Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device
    91.
    发明申请
    Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device 有权
    用于校正焦点的曝光方法,以及半导体装置的制造方法

    公开(公告)号:US20060061756A1

    公开(公告)日:2006-03-23

    申请号:US11220701

    申请日:2005-09-08

    IPC分类号: G01B9/00

    CPC分类号: G03F7/70516

    摘要: There is disclosed an exposure method for correcting a focal point, comprising: illuminating a mask, in which a mask-pattern including at least a set of a first mask-pattern and a second mask-pattern mutually different in shape is formed, from a direction in which a point located off an optical axis of an exposure apparatus is a center of illumination, and exposing and projecting an image of said mask-pattern toward an image-receiving element; measuring a mutual relative distance between images of said first and second mask-patterns exposed and projected on said image-receiving element, thereby measuring a focal point of a projecting optical system of said exposure apparatus; and moving said image-receiving element along a direction of said optical axis of said exposure apparatus on a basis of a result of said measurement, and disposing said image-receiving element at an appropriate focal point of said projecting optical system.

    摘要翻译: 公开了一种用于校正焦点的曝光方法,包括:照射掩模,其中形成包括至少一组第一掩模图案和形成相互不同形状的第二掩模图案的掩模图案 使曝光装置的光轴离开的点为照明中心的方向,向图像接收元件曝光和投影所述掩模图案的图像; 测量曝光和投影在所述图像接收元件上的所述第一和第二掩模图案的图像之间的相对相对距离,从而测量所述曝光设备的投影光学系统的焦点; 并且基于所述测量的结果沿所述曝光装置的所述光轴的方向移动所述图像接收元件,并将所述图像接收元件设置在所述投影光学系统的适当焦点处。

    Data processing system, data processing method, and data processing program
    92.
    发明申请
    Data processing system, data processing method, and data processing program 审中-公开
    数据处理系统,数据处理方法和数据处理程序

    公开(公告)号:US20050201194A1

    公开(公告)日:2005-09-15

    申请号:US11077127

    申请日:2005-03-11

    CPC分类号: G06F9/543

    摘要: A data processing system 30 includes a memory 61 storing at least one item of data as stored data, a data extracting section 32 connected to the memory 61, a data retrieving section 33 connected to the memory 61, and a set operation section 39. The data extracting section 32 extracts first data from data used in a first application. The set operation section 39 executes a set operation upon the first data and the stored data to produce operation result data representative of a result of the set operation. The data retrieving section 33 delivers the operation result data to a second application.

    摘要翻译: 数据处理系统30包括存储至少一个数据项作为存储数据的存储器61,连接到存储器61的数据提取部分32,连接到存储器61的数据检索部分33和设置操作部分39。 数据提取部32从在第一应用中使用的数据中提取第一数据。 设定操作部分39对第一数据和存储的数据执行设置操作,以产生表示设置操作的结果的操作结果数据。 数据检索部分33将操作结果数据传送到第二应用程序。

    Fine pattern inspection apparatus and method and managing apparatus and method of critical dimension scanning electron microscope device
    94.
    发明授权
    Fine pattern inspection apparatus and method and managing apparatus and method of critical dimension scanning electron microscope device 失效
    临界尺寸扫描电子显微镜装置精细图案检测装置及方法及管理装置及方法

    公开(公告)号:US06642519B2

    公开(公告)日:2003-11-04

    申请号:US10254664

    申请日:2002-09-26

    申请人: Takahiro Ikeda

    发明人: Takahiro Ikeda

    IPC分类号: G01N23225

    摘要: A fine pattern inspection apparatus includes: a first calculation unit which receives data of a first secondary electron signal obtained by irradiating a plurality of test patterns formed on a test substrate with an electron beam and receives data of an contour shape of a cross-section of each of the test patterns, the test substrate being the same as a substrate on which a pattern to be inspected is formed, the test patterns being formed with different cross-sectional shapes, and which separates the first secondary electron signal into variables of a first function containing the contour shape of the cross-section as arguments, a second function that is defined by a step function depending on respective materials constituting the test patterns and a third function that represents the size of a distortion of the signal; a storing unit which has a first storing area to store the first through third functions obtained from the first calculation unit; and a second calculation unit which receives data of a second secondary electron signal obtained by irradiating the pattern to be inspected with an electron beam, and executes calculations so as to extract components relating to the cross-sectional shape of the pattern to be inspected from the second secondary electron signal by using the first through third functions stored in the storing unit.

