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201 条记录 (耗时 0.036 秒)

    Fabrication of sub-50 nm solid-state nanostructures based on nanolithography
    91.
    发明授权
    Fabrication of sub-50 nm solid-state nanostructures based on nanolithography 失效
    基于纳米光刻制备低于50nm的固态纳米结构

    公开(公告)号：US07291284B2

    公开(公告)日：2007-11-06

    申请号：US10725939

    申请日：2003-12-03

    申请人： Chad A. Mirkin ,  Hua Zhang ,  Dana Weinberger ,  Seunghun Hong

    发明人： Chad A. Mirkin ,  Hua Zhang ,  Dana Weinberger ,  Seunghun Hong

    IPC分类号： B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00

    CPC分类号： B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/2049 ,  Y10T428/24802 ,  Y10T428/24917

    摘要： Combination of nanolithography and wet chemical etching including the fabrication of nanoarrays of sub-50 nm gold dots and line structures with deliberately designed approximately 12-100 nm gaps. These structures were made by initially using direct write nanolithography to pattern the etch resist, 16-mercaptohexadecanoic acid (MHA), on Au/Ti/SiOx/Si substrates and then wet chemical etching to remove the exposed gold. These are the smallest Au structures prepared by a wet chemical etching strategy. Also, Dip-Pen Nanolithography (DPN) has been used to generate resist layers on Au, Ag, and Pd that when combined with wet chemical etching can lead to nanostructures with deliberately designed shapes and sizes. Monolayers of mercaptohexadecanoic acid (MHA) or octadecanethiol (ODT), patterned by DPN, were explored as etch resists. They work comparably well on Au and Ag, but ODT is the superior material for Pd. MHA seems to attract the FeCl3 etchant and results in nonuniform etching of the underlying Pd substrate. Dots, lines, triangles and circles, ranging in size from sub-100 to several hundred nm have been fabricated on these substrates. These results show how one can use DPN as an alternative to more complex and costly procedures like electron beam lithography to generate nanostructures from inorganic materials.

    摘要翻译： 纳米光刻和湿化学蚀刻的组合，包括制造具有故意设计的约12-100nm间隙的亚50nm金点和线结构的纳米阵列。 最初使用直写纳米光刻法在Au / Ti / SiO x / Si衬底上刻蚀抗蚀剂16-巯基十六烷酸（MHA），然后进行湿化学蚀刻以除去暴露的 金。 这些是通过湿化学蚀刻策略制备的最小的Au结构。 此外，Dip-Pen Nanoithography（DPN）已经用于在Au，Ag和Pd上生成抗蚀剂层，当与湿化学蚀刻结合时，可以导致具有故意设计的形状和尺寸的纳米结构。 作为抗蚀剂，研究了由DPN构图的巯基十六烷酸（MHA）或十八烷硫醇（ODT）的单层。 它们在Au和Ag上相当好地工作，但ODT是Pd的优良材料。 MHA似乎吸引FeCl 3 3蚀刻剂，并导致下面的Pd底物的不均匀蚀刻。 已经在这些基板上制造了尺寸从小于100到几百纳米的点，线，三角形和圆形。 这些结果显示了如何使用DPN作为替代更复杂和昂贵的方法，如电子束光刻从无机材料产生纳米结构。

    Automated Switching For Executing Tests Involving Electronic Devices
    92.
    发明申请
    Automated Switching For Executing Tests Involving Electronic Devices 失效
    用于执行涉及电子设备的测试的自动切换

    公开(公告)号：US20070201372A1

    公开(公告)日：2007-08-30

    申请号：US11276142

    申请日：2006-02-15

    申请人： Zili Tong ,  Kaisuo Lu ,  Hua Zhang

    发明人： Zili Tong ,  Kaisuo Lu ,  Hua Zhang

    IPC分类号： H04L12/26

    CPC分类号： G06F11/2733

    摘要： An automated switching system that enables a tester to establish different connections between multiple electronic devices is provided. The system includes a switching module that connects to the electronic devices. The switching module may be controlled to automatically couple the electronic devices to the testing device in different configurations. The switching module may include radio ports for selectively coupling devices one at a time and check ports for concurrently coupling one or more of the devices. The system may also be configured to provide a time-varying coupling between the tester and the electronic devices.

