摘要:
There is disclosed an exposure method for correcting a focal point, comprising: illuminating a mask, in which a mask-pattern including at least a set of a first mask-pattern and a second mask-pattern mutually different in shape is formed, from a direction in which a point located off an optical axis of an exposure apparatus is a center of illumination, and exposing and projecting an image of said mask-pattern toward an image-receiving element; measuring a mutual relative distance between images of said first and second mask-patterns exposed and projected on said image-receiving element, thereby measuring a focal point of a projecting optical system of said exposure apparatus; and moving said image-receiving element along a direction of said optical axis of said exposure apparatus on a basis of a result of said measurement, and disposing said image-receiving element at an appropriate focal point of said projecting optical system.
摘要:
A data processing system 30 includes a memory 61 storing at least one item of data as stored data, a data extracting section 32 connected to the memory 61, a data retrieving section 33 connected to the memory 61, and a set operation section 39. The data extracting section 32 extracts first data from data used in a first application. The set operation section 39 executes a set operation upon the first data and the stored data to produce operation result data representative of a result of the set operation. The data retrieving section 33 delivers the operation result data to a second application.
摘要:
The present invention relates to a process for preparing dye-comprising aqueous polymer dispersions by free-radical aqueous emulsion polymerization of ethylenically unsaturated monomers in the presence of free-radical initiators, in which at least some of the monomers are employed in the form of an oil-in-water emulsion E1 whose disperse phase comprises at least one oil-soluble dye, wherein the disperse phase of E1 is formed essentially of dye-comprising monomer droplets having a diameter
摘要:
A fine pattern inspection apparatus includes: a first calculation unit which receives data of a first secondary electron signal obtained by irradiating a plurality of test patterns formed on a test substrate with an electron beam and receives data of an contour shape of a cross-section of each of the test patterns, the test substrate being the same as a substrate on which a pattern to be inspected is formed, the test patterns being formed with different cross-sectional shapes, and which separates the first secondary electron signal into variables of a first function containing the contour shape of the cross-section as arguments, a second function that is defined by a step function depending on respective materials constituting the test patterns and a third function that represents the size of a distortion of the signal; a storing unit which has a first storing area to store the first through third functions obtained from the first calculation unit; and a second calculation unit which receives data of a second secondary electron signal obtained by irradiating the pattern to be inspected with an electron beam, and executes calculations so as to extract components relating to the cross-sectional shape of the pattern to be inspected from the second secondary electron signal by using the first through third functions stored in the storing unit.
摘要:
The present invention describes the use of finely divided dye-containing polymers PD in the form of an aqueous polymer dispersion or a polymer powder obtainable therefrom, the polymer matrix of which comprises at least one organic dye D in homogeneously dispersed form, as color-imparting constituent in cosmetic compositions. The present invention also describes cosmetic compositions which comprise a color-containing polymer in an amount of from 0.1 to 50% by weight, based on the total weight of the cosmetic composition, and additives customary for cosmetic compositions.
摘要:
It is an object of the present invention to obtain a resist pattern of a high dimensional accuracy. In order to accomplish this object, a pattern lithography method according to the present invention comprises the steps of: forming a resist film 2 on a substrate 1 to be processed; applying a hydrous polymer solution 4 on the resist film 2; cross-linking polymers in the hydrous polymer solution to form a hydrogel film 4a of a predetermined thickness; and pattern-exposing the resist film 2 through the hydrogel film, and then, removing the hydrogel film 4a.
摘要:
An interchangeable lens includes a zoom lens, a driver configured to drive the zoom lens, an operation unit configured to receive a user's operation for changing a magnification of the zoom lens, and a controller configured to control the driver according to the operation of the operation unit. The controller controls the driver in either one of a first operation mode for enabling the zoom lens to stop at an arbitrary position according to the operation of the operation unit and a second operation mode for enabling the zoom lens to stop at one of discrete predetermined stop positions according to the operation of the operation unit.
摘要:
A cell observation device is provided with a reflection interference shutter 106A which adjusts a light quantity of light emitted from a reflection interference measurement light source 106, a quantitative phase shutter 105A which adjusts a light quantity of light emitted from a quantitative phase measurement light source, a camera 110 which images reflected light from the reflection interference measurement light source 106 to generate a reflection interference image and which images transmitted light from a quantitative phase measurement light source 105 to generate a quantitative phase image, and a first extraction unit 204 and a second extraction unit 205 which extract first and second parameters from the reflection interference image generated by the camera 110. During generation of the reflection interference image, the quantitative phase shutter 105A blocks the light from the quantitative phase measurement light source 105. During generation of the quantitative phase image, the reflection interference shutter 106A blocks the light from the reflection interference measurement light source 106.
摘要:
An interchangeable lens mountable to a camera body includes a zoom lens configured to adjust an angle of view of a subject image, a driver configured to move the zoom lens in an optical axis direction, a plurality of operating members configured to generate an operation signal for driving the driver according to operation performed by a user, a communication unit configured to receive, from the camera body, setting information for setting valid/invalid of at least one of the plurality of operating members, and a controller configured to control the driver. The controller drives and does not drive the driver based on the operation signal from the operating member having been set to valid and invalid, respectively, by the setting information received through the communication unit.
摘要:
An imaging apparatus for capturing an image includes a first display unit, a second display unit capable of being in a set-in state in which the second display unit is set in a body of the imaging apparatus or a non-set-in state in which the second display unit is not set in the body of the imaging apparatus, a proximity sensor operable to sense proximity of an object, and a controller operable to allow the first display unit to display an image when the proximity sensor senses the proximity of the object, and allows the second display unit to display an image when the proximity sensor does not sense the proximity of the object. The controller controls a sensing function of the proximity sensor according to whether the second display unit is in the set-in state or the non-set-in state. For example, the proximity sensor may sense the proximity of the object when the object is continuously sensed for a predetermined sensing time or more. The controller may set the predetermined sensing time for the second display unit being in the non-set-in state to be longer than the predetermined sensing time for the second display unit being in the set-in state.