Printing system
    91.
    发明授权
    Printing system 有权
    印刷系统

    公开(公告)号:US06650864B2

    公开(公告)日:2003-11-18

    申请号:US10000306

    申请日:2001-12-04

    IPC分类号: G03G1500

    摘要: A printing system has a first printer apparatus for forming an image on a first plane of a web having no feed holes and a second printer apparatus provided at a post stage following the first printer apparatus for forming an image on a second plane of said web. The first printer apparatus (P1) is operable to form a position-alignment mark (Rm) at a predesignated position on each page of a web. This position-alignment mark is detected by mark detection means of the second printer apparatus (P2). Control means is provided for controlling the web transport speed so that both the generation timing of a web feed control signal (CPF-N signal) being generated with preset cyclic periods and the generation timing of a mark detection signal issued from the mark detection means through detection of the position-alignment mark are kept constant in phase.

    摘要翻译: 打印系统具有第一打印机装置,用于在没有进纸孔的纸幅的第一平面上形成图像;以及第二打印机装置,设置在第一打印机装置之后的第一打印机装置上,用于在所述纸幅的第二平面上形成图像。 第一打印机设备(P1)可操作以在网页的每一页上的预定位置处形成位置对准标记(Rm)。 该位置对准标记由第二打印机装置(P2)的标记检测装置检测。 提供控制装置,用于控制纸幅传送速度,使得以预设的循环周期生成纸幅馈送控制信号(CPF-N信号)的生成定时以及从标记检测装置发出的标记检测信号的生成定时 位置对准标记的检测保持相位恒定。

    Global alignment using multiple alignment pattern candidates
    94.
    发明授权
    Global alignment using multiple alignment pattern candidates 有权
    使用多个对齐模式候选的全局对齐

    公开(公告)号:US09057873B2

    公开(公告)日:2015-06-16

    申请号:US13988547

    申请日:2011-11-22

    摘要: In order to provide a technique for performing global alignment (detecting position shift and rotation of a wafer) stably and automatically using an optical microscope, as a pattern for global alignment, multiple alignment pattern candidates are calculated (107), multiple data for matching are created for each alignment pattern (108), matching is performed with respect to the data for matching for each alignment pattern in descending order of appropriateness as an alignment pattern with an image (113) based on an image signal from the optical microscope (114), and the amount of position shift and the amount of rotation of the wafer are calculated (116) on the basis of the results of matching (115).

    摘要翻译: 为了提供使用光学显微镜稳定自动地进行全局对准(检测位置偏移和晶片旋转)的技术,作为全局对准的图案,计算多个取向图案候选(107),用于匹配的多个数据 根据来自光学显微镜(114)的图像信号,针对每个对准图案(108)创建匹配,以相对于每个对齐图案的匹配数据,以适当的顺序作为与图像(113)的对准图案进行匹配, ,并且基于匹配结果(115)计算晶片的位置偏移量和旋转量(116)。

    Charged particle trajectory control apparatus, charged particle accelerator, charged particle storage ring, and deflection electromagnet
    95.
    发明授权
    Charged particle trajectory control apparatus, charged particle accelerator, charged particle storage ring, and deflection electromagnet 有权
    带电粒子轨迹控制装置,带电粒子加速器,带电粒子储存环和偏转电磁体

    公开(公告)号:US08704464B2

    公开(公告)日:2014-04-22

    申请号:US13995606

    申请日:2011-12-19

    IPC分类号: H05H11/00

    摘要: A charged particle orbit control device (100) is used in a ring-shaped charged particle accelerator or a charged particle storage ring. The charged particle orbit control device (100) is configured to enable the orbit of a charged particle to return to the original orbit in multiple cycles. The charged particle orbit control device (100) includes multiple bending magnets (1) that bend the charged particle (3). In the charged particle orbit control device (100), the bending angle and relative position of each bending magnet (1) are prescribed such that every time the charged particle (3) passes through, the orbit of the charged particle (3) in each bending magnet (1) alternately switches between two orbits.

