公开(公告)号：US20070179309A1

公开(公告)日：2007-08-02

申请号：US11699390

申请日：2007-01-30

申请人： Koji Hasegawa ,  Takeshi Kinsho ,  Tsunehiro Nishi ,  Masaki Ohashi ,  Takeru Watanabe

发明人： Koji Hasegawa ,  Takeshi Kinsho ,  Tsunehiro Nishi ,  Masaki Ohashi ,  Takeru Watanabe

IPC分类号： C07C69/63 ,  C07C31/34

CPC分类号： G03F7/0395 ,  C07C29/147 ,  C07C69/54 ,  C07C69/653 ,  C07C69/753 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2602/42 ,  C08F220/24 ,  C08F220/28 ,  C08F232/08 ,  G03F7/0046 ,  G03F7/0397 ,  C07C31/44 ,  C07C31/42 ,  C07C35/48

摘要： Fluoroalcohol compounds of formula (4) are prepared by reacting a fluorine compound of formula (1) with reducing agents or organometallic reagents of formulas (2) and (3) wherein R1 is H or a monovalent C1-C20 hydrocarbon group in which any —CH2— moiety may be replaced by —O— or —C(═O)—, R2 is H or a monovalent C1-C6 hydrocarbon group, R3 and R4 are H or a monovalent C1-C8 hydrocarbon group, and M1 is Li, Na, K, Mg, Zn, Al, B, or Si. From the fluoroalcohol compounds, fluorinated monomers can be produced in a simple and economic way, which are useful in producing polymers for the formulation of radiation-sensitive resist compositions.

摘要翻译： 通式（1）的氟化合物与式（2）和（3）的还原剂或式（2）和（3）的有机金属试剂反应制备式（4）的氟化醇，其中R 1是H或单价C 其中任何-CH 2 - 部分可被-O-或-C（ - ） - 取代的 - ， - R 2是H或一价C 1 -C 6烃基，R 3和R 4 > 4是H或一价C 1 -C 8烃基，M 1是Li，Na，K， Mg，Zn，Al，B或Si。 从氟代醇化合物可以以简单且经济的方式制备氟化单体，其可用于制备用于制备辐射敏感抗蚀剂组合物的聚合物。

公开(公告)号：US06509481B2

公开(公告)日：2003-01-21

申请号：US10117218

申请日：2002-04-08

申请人： Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe

发明人： Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe

IPC分类号： C07D31500

CPC分类号： C07D307/12 ,  C07D307/06

摘要： Tetrahydrofuran compounds of formula (1) wherein the broken line represents a single bond, a divalent organic group, or a structure in which the alicyclic structure in the form of norbornene or tetracyclo[4.4.0.12,5.17,10]dodecene and the tetrahydrofuran cyclic structure share one or two constituent carbon atoms, and k is 0 or 1 are novel and useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography

摘要翻译： 式（1）的四氢呋喃化合物，其中虚线表示单键，二价有机基团或其中降冰片烯或四环[4.4.0.12,5.17,10]十二碳烯形式的脂环结构和四氢呋喃环状 结构共享一个或两个组成碳原子，并且k为0或1是新颖的并且可用作形成用于化学增强抗蚀剂组合物中的基础树脂的单体，其适用于微图案光刻

公开(公告)号：US06469220B2

公开(公告)日：2002-10-22

申请号：US10025064

申请日：2001-12-19

申请人： Koji Hasegawa ,  Takeshi Kinsho ,  Takeru Watanabe

发明人： Koji Hasegawa ,  Takeshi Kinsho ,  Takeru Watanabe

IPC分类号： C07C3522

CPC分类号： C07C33/14 ,  C07C35/21 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2603/90 ,  G03F7/0395 ,  G03F7/0397

摘要： The present invention provides novel tertiary alcohol compounds which are useful as monomers for the preparation of photoresist materials having high transparency and a great affinity for the substrate and hence suitable for use in photolithography using a light source comprising preferably light having a wavelength of 300 nm or less and more preferably light emitted from an ArF excimer laser. Specifically, the present invention provides tertiary alcohols compounds represented by the following general formula (1): wherein R1 and R2 each independently represent a straigh-chain, branched or cyclic alkyl group having 1 to 10 carbon atoms, in which some or all of the hydrogen atoms on the constituent carbon atoms may be replaced by a halogen atom or halogen atoms, or R1 and R2 may be joined together to form an aliphatic hydrocarbon ring; Z represents a straight-chain, branched or cyclic divalent organic group having 2 to 10 carbon atoms; and k is 0 or 1.

