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公开(公告)号：US06794459B2
公开(公告)日：2004-09-21
申请号：US10224994
申请日：2002-08-21
申请人： Saikumar Jayaraman , George Martin Benedikt , Larry Funderburk Rhodes , Richard Vicari , Robert David Allen , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Thomas Wallow
发明人： Saikumar Jayaraman , George Martin Benedikt , Larry Funderburk Rhodes , Richard Vicari , Robert David Allen , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Thomas Wallow
IPC分类号： C08F3200
CPC分类号： G03F7/039 , C08G61/02 , C08G61/08 , G03F7/0045 , G03F7/0395 , G03F7/0397
摘要： The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.
摘要翻译： 本发明涉及环状聚合物及其在光刻应用中的应用。 环状聚合物含有侧链酸不稳定官能团和含有被保护的羟基部分的官能团。 通过使侧基羟基部分脱保护并使去保护的含羟基的部分与共反应物反应来对聚合物进行后修饰。 后官能化聚合物可用于化学扩增的光致抗蚀剂组合物中。
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公开(公告)号：US06790579B1
公开(公告)日：2004-09-14
申请号：US09630894
申请日：2000-08-02
IPC分类号： G03F7039
CPC分类号： C08G61/08 , G03F7/0045 , G03F7/038 , G03F7/039 , Y10S430/106
摘要： The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
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93.发明授权Photoresist compositions comprising polycyclic polymers with acid labile pendant groups 有权包含具有酸不稳定侧基的多环聚合物的光致抗蚀剂组合物公开(公告)号：US06723486B2
公开(公告)日：2004-04-20
申请号：US09850915
申请日：2001-05-08
申请人： Brian L. Goodall , Saikumar Jayaraman , Robert A. Shick , Larry F. Rhodes , Robert David Allen , Richard Anthony DiPietro , Thomas Wallow
发明人： Brian L. Goodall , Saikumar Jayaraman , Robert A. Shick , Larry F. Rhodes , Robert David Allen , Richard Anthony DiPietro , Thomas Wallow
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , C08G61/08 , G03F7/038 , G03F7/039 , Y10S430/109 , Y10S430/111 , Y10S430/115
摘要： The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
摘要翻译： 本发明涉及包含光酸引发剂和包含含有酸不稳定基团的重复单元的多环聚合物的辐射敏感性光致抗蚀剂组合物。 在暴露于成像辐射源时，光酸引发剂产生酸，该酸切割引起聚合物极性变化的侧链酸不稳定基团。 聚合物在暴露于成像源的区域中变得可溶于碱性水溶液。
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94.发明授权公开(公告)号：US06649714B2
公开(公告)日：2003-11-18
申请号：US10375231
申请日：2003-02-27
IPC分类号： C08F480
CPC分类号： C08G61/122 , C08G61/06 , C08G61/08
摘要： A process for polymerizing polycycloolefins containing pendant anhydride moieties is disclosed. The process utilizes a single component nickel containing catalyst of the formula EnNi(C6F5)2 wherein n is 1 or 2 and E represents a neutral electron donor ligand.
摘要翻译： 公开了一种聚合含有侧链酸酐部分的聚环烯烃的方法。 该方法使用式为EnNi（C6F5）2的单组分含镍催化剂，其中n为1或2，E为中性电子给体配体。
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公开(公告)号：US6136499A
公开(公告)日：2000-10-24
申请号：US812418
申请日：1997-03-06
IPC分类号： H01L21/027 , C08F4/80 , C08F32/00 , C08F32/08 , C08G61/08 , C08L45/00 , C08L65/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03C1/73
CPC分类号： C08G61/08 , G03F7/0045 , G03F7/039 , G03F7/038 , Y10S430/106
摘要： The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
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96.发明授权
公开(公告)号：US6121340A
公开(公告)日：2000-09-19
申请号：US964080
申请日：1997-11-04
CPC分类号： G03F7/0388 , C08G61/08 , G03F7/039 , G03F7/0758 , G03F7/0045
摘要： The present invention relates to a photodefinable dielectric composition comprising a photoinitiator and a polycyclic addition polymer comprising polycyclic repeating units that contain pendant silyl functionalities containing hydrolyzable substituents. Upon exposure to a radiation source the photoinitiator catalyzes the hydrolysis of the hydrolyzable groups to effect the cure of the polymer and adhesion of the polymer to desired substrates.
