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    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    91.
    发明申请
    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    微波投影曝光装置

    公开(公告)号：US20100231883A1

    公开(公告)日：2010-09-16

    申请号：US12727482

    申请日：2010-03-19

    申请人： Aurelian Dodoc ,  Sascha Bleidistel ,  Olaf Conradi ,  Arif Kazi

    发明人： Aurelian Dodoc ,  Sascha Bleidistel ,  Olaf Conradi ,  Arif Kazi

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70891 ,  G03F7/70308

    摘要： A microlithographic projection exposure apparatus includes a primary illumination system producing projection light, a projection objective and a correction optical system. The correction optical system includes a secondary illumination system, which produces an intensity distribution of correction light in a reference surface, and a correction element which includes a heating material and is arranged in a plane that is at least substantially optically conjugate to the reference surface such that the correction light and the projection light pass through at least one lens contained in the projection objective before they impinge on the correction element. All lenses through which both the correction light and the projection light pass are made of a lens material which has a lower coefficient of absorption for the correction light than the heating material contained in the correction element.

    摘要翻译： 微光刻投影曝光装置包括产生投影光的一次照明系统，投射物镜和校正光学系统。 校正光学系统包括二次照明系统，其产生参考表面中的校正光的强度分布;以及校正元件，其包括加热材料，并且被布置在与参考表面至少基本上光学共轭的平面中， 校正光和投射光在撞击在校正元件上之前通过包含在投影物镜中的至少一个透镜。 校正光和投影光通过的所有透镜由透镜材料制成，该透镜材料与校正元件中包含的加热材料相比具有较低的校正光吸收系数。

    Refractive projection objective for immersion lithography
    92.
    发明授权
    Refractive projection objective for immersion lithography 有权
    用于浸没光刻的折射投影物镜

    公开(公告)号：US07751129B2

    公开(公告)日：2010-07-06

    申请号：US10576754

    申请日：2003-10-22

    申请人： Aurelian Dodoc ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    发明人： Aurelian Dodoc ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    IPC分类号： G02B9/60

    CPC分类号： G03F7/70241 ,  G02B13/143 ,  G03F7/70341

    摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups in the case of which a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power are provided. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size. For working wavelengths below 200 nm, structural widths of substantially under 100 nm can be resolved when use is made of immersion fluids between the projection objective and substrate.

    摘要翻译： 适合于浸没微光刻的纯折射投影物镜被设计为具有五个透镜组的单腰系统，在这种情况下，具有负屈光力的第一透镜组，正屈光力的第二透镜组，负折射力的第三透镜组 提供折射光焦度，正屈光力的第四透镜组和正屈光力的第五透镜组。 第四透镜组具有位于第三透镜组（LG3）和第四透镜组（LG4）之间的边缘光线高度的拐点附近的入射面（E）。 在入射面和系统隔膜（5）之间没有设置具有大量屈光力的负透镜。 本发明的投影物镜的实施例结合大图像场实现非常高的数值孔径NA> 1，并且通过紧凑的设计尺寸来区分。 对于低于200nm的工作波长，当在投影物镜和基底之间使用浸没流体时，可以解决基本上在100nm以下的结构宽度。

    Imaging system with mirror group
    93.
    发明授权
    Imaging system with mirror group 有权
    镜像组成像系统

    公开(公告)号：US07712905B2

    公开(公告)日：2010-05-11

    申请号：US11578098

    申请日：2005-03-22

    申请人： David Shafer ,  Aurelian Dodoc ,  Alexander Epple ,  Hans-Juergen Mann

    发明人： David Shafer ,  Aurelian Dodoc ,  Alexander Epple ,  Hans-Juergen Mann

    IPC分类号： G02B5/08

    CPC分类号： G02B17/0804 ,  G02B17/0808 ,  G02B17/0812 ,  G02B17/0816 ,  G02B17/0836 ,  G02B17/0844 ,  G02B17/0848 ,  G02B17/086 ,  G02B17/0892 ,  G03F7/70058 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341

    摘要： An imaging system for imaging an off-axis object field arranged in an object surface of the imaging system onto an off-axis image field arranged in an image surface of the imaging system while creating at least one intermediate image has: an optical axis; an in-line mirror group having an object side mirror group entry, an image side mirror group exit and a mirror group plane aligned transversely to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit, the mirror group including: a first mirror having a first mirror surface for receiving radiation coming from the object surface in a first reflecting area asymmetric to the optical axis; at least one second mirror having a second mirror surface facing the first mirror surface for receiving radiation coming from the first mirror in a second reflecting area asymmetric to the optical axis; at least one of the first and second mirrors being a concave mirror having a concave mirror surface defining a mirror axis on the optical axis; wherein the mirrors of the mirror group are arranged such that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit. A strong overcorrection of image field curvature can be effected in an axially compact design.

    摘要翻译： 用于将布置在成像系统的物体表面中的离轴对象场成像到设置在成像系统的图像表面中的离轴图像场同时创建至少一个中间图像的成像系统具有：光轴; 具有对象侧反射镜组入口的直列式反射镜组，横向于所述光轴排列的像侧反射镜组出射和反射镜组平面，并且几何地布置在所述反射镜组入口和所述镜子组出口之间，所述镜组包括： 第一反射镜，具有第一反射镜表面，用于在与光轴不对称的第一反射区域中接收来自物体表面的辐射; 至少一个第二反射镜，具有面向第一镜面的第二镜面，用于在不对称于光轴的第二反射区域中接收来自第一反射镜的辐射; 所述第一和第二反射镜中的至少一个是凹面镜，所述凹面镜具有在光轴上限定反射镜轴的凹面镜面; 其中反射镜组的反射镜被布置成使得来自反射镜组入口的辐射通过镜组平面至少四次，并且在离开镜组之前在镜组的凹面镜表面上反射至少两次 镜组退出。 可以在轴向紧凑的设计中实现图像场曲率的强过度校正。

    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    95.
    发明申请
    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    微波投影曝光装置

    公开(公告)号：US20100045952A1

    公开(公告)日：2010-02-25

    申请号：US12611999

    申请日：2009-11-04

    申请人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    发明人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    IPC分类号： G03B27/42 ,  G03B27/54

    摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.