    摘要翻译: 带电粒子轨道控制装置(100)用于环形带电粒子加速器或带电粒子储存环。 带电粒子轨道控制装置(100)被配置为使得带电粒子的轨道能够以多个周期返回原始轨道。 带电粒子轨道控制装置(100)包括使带电粒子(3)弯曲的多个弯曲磁体(1)。 在带电粒子轨道控制装置(100)中,规定每个弯曲磁体(1)的弯曲角度和相对位置,使得每次带电粒子(3)通过时,带电粒子(3)的轨道在每个 弯曲磁体(1)交替地在两个轨道之间切换。

    Charged Particle Trajectory Control Apparatus, Charged Particle Accelerator, Charged Particle Storage Ring, and Deflection Electromagnet
    96.
    发明申请
    Charged Particle Trajectory Control Apparatus, Charged Particle Accelerator, Charged Particle Storage Ring, and Deflection Electromagnet 有权
    带电粒子轨迹控制装置,带电粒子加速器,带电粒子存储环和偏转电磁体

    公开(公告)号:US20130270452A1

    公开(公告)日:2013-10-17

    申请号:US13995606

    申请日:2011-12-19

    IPC分类号: H01J3/34

    摘要: A charged particle orbit control device (100) is used in a ring-shaped charged particle accelerator or a charged particle storage ring. The charged particle orbit control device (100) is configured to enable the orbit of a charged particle to return to the original orbit in multiple cycles. The charged particle orbit control device (100) includes multiple bending magnets (1) that bend the charged particle (3). In the charged particle orbit control device (100), the bending angle and relative position of each bending magnet (1) are prescribed such that every time the charged particle (3) passes through, the orbit of the charged particle (3) in each bending magnet (1) alternately switches between two orbits.

    摘要翻译: 带电粒子轨道控制装置(100)用于环形带电粒子加速器或带电粒子储存环。 带电粒子轨道控制装置(100)被配置为使带电粒子的轨道能够以多个周期返回原始轨道。 带电粒子轨道控制装置(100)包括使带电粒子(3)弯曲的多个弯曲磁体(1)。 在带电粒子轨道控制装置(100)中,规定每个弯曲磁体(1)的弯曲角度和相对位置,使得每次带电粒子(3)通过时,带电粒子(3)的轨道在每个 弯曲磁体(1)交替地在两个轨道之间切换。

    Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the system
    97.
    发明授权
    Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the system 有权
    扫描电子显微镜系统和通过使用该系统测量在半导体器件上形成的图案的尺寸的方法

    公开(公告)号:US08481936B2

    公开(公告)日:2013-07-09

    申请号:US13348813

    申请日:2012-01-12

    IPC分类号: H01J37/26

    CPC分类号: G03F1/84 G03F1/86 G03F7/70625

    摘要: The present invention is for providing a scanning electron microscope system adapted to output contour information fitting in with the real pattern edge end of a sample, and is arranged to generate a local projection waveform by projecting the scanning electron microscope image in the tangential direction with respect to the pattern edge at each point of the pattern edge of the scanning electron microscope image, estimate the cross-sectional shape of the pattern transferred on the sample by applying the local projection waveform generated at each point to a library, which has previously been created, correlating the cross-sectional shape with the electron beam signal waveform, obtain position coordinate of the edge end fitting in with the cross-sectional shape, and output the contour of the pattern as a range of position coordinates.

    摘要翻译: 本发明提供一种扫描电子显微镜系统,其适于输出与样品的实际图案边缘端相匹配的轮廓信息,并且被布置成通过相对于扫描电子显微镜图像沿切线方向投影而产生局部投影波形 到扫描电子显微镜图像的图案边缘的每个点处的图案边缘,通过将在每个点处生成的局部投影波形应用到先前已经创建的库来估计在样本上传送的图案的横截面形状 将横截面形状与电子束信号波形相关联,以横截面形状获得边缘端配件的位置坐标,并将图案的轮廓作为位置坐标的范围输出。

    Detergent for lithography and method of forming resist pattern with the same
    98.
    发明授权
    Detergent for lithography and method of forming resist pattern with the same 失效
    光刻用洗涤剂及其形成抗蚀剂图案的方法

    公开(公告)号:US08367312B2

    公开(公告)日:2013-02-05

    申请号:US12087545

    申请日:2006-12-08

    IPC分类号: C11D7/32 C11D1/75

    CPC分类号: G03F7/322

    摘要: Conventional detergents for lithography which contain a surfactant as an active ingredient should have a reduced surfactant concentration because heightened surfactant concentrations result in dissolution of the resin component of a photoresist composition and hence in a dimensional change of a resist pattern. However, the conventional detergents have had a drawback that such a low concentration unavoidably reduces the ability to inhibit pattern falling and defect occurrence. A detergent for lithography is provided which is an aqueous solution containing (A) at least one member selected among nitrogenous cationic surfactants and nitrogenous ampholytic surfactants and (B) an anionic surfactant. This detergent retains a low surface tension even when it has a low concentration. It is effective in inhibiting pattern falling and defect occurrence. It can also inhibit resist patterns from fluctuating in dimension.