摘要翻译： 本发明涉及包含光引发剂和包含多环重复单元的多环加成聚合物的光可定义电介质组合物，所述多环重复单元含有含有可水解取代基的侧链甲硅烷基官能团。 在暴露于辐射源时，光引发剂催化可水解基团的水解以实现聚合物的固化和聚合物粘合到所需的基材上。
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97.发明授权
公开(公告)号：US6031058A
公开(公告)日：2000-02-29
申请号：US263930
申请日：1999-03-08
CPC分类号： C08F32/08
摘要： Silyl substituted polymers of polycycloolefins are provided as well as catalyst systems for their preparation. The polymers of the invention include polycyclic repeat units that contain pendant silyl functional groups represented by the following formulae: ##STR1## wherein A is a divalent radical selected from the following structures: ##STR2## R.sup.9 independently represents hydrogen, methyl, or ethyl; R.sup.10, R.sup.11, and R.sup.12 independently represent halogen, linear or branched (C.sub.1 to C.sub.20) alkyl, linear or branched (C.sub.1 to C.sub.20) alkoxy, linear or branched (C.sub.1 to C.sub.20) alkyl carbonyloxy, (C.sub.1 to C.sub.20) alkyl peroxy, and substituted or unsubstituted (C.sub.6 to C.sub.20) aryloxy; R.sup.10, R.sup.11, and R.sup.12 together with the silicon atom to which they are attached form the group: ##STR3## n is a number from 0 to 5; and n' is 0 or 1; and n" is a number from 0 to 10.
摘要翻译： 提供聚环烯烃的甲硅烷基取代聚合物以及用于其制备的催化剂体系。 本发明的聚合物包括含有由下式表示的侧链甲硅烷基官能团的多环重复单元：其中A是选自以下结构的二价基团：R9独立地表示氢，甲基或乙基; R10，R11和R12独立地表示直链或支链（C1至C20）烷基，直链或支链（C1至C20）烷氧基，直链或支链（C1至C20）烷基羰基氧基，（C1至C20）烷基过氧基），和 取代或未取代的（C6〜C20）芳氧基; R 10，R 11和R 12与它们所连接的硅原子一起形成基团：n为0至5的数; 并且n'为0或1; n“是从0到10的数字。
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公开(公告)号：US5912313A
公开(公告)日：1999-06-15
申请号：US562345
申请日：1995-11-22
IPC分类号： C08F4/605 , C08F4/606 , C08F32/08 , C08F232/08 , C08F230/08
CPC分类号： C08F32/08
摘要： Silyl substituted polymers of polycycloolefins are provided as well as catalyst systems for their preparation. The polymers of the invention include polycyclic repeat units that contain pendant silyl functional groups represented by the following formulae: ##STR1## wherein A is a divalent radical selected from the following structures: ##STR2## R.sup.9 independently represents hydrogen, methyl, or ethyl; R.sup.10, R.sup.11, and R.sup.12 independently represent halogen, linear or branched (C.sub.1 to C.sub.20) alkyl, linear or branched (C.sub.1 to C.sub.20) alkoxy, linear or branched (C.sub.1 to C.sub.20) alkyl carbonyloxy, (C.sub.1 to C.sub.20) alkyl peroxy, and substituted or unsubstituted (C.sub.6 to C.sub.20) aryloxy; R.sup.10, R.sup.11, and R.sup.12 together with the silicon atom to which they are attached form the group: ##STR3## n is a number from 0 to 5; and n' is 0 or 1; and n" is a number from 0 to 10.
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