公开(公告)号：US06377233B2

公开(公告)日：2002-04-23

申请号：US09918249

申请日：2001-07-30

申请人： Evan G. Colgan ,  Laura L. Kosbar ,  Alan E. Rosenbluth

发明人： Evan G. Colgan ,  Laura L. Kosbar ,  Alan E. Rosenbluth

IPC分类号： G09G334

CPC分类号： G09G3/3433 ,  G02B26/0841 ,  G09G3/346 ,  G09G2300/0473 ,  G09G2300/08 ,  Y10S359/90

摘要： A display device, in accordance with the present invention includes a transparent substrate and an array of pixels formed on the substrate, each pixel comprises a transparent electrode and a deformable member electrically actuated between a first state and a second state, wherein in the first state a liquid including a dye is disposed in a gap between the transparent electrode and the deformable member and wherein in the second state the deformable member reduces the gap between the transparent electrode and the deformable member such that the liquid is substantially removed between the deformable layer and the transparent electrode in the area of contact. A plurality of switches are formed on the substrate for supplying control signals to the array of pixels to selectively actuate the deformable members of the pixels, wherein each switch comprises an actuating member movable between an active state and an inactive state, whereby in the active state any control signal supplied to the switch passes through the switch, and in the inactive state any control signal supplied to the switch is prevented from passing through the switch. Fabrication methods are also disclosed.

摘要翻译： 根据本发明的显示装置包括透明基板和形成在基板上的像素阵列，每个像素包括在第一状态和第二状态之间电致动的透明电极和可变形部件，其中在第一状态 包括染料的液体设置在透明电极和可变形部件之间的间隙中，并且其中在第二状态下，可变形部件减小了透明电极和可变形部件之间的间隙，使得液体在可变形层和 透明电极在接触区域。 多个开关形成在基板上，用于向像素阵列提供控制信号以选择性地致动像素的可变形构件，其中每个开关包括可在活动状态和非活动状态之间移动的致动构件，由此在活动状态 提供给开关的任何控制信号通过开关，并且在非活动状态下，防止提供给开关的任何控制信号通过开关。 还公开了制造方法。

公开(公告)号：US5298351A

公开(公告)日：1994-03-29

申请号：US996877

申请日：1992-12-28

申请人： Norman Bobroff ,  Alan E. Rosenbluth

发明人： Norman Bobroff ,  Alan E. Rosenbluth

IPC分类号： G03F1/00 ,  G03F1/38 ,  G03F1/58 ,  H01L21/027 ,  H01L21/30 ,  H01L21/302 ,  G03F9/00

CPC分类号： G03F1/58 ,  G03F1/38 ,  Y10S430/146

摘要： An ablation mask that includes a transparent substrate having a patterned layer located between two dielectric transparent material coatings thereon is provided. Also, the ablation mask is useful in dry etching processes to provide patterned layers, and other laser processing applications that require high fluence such as photodeposition, thin film transfer and thin film release.

摘要翻译： 提供一种消融掩模，其包括具有位于其上的两个介电透明材料涂层之间的图案化层的透明基板。 此外，消融掩模在干蚀刻工艺中可用于提供图案化层，以及需要高注量的其他激光加工应用，例如光沉积，薄膜转移和薄膜释放。

公开(公告)号：US5274420A

公开(公告)日：1993-12-28

申请号：US871254

申请日：1992-04-20

申请人： Jean-Claude A. Chastang ,  Alan E. Rosenbluth

发明人： Jean-Claude A. Chastang ,  Alan E. Rosenbluth

IPC分类号： G02B3/00 ,  G02B17/08 ,  G02B27/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03B27/54 ,  G03B27/42

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G02B27/0018 ,  G02B3/005 ,  G03F7/70058 ,  G03F7/70225

摘要： An object of the present invention is to provide an optical system for lithography wherein the zero order component of the main lithographic image is unobstructed and the zero order component in the ghost image is removed. The optical system includes a beamsplitter component and a condensor lens structure for illuminating a lithographic mask from a range of directions which excludes a range of directions that are sufficiently close to the axis to add undesired background to the exposure field after multiple reflections with the lens. The optical system further includes an excimer laser and a lens system having an array of stops for intercepting multiple images of the excimer laser after they reflect from the primary wafer image or other surfaces such as the mask or lens surfaces.The illuminating zero-order beams reflect obliquely off the wafer after contributing to the image, where they are then refocussed to the opposite side of the pupil (the primary mirror). The beam then exits the lens towards the ghost image in an oblique fashion, and it will miss the wafer expose field entirely if the angles involved are sufficiently large. This redirection of the zero-orders is accomplished in the system with a molded fused silica fly's-eye-lens. A still further element of the system for stray light control is the use of a small stop in the pupil which blocks each zero-order beam after reflection from the wafer.

摘要翻译： 本发明的目的是提供一种用于光刻的光学系统，其中主平面图像的零级分量不受阻碍，并且去除重影图像中的零级分量。 光学系统包括分束器部件和聚光透镜结构，用于从不同于足够靠近轴线的方向范围的方向的一系列方向照射光刻掩模，以在与透镜多次反射之后为曝光场增加不期望的背景。 光学系统还包括准分子激光器和透镜系统，该透镜系统具有用于在准分子激光器从主晶片图像或诸如掩模或透镜表面的其它表面反射之后拦截准分子激光器的多个图像的阵列。 在对图像作出贡献之后，照明的零级光束在晶片上倾斜地反射，然后将它们重新聚焦到瞳孔（主镜）的相对侧。 然后光束以倾斜的方式离开透镜朝向幻像，并且如果所涉及的角度足够大，则其将完全错过晶片曝光场。 零级的这种重定向在具有模制熔融石英飞行眼镜的系统中完成。 用于杂散光控制的系统的另一个元件是在从晶片反射之后阻挡每个零级光束的光瞳中使用小的停止。

公开(公告)号：US4902899A

公开(公告)日：1990-02-20

申请号：US56161

申请日：1987-06-01

申请人： Burn J. Lin ,  Anne M. Moruzzi ,  Alan E. Rosenbluth

发明人： Burn J. Lin ,  Anne M. Moruzzi ,  Alan E. Rosenbluth

IPC分类号： G03F1/00 ,  G03F7/20 ,  H01L21/027

CPC分类号： G03F7/70058 ,  G03F1/50 ,  G03F7/2002 ,  G03F7/70283 ,  G03F7/70433

摘要： A lithographic process having improved image quality by employing a mask that includes a plurality of opaque elements or transparent elements that are smaller than the resolution of the lighography to be employed in order to control the transmittance of the actinic light exposure area.