    摘要翻译： 微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12） 能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。 投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。 关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光 敏感层。

    CATADIOPTRIC PROJECTION OBJECTIVE WITH PUPIL CORRECTION
    96.
    发明申请
    CATADIOPTRIC PROJECTION OBJECTIVE WITH PUPIL CORRECTION 审中-公开
    具有校正的目标投影目标

    公开(公告)号：US20100020390A1

    公开(公告)日：2010-01-28

    申请号：US12511515

    申请日：2009-07-29

    申请人： Aurelian Dodoc

    发明人： Aurelian Dodoc

    IPC分类号： G02B17/08

    CPC分类号： G02B17/08 ,  G02B17/00 ,  G02B17/0804 ,  G02B17/0812 ,  G02B17/0816 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341

    摘要： A catadioptric projection objective includes a plurality of optical elements arranged to image an off-axis object field arranged in an object surface onto an off-axis image field arranged in an image surface of the projection objective. The optical elements form: a first, refractive objective part that can generate a first intermediate image from radiation coming from the object surface and including a first pupil surface; a second objective part including at least one concave mirror that can image the first intermediate image into a second intermediate image and including a second pupil surface optically conjugated to the first pupil surface; and a third objective part that can image the second intermediate image onto the image surface and including a third pupil surface optically conjugated to the first and second pupil surface. The optical elements are arranged between the object surface and the first pupil surface form a Fourier lens group which includes a negative lens group arranged optically close to the first pupil surface.

    摘要翻译： 反射折射投射物镜包括多个光学元件，其布置成将布置在物体表面中的离轴物体场成像到布置在投影物镜的图像表面中的离轴图像场。 光学元件形成：第一折射目标部分，其可以从来自物体表面的辐射产生第一中间图像并且包括第一光瞳表面; 第二目标部分，其包括至少一个凹面镜，该凹面镜可将第一中间图像成像为第二中间图像，并且包括与第一光瞳表面光学共轭的第二光瞳表面; 以及第三目标部分，其可以将第二中间图像成像到图像表面上，并且包括与第一和第二光瞳表面光学共轭的第三光瞳表面。 光学元件布置在物体表面和第一光瞳表面之间，形成傅里叶透镜组，其包括光学上靠近第一光瞳表面布置的负透镜组。

    Projection objective
    97.
    发明授权
    Projection objective 有权
    投影目标

    公开(公告)号：US07557996B2

    公开(公告)日：2009-07-07

    申请号：US11412925

    申请日：2006-04-28

    申请人： Aurelian Dodoc

    发明人： Aurelian Dodoc

    IPC分类号： G02B9/00 ,  G02B17/00

    CPC分类号： G02B3/12 ,  G02B13/143 ,  G02B17/0812 ,  G02B17/0844 ,  G02B17/0892 ,  G03F7/70341 ,  G03F7/70958

    摘要： A projection objective for imaging a pattern arranged in an object surface of the projection objective onto an image surface of the projection objective using ultraviolet radiation has a plurality of optical elements including transparent optical elements transparent for radiation at an operating wavelength λ, where 260 nm>λ>150 nm, an image-side pupil surface arranged between the object surface and the image surface, and an aperture-defining lens group arranged between the image-side pupil surface and the image surface for converging radiation coming from the image-side pupil surface towards the image surface to define an image-side numerical aperture NA, where 0.7≦NA≦1.4. The aperture-defining lens group includes at least one high-index lens made from a transparent high-index material having a refractive index nHI, where nHI>nSIO2 and where nSIO2 is the refractive index of silicon dioxide (SiO2) at the operating wavelength.

    摘要翻译： 用于使用紫外线辐射将布置在投影物镜的物体表面中的图案成像到投影物镜的图像表面上的图案的投影物镜具有多个光学元件，包括透明的用于工作波长λ的辐射的透明光学元件，其中260nm> λ= 150nm，布置在物体表面和图像表面之间的图像侧光瞳表面，以及布置在图像侧瞳孔表面和图像表面之间的孔径限定透镜组，用于会聚来自图像侧瞳孔的辐射 表面朝向图像表面以限定图像侧数值孔径NA，其中0.7 <= NA <= 1.4。 孔径限定透镜组包括至少一个由具有折射率nHI的透明高折射率材料制成的至少一个高折射率透镜，其中nHI> nSIO2，其中nSIO2是工作波长处的二氧化硅（SiO 2）的折射率。

    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    98.
    发明申请
    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    微波投影曝光装置

    公开(公告)号：US20080316452A1

    公开(公告)日：2008-12-25

    申请号：US12199998

    申请日：2008-08-28

    申请人： Aurelian Dodoc ,  Karl-Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    发明人： Aurelian Dodoc ,  Karl-Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    IPC分类号： G03G15/08

    摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.

    摘要翻译： 微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12） 能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。 投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。 关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光 敏感层。