    摘要翻译： 提供一种能够使测试仪在多个电子设备之间建立不同连接的自动切换系统。 该系统包括连接到电子设备的切换模块。 可以控制切换模块，以不同的配置将电子设备自动地耦合到测试设备。 切换模块可以包括用于一次一个地选择性地耦合设备的无线端口，并且检查用于同时耦合一个或多个设备的端口。 该系统还可以被配置为在测试器和电子设备之间提供时变耦合。

    Fabrication of sub-50 nm solid-state nanostructures based on nanolithography
    94.
    发明申请
    Fabrication of sub-50 nm solid-state nanostructures based on nanolithography 失效
    基于纳米光刻制备低于50nm的固态纳米结构

    公开(公告)号：US20060014001A1

    公开(公告)日：2006-01-19

    申请号：US10725939

    申请日：2003-12-03

    申请人： Hua Zhang ,  Chad Mirkin ,  Dana Weinberger ,  Seunghun Hong

    发明人： Hua Zhang ,  Chad Mirkin ,  Dana Weinberger ,  Seunghun Hong

    IPC分类号： B32B15/00

    CPC分类号： B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/2049 ,  Y10T428/24802 ,  Y10T428/24917

    摘要： Combination of nanolithography and wet chemical etching including the fabrication of nanoarrays of sub-50 nm gold dots and line structures with deliberately designed approximately 12-100 nm gaps. These structures were made by initially using direct write nanolithography to pattern the etch resist, 16-mercaptohexadecanoic acid (MHA), on Au/Ti/SiOx/Si substrates and then wet chemical etching to remove the exposed gold. These are the smallest Au structures prepared by a wet chemical etching strategy. Also, Dip-Pen Nanolithography (DPN) has been used to generate resist layers on Au, Ag, and Pd that when combined with wet chemical etching can lead to nanostructures with deliberately designed shapes and sizes. Monolayers of mercaptohexadecanoic acid (MHA) or octadecanethiol (ODT), patterned by DPN, were explored as etch resists. They work comparably well on Au and Ag, but ODT is the superior material for Pd. MHA seems to attract the FeCl3 etchant and results in nonuniform etching of the underlying Pd substrate. Dots, lines, triangles and circles, ranging in size from sub-100 to several hundred nm have been fabricated on these substrates. These results show how one can use DPN as an alternative to more complex and costly procedures like electron beam lithography to generate nanostructures from inorganic materials.

    摘要翻译： 纳米光刻和湿化学蚀刻的组合，包括制造具有故意设计的约12-100nm间隙的亚50nm金点和线结构的纳米阵列。 最初使用直写纳米光刻法在Au / Ti / SiO x / Si衬底上刻蚀抗蚀剂16-巯基十六烷酸（MHA），然后进行湿化学蚀刻以除去暴露的 金。 这些是通过湿化学蚀刻策略制备的最小的Au结构。 此外，Dip-Pen Nanoithography（DPN）已经用于在Au，Ag和Pd上生成抗蚀剂层，当与湿化学蚀刻结合时，可以导致具有故意设计的形状和尺寸的纳米结构。 作为抗蚀剂，研究了由DPN构图的巯基十六烷酸（MHA）或十八烷硫醇（ODT）的单层。 它们在Au和Ag上相当好地工作，但ODT是Pd的优良材料。 MHA似乎吸引FeCl 3 3蚀刻剂，并导致下面的Pd底物的不均匀蚀刻。 已经在这些基板上制造了尺寸从小于100到几百纳米的点，线，三角形和圆形。 这些结果显示了如何使用DPN作为替代更复杂和昂贵的方法，如电子束光刻从无机材料产生纳米结构。

    Apparatus for controlling the drying of previously baked goods
    95.
    发明申请
    Apparatus for controlling the drying of previously baked goods 失效

    公开(公告)号：US20050087524A1

    公开(公告)日：2005-04-28

    申请号：US10691660

    申请日：2003-10-24

    申请人： Hua Zhang ,  Mark Williamson ,  Eileen Roehr ,  Gary Helstern ,  J. Gutierrez

    发明人： Hua Zhang ,  Mark Williamson ,  Eileen Roehr ,  Gary Helstern ,  J. Gutierrez

    IPC分类号： A47F3/00 ,  A47J39/00 ,  A21B1/26 ,  A21B3/15 ,  A47J36/24

    CPC分类号： A47J39/006 ,  A47F3/001 ,  A47J39/003

    摘要： A merchandiser for displaying and warming previously baked dough products, such as a filled pastry shell or other baked dough product, under controlled drying conditions, including an enclosure having one or more wall members that define an interior space, with at least a portion of one of the wall members being transparent, an opening for access into the interior space, a removable support member within the enclosure that includes at least one support surface for previously baked dough products and a spacing arrangement configured and adapted to reproducibly position the support member within the interior space of the enclosure member to facilitate substantially uniform airflow around each support surface and throughout the enclosure, and a heating system for providing heated air in the enclosure, wherein the substantially uniform airflow provides controlled drying of the previously baked dough products in the enclosure. A merchandiser including an air-moving device, a heat source, and a reflective device disposed therebetween is also included.