摘要翻译： 本发明提供新颖的叔醇化合物，其可用作制备具有高透明度和对基材的极好亲和力的光致抗蚀剂材料的单体，因此适用于使用光源的光刻法，该光源优选包含波长为300nm的光或 更优选由ArF准分子激光器发出的光。特别地，本发明提供由以下通式（1）表示的叔醇化合物：其中R 1和R 2各自独立地表示具有1个 10个碳原子，其中构成碳原子上的一些或全部氢原子可以被卤素原子或卤素原子取代，或者R1和R2可以连接在一起形成脂族烃环; Z表示具有2〜10个碳原子的直链，支链或环状二价有机基团; k为0或1。

公开(公告)号：US20070275326A1

公开(公告)日：2007-11-29

申请号：US11798471

申请日：2007-05-14

申请人： Jun Hatakeyama ,  Yuji Harada ,  Takeru Watanabe

发明人： Jun Hatakeyama ,  Yuji Harada ,  Takeru Watanabe

IPC分类号： G03C1/00

CPC分类号： G03F7/11 ,  G03F7/0046 ,  G03F7/2041

摘要： There is disclosed a resist protective film composition for forming a protective film on a photoresist film, comprising: at least a polymer including a repeating unit having one or more groups selected from a carboxyl group and α-trifluoromethyl alcohol groups; and an amine compound. There can be provided a resist protective film composition that makes it possible to provide more certainly rectangular and excellent patterns when a protective film is formed on a photoresist film.

摘要翻译： 公开了一种用于在光致抗蚀剂膜上形成保护膜的抗蚀保护膜组合物，其包括：至少包含具有一个或多个选自羧基和α-三氟甲醇基团的基团的重复单元的聚合物; 和胺化合物。 可以提供一种抗蚀剂保护膜组合物，当在光致抗蚀剂膜上形成保护膜时，可以提供更确定的矩形和优异的图案。

公开(公告)号：US20120249995A1

公开(公告)日：2012-10-04

申请号：US13494746

申请日：2012-06-12

申请人： Jun Hatakeyama ,  Yuji Harada ,  Takeru Watanabe

发明人： Jun Hatakeyama ,  Yuji Harada ,  Takeru Watanabe

IPC分类号： G03B27/32

CPC分类号： G03F7/11 ,  G03F7/0046 ,  G03F7/2041

摘要： The invention is a protective film material for immersion lithography that enables desirable immersion lithography, can be removed simultaneously with development of a photoresist layer, and has excellent process adaptability. The invention also includes a method for forming a pattern using the material. More specifically, the invention is a protective film material comprising (i) a blend of a polymer comprising a repeating unit having a fluorine-containing alkyl or alkylene group which contains at least one fluorine atom and an optional alkali soluble repeating unit and a polymer comprising a repeating unit having a fluorine-free alkyl group and an optional alkali soluble repeating unit, or (ii) a polymer comprising a repeating unit having a fluorine-containing alkyl or alkylene group which contains at least one fluorine atom and a repeating unit having a fluorine-free alkyl group and an optional alkali-soluble repeating unit.

摘要翻译： 本发明是用于浸没式光刻的保护膜材料，其能够进行希望的浸渍光刻，可以与光致抗蚀剂层的显影同时除去，并且具有优异的工艺适应性。 本发明还包括使用该材料形成图案的方法。 更具体地说，本发明是一种保护膜材料，其包含（i）包含具有含有至少一个氟原子的含氟烷基或亚烷基的重复单元和任选的碱可溶重复单元的聚合物的共混物和包含 具有无氟烷基和任选的碱可溶重复单元的重复单元，或（ii）含有含有至少一个氟原子的含氟烷基或亚烷基的重复单元的聚合物和具有至少一个氟原子的重复单元 无氟烷基和任选的碱溶性重复单元。

公开(公告)号：US08323872B2

公开(公告)日：2012-12-04

申请号：US11451498

申请日：2006-06-13

申请人： Jun Hatakeyama ,  Takeru Watanabe ,  Yuji Harada

发明人： Jun Hatakeyama ,  Takeru Watanabe ,  Yuji Harada

IPC分类号： G03C1/00 ,  G03C5/00 ,  G03F7/00

CPC分类号： G03F7/11 ,  G03F7/0046 ,  G03F7/2041

摘要： A resist protective coating material is provided comprising a polymer having a partial structure of formula (1) wherein R0 is H, F, alkyl or alkylene, and R1 is fluorinated alkyl or alkylene. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography. During alkali development, development of the resist film and removal of the protective coating can be simultaneously achieved.

摘要翻译： 提供抗蚀剂保护涂层材料，其包含具有式（1）的部分结构的聚合物，其中R 0是H，F，烷基或亚烷基，R 1是氟化烷基或亚烷基。 在图案形成过程中，材料在抗蚀剂膜上形成保护性涂层，其是不溶于水的，可溶于碱性显影剂中并且与抗蚀剂膜不混溶，从而有​​效地实施浸渍光刻。 在碱显影过程中，可以同时实现抗蚀剂膜的开发和保护涂层的去除。