    摘要翻译: 精细图案检查装置包括:第一计算单元,其接收通过用电子束照射形成在测试基板上的多个测试图案而获得的第一二次电子信号的数据,并接收横截面的轮廓形状的数据 每个测试图案,测试基板与其上形成有待检查图案的基板相同,测试图案形成为不同的横截面形状,并且将第一二次电子信号分离成第一 功能,其包含横截面的轮廓形状作为参数,根据构成测试图案的各种材料的阶梯函数定义的第二函数和表示信号的失真大小的第三函数; 存储单元,具有用于存储从第一计算单元获得的第一至第三功能的第一存储区域; 以及第二计算单元,其接收通过用电子束照射被检查的图案而获得的第二二次电子信号的数据,并且执行计算,以便从所述检查的图案的截面形状提取与 通过使用存储在存储单元中的第一至第三功能来产生第二二次电子信号。

    Pattern lithography method
    96.
    发明授权
    Pattern lithography method 失效
    图案光刻法

    公开(公告)号:US5830623A

    公开(公告)日:1998-11-03

    申请号:US715375

    申请日:1996-09-12

    摘要: It is an object of the present invention to obtain a resist pattern of a high dimensional accuracy. In order to accomplish this object, a pattern lithography method according to the present invention comprises the steps of: forming a resist film 2 on a substrate 1 to be processed; applying a hydrous polymer solution 4 on the resist film 2; cross-linking polymers in the hydrous polymer solution to form a hydrogel film 4a of a predetermined thickness; and pattern-exposing the resist film 2 through the hydrogel film, and then, removing the hydrogel film 4a.

    摘要翻译: 本发明的目的是获得高尺寸精度的抗蚀剂图案。 为了实现该目的,根据本发明的图案光刻方法包括以下步骤:在待加工的基板1上形成抗蚀剂膜2; 在抗蚀剂膜2上施加含水聚合物溶液4; 在含水聚合物溶液中交联聚合物以形成预定厚度的水凝胶膜4a; 并通过水凝胶膜将抗蚀剂膜2图案曝光,然后除去水凝胶膜4a。

    Interchangeable lens and digital camera including controller for stopping zoom lens at one of discrete predetermined stop positions
    97.
    发明授权
    Interchangeable lens and digital camera including controller for stopping zoom lens at one of discrete predetermined stop positions 有权
    可互换镜头和数码相机包括用于在变化的预定停止位置之一处停止变焦镜头的控制器

    公开(公告)号:US08941759B2

    公开(公告)日:2015-01-27

    申请号:US13818707

    申请日:2011-08-24

    申请人: Takahiro Ikeda

    发明人: Takahiro Ikeda

    摘要: An interchangeable lens includes a zoom lens, a driver configured to drive the zoom lens, an operation unit configured to receive a user's operation for changing a magnification of the zoom lens, and a controller configured to control the driver according to the operation of the operation unit. The controller controls the driver in either one of a first operation mode for enabling the zoom lens to stop at an arbitrary position according to the operation of the operation unit and a second operation mode for enabling the zoom lens to stop at one of discrete predetermined stop positions according to the operation of the operation unit.

    摘要翻译: 可互换镜头包括变焦镜头,被配置为驱动变焦镜头的驱动器,被配置为接收用户改变变焦镜头的倍率的操作的操作单元,以及被配置为根据操作的操作来控制驾驶员的控制器 单元。 控制器根据操作单元的操作使第一操作模式中的任一个控制驱动器,使得变焦镜头能够在任意位置停止;以及第二操作模式,用于使得变焦镜头能够以离散的预定停止点之一停止 根据操作单元的操作进行定位。

    Cell observation device and cell observation method
    98.
    发明授权
    Cell observation device and cell observation method 有权
    细胞观察装置和细胞观察方法

    公开(公告)号:US08873027B2

    公开(公告)日:2014-10-28

    申请号:US13642027

    申请日:2011-04-13

    摘要: A cell observation device is provided with a reflection interference shutter 106A which adjusts a light quantity of light emitted from a reflection interference measurement light source 106, a quantitative phase shutter 105A which adjusts a light quantity of light emitted from a quantitative phase measurement light source, a camera 110 which images reflected light from the reflection interference measurement light source 106 to generate a reflection interference image and which images transmitted light from a quantitative phase measurement light source 105 to generate a quantitative phase image, and a first extraction unit 204 and a second extraction unit 205 which extract first and second parameters from the reflection interference image generated by the camera 110. During generation of the reflection interference image, the quantitative phase shutter 105A blocks the light from the quantitative phase measurement light source 105. During generation of the quantitative phase image, the reflection interference shutter 106A blocks the light from the reflection interference measurement light source 106.