    Method and apparatus for interference control
    97.
    发明授权
    Method and apparatus for interference control 有权
    用于干扰控制的方法和装置

    公开(公告)号：US09479312B2

    公开(公告)日：2016-10-25

    申请号：US14385036

    申请日：2012-06-07

    申请人： Chaofeng Li ,  Ming Lei ,  Wei Xu ,  Le Liang ,  Hua Zhang ,  Shi Jin

    发明人： Chaofeng Li ,  Ming Lei ,  Wei Xu ,  Le Liang ,  Hua Zhang ,  Shi Jin

    IPC分类号： H04L5/00 ,  H04B15/00 ,  H04W76/02 ,  H04B7/06

    CPC分类号： H04L5/0053 ,  H04B7/0617 ,  H04B7/0619 ,  H04B7/0626 ,  H04B15/00 ,  H04W76/14

    摘要： Methods and apparatuses for interference control have been disclosed. A method for a base station in a wireless communication system, comprising: obtaining a system setting of the wireless communication system; selecting a transmission mode based at least in part on the system setting, wherein the transmission mode is one of an Interference Cancellation IC transmission mode and a Beamforming BF transmission mode; and configuring the selected transmission mode. The total system throughput may be maximized by dynamically switching the transmission mode between IC and BF at the base station. Further, the proposed switching mechanism may be applied to various communication networks where downlink interference may occur.

    摘要翻译： 已经公开了用于干扰控制的方法和装置。 一种用于无线通信系统中的基站的方法，包括：获得所述无线通信系统的系统设置; 至少部分地基于系统设置来选择传输模式，其中传输模式是干扰消除IC传输模式和波束形成BF传输模式之一; 以及配置所选择的传输模式。 通过在基站上动态切换IC和BF之间的传输模式，可以使总系统吞吐量最大化。 此外，所提出的切换机制可以应用于可能发生下行链路干扰的各种通信网络。

    GAS TURBINE SYSTEM AND METHOD
    98.
    发明申请
    GAS TURBINE SYSTEM AND METHOD 审中-公开
    气体涡轮机系统和方法

    公开(公告)号：US20160273456A1

    公开(公告)日：2016-09-22

    申请号：US14768431

    申请日：2013-10-16

    申请人： Hua ZHANG ,  Wenjie WU ,  Yongjiang HAO ,  GENERAL ELECTRIC COMPANY

    发明人： Hua Zhang ,  Wenjie Wu ,  Yongjiang Hao

    IPC分类号： F02C7/32 ,  F02C7/22 ,  F02C3/04 ,  F02C7/36

    CPC分类号： F02C7/32 ,  F02C3/04 ,  F02C7/22 ,  F02C7/36 ,  F05D2220/32 ,  F05D2220/7642 ,  F05D2260/85

    摘要： A fuel supply system includes a first fuel gas compressor coupled to a fuel gas compressor shaft and configured to pressurize a fuel for a gas turbine system. A clutch is coupled to the fuel gas compressor shaft and is configured to selectively engage the fuel gas compressor shaft with a turbine shaft of the gas turbine system. An electromechanical machine is configured to operator as a motor to drive the fuel gas compressor shaft or to operate as a generator driven by the turbine shaft to generator power, based on an operating condition of the gas turbine system.

    摘要翻译： 燃料供应系统包括耦合到燃料气体压缩机轴并被配置为对燃气轮机系统的燃料加压的第一燃料气体压缩机。 离合器联接到燃料气体压缩机轴并且构造成选择性地将燃料气体压缩机轴与燃气轮机系统的涡轮轴接合。 机电机构被配置为基于燃气轮机系统的操作条件，作为电动机操作以驱动燃料气体压缩机轴或作为由涡轮机轴驱动的发电机运行以发电机功率。