公开(公告)号：US20070122736A1

公开(公告)日：2007-05-31

申请号：US11550204

申请日：2006-10-17

申请人： Jun Hatakeyama ,  Yuji Harada ,  Takeru Watanabe

发明人： Jun Hatakeyama ,  Yuji Harada ,  Takeru Watanabe

IPC分类号： G03C1/00

CPC分类号： G03F7/11 ,  G03F7/0046 ,  G03F7/2041

摘要： The invention is a protective film material for immersion lithography that enables desirable immersion lithography, can be removed simultaneously with development of a photoresist layer, and has excellent process adaptability. The invention also includes a method for forming a pattern using the material. More specifically, the invention is a protective film material comprising (i) a blend of a polymer comprising a repeating unit having a fluorine-containing alkyl or alkylene group which contains at least one fluorine atom and an optional alkali soluble repeating unit and a polymer comprising a repeating unit having a fluorine-free alkyl group and an optional alkali soluble repeating unit, or (ii) a polymer comprising a repeating unit having a fluorine-containing alkyl or alkylene group which contains at least one fluorine atom and a repeating unit having a fluorine-free alkyl group and an optional alkali-soluble repeating unit.

摘要翻译： 本发明是用于浸没式光刻的保护膜材料，其能够进行希望的浸渍光刻，可以与光致抗蚀剂层的显影同时除去，并且具有优异的工艺适应性。 本发明还包括使用该材料形成图案的方法。 更具体地说，本发明是一种保护膜材料，其包含（i）包含具有含有至少一个氟原子的含氟烷基或亚烷基的重复单元和任选的碱可溶重复单元的聚合物的共混物和包含 具有无氟烷基和任选的碱可溶重复单元的重复单元，或（ii）含有含有至少一个氟原子的含氟烷基或亚烷基的重复单元的聚合物和具有至少一个氟原子的重复单元 无氟烷基和任选的碱溶性重复单元。

公开(公告)号：US20070003867A1

公开(公告)日：2007-01-04

申请号：US11451498

申请日：2006-06-13

申请人： Jun Hatakeyama ,  Takeru Watanabe ,  Yuji Harada

发明人： Jun Hatakeyama ,  Takeru Watanabe ,  Yuji Harada

IPC分类号： G03C1/00

CPC分类号： G03F7/11 ,  G03F7/0046 ,  G03F7/2041

摘要： A resist protective coating material is provided comprising a polymer having a partial structure of formula (1) wherein R0 is H, F, alkyl or alkylene, and R1 is fluorinated alkyl or alkylene. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography. During alkali development, development of the resist film and removal of the protective coating can be simultaneously achieved.

摘要翻译： 提供抗蚀剂保护涂层材料，其包含具有式（1）的部分结构的聚合物，其中R 0是H，F，烷基或亚烷基，R 1是氟化的 烷基或亚烷基。 在图案形成过程中，材料在抗蚀剂膜上形成保护性涂层，其是不溶于水的，可溶于碱性显影剂中并且与抗蚀剂膜不混溶，从而有​​效地实施浸渍光刻。 在碱显影过程中，可以同时实现抗蚀剂膜的开发和保护涂层的去除。

公开(公告)号：US07759047B2

公开(公告)日：2010-07-20

申请号：US11798471

申请日：2007-05-14

申请人： Jun Hatakeyama ,  Yuji Harada ,  Takeru Watanabe

发明人： Jun Hatakeyama ,  Yuji Harada ,  Takeru Watanabe

IPC分类号： G03F7/00 ,  G03F7/004 ,  C08F14/18 ,  C08F20/00

CPC分类号： G03F7/11 ,  G03F7/0046 ,  G03F7/2041

摘要： There is disclosed a resist protective film composition for forming a protective film on a photoresist film, comprising: at least a polymer including a repeating unit having one or more groups selected from a carboxyl group and α-trifluoromethyl alcohol groups; and an amine compound. There can be provided a resist protective film composition that makes it possible to provide more certainly rectangular and excellent patterns when a protective film is formed on a photoresist film.

摘要翻译： 公开了一种用于在光致抗蚀剂膜上形成保护膜的抗蚀保护膜组合物，其包括：至少包含具有一个或多个选自羧基和α-三氟甲醇基团的基团的重复单元的聚合物; 和胺化合物。 可以提供一种抗蚀剂保护膜组合物，当在光致抗蚀剂膜上形成保护膜时，可以提供更确定的矩形和优异的图案。

公开(公告)号：US06743564B2

公开(公告)日：2004-06-01

申请号：US10003288

申请日：2001-12-06

申请人： Jun Hatakeyama ,  Tomohiro Kobayashi ,  Takeru Watanabe

发明人： Jun Hatakeyama ,  Tomohiro Kobayashi ,  Takeru Watanabe

IPC分类号： G03C173

CPC分类号： C07D295/15 ,  C07C255/14 ,  C07C255/24 ,  C07D307/14 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/115

摘要： Amine compounds having a cyano group are useful in resist compositions for preventing a resist film from thinning and also for enhancing the resolution and focus margin of resist.

摘要翻译： 具有氰基的胺化合物可用于防止抗蚀剂膜变薄的抗蚀剂组合物中，并且还用于提高抗蚀剂的分辨率和聚焦余量。