    摘要翻译: 电池观察装置设置有反射干涉光圈106A,该反射干涉光圈106A调节从反射干涉测量光源106发射的光的光量,调节从定量相位测量光源发射的光的光量的定量相位快门105A, 对来自反射干涉测量光源106的反射光进行成像以产生反射干涉图像的摄像机110,以及来自定量相位测量光源105的透射光以产生定量相位图像的图像,以及第一提取单元204和第二 提取单元205,其从由相机110产生的反射干涉图像中提取第一和第二参数。在产生反射干涉图像期间,定量相位快门105A阻挡来自定量相位测量光源105的光。在定量 相位图像, 反射干涉光闸106A阻挡来自反射干涉测量光源106的光。

    Interchangeable lens and camera body
    99.
    发明授权
    Interchangeable lens and camera body 有权
    可互换镜头和相机机身

    公开(公告)号:US08649675B2

    公开(公告)日:2014-02-11

    申请号:US13494405

    申请日:2012-06-12

    摘要: An interchangeable lens mountable to a camera body includes a zoom lens configured to adjust an angle of view of a subject image, a driver configured to move the zoom lens in an optical axis direction, a plurality of operating members configured to generate an operation signal for driving the driver according to operation performed by a user, a communication unit configured to receive, from the camera body, setting information for setting valid/invalid of at least one of the plurality of operating members, and a controller configured to control the driver. The controller drives and does not drive the driver based on the operation signal from the operating member having been set to valid and invalid, respectively, by the setting information received through the communication unit.

    摘要翻译: 可安装到相机主体的可互换镜头包括被配置为调节被摄体图像的视角的变焦镜头,配置成沿光轴方向移动变焦镜头的驱动器,多个操作部件,其被配置为产生用于 根据用户执行的操作来驱动驾驶员;通信单元,被配置为从所述照相机主体接收用于设置所述多个操作构件中的至少一个的设置有效/无效的设置信息;以及控制器,其被配置为控制所述驾驶员。 控制器基于通过通信单元接收到的设置信息,分别基于已经被设置为有效和无效的操作构件的操作信号来驱动驱动器。

    Imaging apparatus
    100.
    发明授权
    Imaging apparatus 有权
    成像设备

    公开(公告)号:US08416333B2

    公开(公告)日:2013-04-09

    申请号:US12869834

    申请日:2010-08-27

    IPC分类号: H04N5/222

    CPC分类号: H04N5/23293 H04N5/2251

    摘要: An imaging apparatus for capturing an image includes a first display unit, a second display unit capable of being in a set-in state in which the second display unit is set in a body of the imaging apparatus or a non-set-in state in which the second display unit is not set in the body of the imaging apparatus, a proximity sensor operable to sense proximity of an object, and a controller operable to allow the first display unit to display an image when the proximity sensor senses the proximity of the object, and allows the second display unit to display an image when the proximity sensor does not sense the proximity of the object. The controller controls a sensing function of the proximity sensor according to whether the second display unit is in the set-in state or the non-set-in state. For example, the proximity sensor may sense the proximity of the object when the object is continuously sensed for a predetermined sensing time or more. The controller may set the predetermined sensing time for the second display unit being in the non-set-in state to be longer than the predetermined sensing time for the second display unit being in the set-in state.

    摘要翻译: 一种用于拍摄图像的成像设备包括:第一显示单元,能够处于第二显示单元被设置在成像设备的主体中的设定状态或第二显示单元的未设定状态的第二显示单元 其中第二显示单元未设置在成像设备的主体中,可接近传感器可操作以感测物体的接近度;以及控制器,其可操作以允许第一显示单元在接近传感器感测到 并且当接近传感器不感测物体的接近时允许第二显示单元显示图像。 控制器根据第二显示单元是处于设置状态还是非设置状态来控制接近传感器的感测功能。 例如,当物体在预定的感测时间或更长时间连续感测时,接近传感器可以感测物体的接近度。 控制器可以将处于非设置状态的第二显示单元的预定感测时间设置为比第二显示单元处于置入状态的预定感测时间长。