a photomask; forming a latent image of a second line and space pattern so as to intersect with the latent image of the first line and space pattern by subjecting the resist film to second exposure through a photomask; and subjecting the resist film to developing to form a hole pattern in the resist film.

    摘要翻译： 一种形成抗蚀剂图案的方法，包括：使用化学放大型负性抗蚀剂组合物在基板上形成抗蚀剂膜; 通过使抗蚀剂膜首先通过光掩模曝光来形成第一线和空间图案的潜像; 通过使光刻胶膜通过光掩模进行第二曝光，形成与第一线和空间图案的潜像相交的第二线和空间图案的潜像; 并且使抗蚀剂膜显影以在抗蚀剂膜中形成孔图案。

    Positive resist composition and method of forming resist pattern
    9.
    发明授权
    Positive resist composition and method of forming resist pattern 有权
    正型抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US07645559B2

    公开(公告)日：2010-01-12

    申请号：US12064288

    申请日：2006-08-16

    申请人： Ryoji Watanabe ,  Masaru Takeshita

    发明人： Ryoji Watanabe ,  Masaru Takeshita

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0045 ,  C08F220/28 ,  G03F7/0397 ,  Y10S430/111 ,  Y10S430/122

    摘要： A positive resist composition and method of forming a resist pattern are provided which enable formation of a resist pattern having excellent shape with reduced LWR.The positive resist composition includes a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon irradiation, the resin component (A) having a structural unit (a1) which has an acetal-type protection group, and the acid-generator component (B) including an acid generator (B1) having a cation moiety represented by general formula (b-5) shown below: wherein Ra and Rb each independently represents an alkyl group, an alkoxy group, a halogen atom or a hydroxyl group; Rc represents an aryl group or alkyl group which may or may not have a substituent; and n′ and n″ each independently represents an integer of 0 to 3.

    摘要翻译： 提供一种正型抗蚀剂组合物和形成抗蚀剂图案的方法，其能够形成具有优异形状的抗蚀剂图案，其具有减小的LWR。 正型抗蚀剂组合物包括在酸作用下表现出增加的碱溶性的树脂组分（A）和在照射时产生酸的酸产生剂组分（B），具有结构单元（a1）的树脂组分（A）具有 缩醛型保护基和含有具有下述通式（b-5）表示的阳离子部分的酸发生剂（B1）的酸发生剂成分（B）：其中，Ra和Rb各自独立地表示烷基， 烷氧基，卤素原子或羟基; Rc表示可以具有或不具有取代基的芳基或烷基; n'和n“各自独立地表示0〜3的整数。