    摘要翻译: 含有表面活性剂作为活性成分的常规的光刻用洗涤剂应具有降低的表面活性剂浓度,因为增加的表面活性剂浓度导致光致抗蚀剂组合物的树脂组分的溶解,并因此导致抗蚀剂图案的尺寸变化。 然而,常规洗涤剂具有这样的缺点:这种低浓度不可避免地降低了抑制图案下落和缺陷发生的能力。 提供了一种用于光刻的洗涤剂,其是含有(A)至少一种选自含氮阳离子表面活性剂和含氮两性表面活性剂中的成分的水溶液和(B)阴离子表面活性剂。 这种洗涤剂即使在低浓度时也保持低的表面张力。 有效抑制图形下降和缺陷发生。 它也可以抑制抗蚀剂图案的波动。

    SCANNING ELECTRON MICROSCOPE SYSTEM AND METHOD FOR MEASURING DIMENSIONS OF PATTERNS FORMED ON SEMICONDUCTOR DEVICE BY USING THE SYSTEM
    99.
    发明申请
    SCANNING ELECTRON MICROSCOPE SYSTEM AND METHOD FOR MEASURING DIMENSIONS OF PATTERNS FORMED ON SEMICONDUCTOR DEVICE BY USING THE SYSTEM 有权
    扫描电子显微镜系统和通过使用系统测量形成在半导体器件上的图案尺寸的方法

    公开(公告)号:US20120112067A1

    公开(公告)日:2012-05-10

    申请号:US13348813

    申请日:2012-01-12

    IPC分类号: H01J37/28

    CPC分类号: G03F1/84 G03F1/86 G03F7/70625

    摘要: The present invention is for providing a scanning electron microscope system adapted to output contour information fitting in with the real pattern edge end of a sample, and is arranged to generate a local projection waveform by projecting the scanning electron microscope image in the tangential direction with respect to the pattern edge at each point of the pattern edge of the scanning electron microscope image, estimate the cross-sectional shape of the pattern transferred on the sample by applying the local projection waveform generated at each point to a library, which has previously been created, correlating the cross-sectional shape with the electron beam signal waveform, obtain position coordinate of the edge end fitting in with the cross-sectional shape, and output the contour of the pattern as a range of position coordinates.

    摘要翻译: 本发明提供一种扫描电子显微镜系统,其适于输出与样品的实际图案边缘端相匹配的轮廓信息,并且被布置成通过相对于扫描电子显微镜图像沿切线方向投影而产生局部投影波形 到扫描电子显微镜图像的图案边缘的每个点处的图案边缘,通过将在每个点处生成的局部投影波形应用到先前已经创建的库来估计在样本上传送的图案的横截面形状 将横截面形状与电子束信号波形相关联,以横截面形状获得边缘端配件的位置坐标,并将图案的轮廓作为位置坐标的范围输出。

    Method and Apparatus For Inspecting Defect Of Pattern Formed On Semiconductor Device
    100.
    发明申请
    Method and Apparatus For Inspecting Defect Of Pattern Formed On Semiconductor Device 有权
    检测半导体器件形成缺陷的方法和装置

    公开(公告)号:US20120002861A1

    公开(公告)日:2012-01-05

    申请号:US13231394

    申请日:2011-09-13

    IPC分类号: G06K9/00

    摘要: An apparatus and method for inspecting a defect of a circuit pattern formed on a semiconductor wafer includes a defect classifier have a comparison shape forming section for forming a plurality of comparison shapes corresponding to an SEM image of an inspection region by deforming the shape of the circuit pattern in accordance with a plurality of shape deformation rules using design data corresponding to the circuit pattern within the inspection region and a shape similar to the SEM image of the inspection region out of the plurality of comparison shapes formed and selected as the comparison shape, and a shape comparing and classifying section for classifying the SEM image using information of the comparison shape selected in the comparison shape forming section and the inspection shape of the circuit pattern of the SEM image of the inspection region.

    摘要翻译: 用于检查形成在半导体晶片上的电路图案的缺陷的装置和方法包括:缺陷分类器,具有比较形状形成部,用于通过使电路的形状变形来形成与检查区域的SEM图像对应的多个比较形状 使用与检查区域内的电路图案相对应的设计数据的多个形状变形规则的形状以及形成和选择为比较形状的多个比较形状中的检查区域的SEM图像的形状,以及 形状比较和分类部分,用于使用在比较形状形成部分中选择的比较形状的信息和检查区域的SEM图像的电路图案的检查形状来对SEM图像进行分类。