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    Tertiary amine compounds having an ester structure and processes for preparing same
    2.
    发明授权
    Tertiary amine compounds having an ester structure and processes for preparing same 有权
    具有酯结构的叔胺化合物及其制备方法

    公开(公告)号：US07084303B2

    公开(公告)日：2006-08-01

    申请号：US10127120

    申请日：2002-04-22

    申请人： Takeru Watanabe ,  Koji Hasegawa ,  Takeshi Kinsho ,  Jun Hatakeyama

    发明人： Takeru Watanabe ,  Koji Hasegawa ,  Takeshi Kinsho ,  Jun Hatakeyama

    IPC分类号： C07C211/00

    CPC分类号： C07D307/33 ,  C07C229/12 ,  C07C229/16 ,  C07C2601/14 ,  C07D307/12 ,  C07D309/12 ,  C07D317/24 ,  G03F7/0045 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/0397

    摘要： The present invention provides ester group-containing tertiary amine compounds of the formula (R1OCH2CH2)nN(CH2CH2CO2R2)3-n which, when used as additives in chemical amplification photolithography, can yield photoresists having a high resolution and an excellent focus margin. The present invention also provides a process comprising the step of subjecting a primary or secondary amine compound to Michael addition to an acrylic ester compound; a process comprising the steps of subjecting monoethanolamine or diethanolamine to Michael addition to an acrylic ester compound so as to form an ester group-containing amine compound and introducing a R1 group to the resultant ester group-containing amine compound; and a process comprising the step of effecting the ester exchange reaction of an ester group-containing tertiary amine with R2OH.

    摘要翻译： 本发明提供了式（R 1）2 OCH 2 CH 2 N酯的含酯基的叔胺化合物 > N（CH 2 CH 2）2 CO 2 N 2 - （CH 2）3 - n - 当用作化学放大光刻中的添加剂时，可以产生具有高分辨率和优异聚焦余量的光致抗蚀剂。 本发明还提供了一种方法，其包括使伯胺或仲胺化合物与丙烯酸酯化合物进行迈克尔加成步骤; 一种方法包括以下步骤：将一乙醇胺或二乙醇胺加入到丙烯酸酯化合物中以形成含酯基的胺化合物并将R 1 O 2基团引入所得的含酯基胺 复合; 以及包括使含酯基的叔胺与R 2 OH进行酯交换反应的步骤的方法。

    Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods
    4.
    发明申请
    Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods 审中-公开
    具有脂环结构的新型环氧化合物，高分子化合物，抗蚀剂材料和图案化方法

    公开(公告)号：US20050142491A1

    公开(公告)日：2005-06-30

    申请号：US11057008

    申请日：2005-02-11

    申请人： Koji Hasegawa ,  Takeshi Kinsho ,  Takeru Watanabe

    发明人： Koji Hasegawa ,  Takeshi Kinsho ,  Takeru Watanabe

    IPC分类号： C08F34/00 ,  C08G61/12 ,  G03F7/039 ,  G03C1/76

    CPC分类号： G03F7/0397 ,  G03F7/0395

    摘要： Provided is a novel epoxy compound useful, in photolithography, as a monomer for preparing a photoresist material excellent in transparency and affinity to a substrate. More specifically, provided are an epoxy compound represented by the following formula (1): wherein, R1 and R2 each independently represents a hydrogen atom or a linear, branched or cyclic C1-10 alkyl group in which hydrogen atoms on one or more constituent carbon atoms thereof may be partially or entirely substituted by one or more halogen atoms, or the constituent —CH2— may be substituted by an oxygen atom, or R1 and R2 may be coupled together to form an aliphatic hydrocarbon ring; R3 represents a linear, branched or cyclic C1-10 alkyl group or a C1-15 acyl or alkoxycarbonyl group in which hydrogen atoms on one or more constituent carbon atoms thereof may be partially or entirely substituted by one or more halogen atoms; X represents CH2, oxygen or sulfur; k stands for 0 or 1; and m stands for an integer of 0 to 5; and a polymer compound having recurring units available therefrom.

    摘要翻译： 提供了一种新颖的环氧化合物，在光刻中可用作制备对基材透明性和亲和性优异的光致抗蚀剂材料的单体。 更具体地，提供由下式（1）表示的环氧化合物：其中R 1和R 2各自独立地表示氢原子或直链，支链或 其中一个或多个构成碳原子上的氢原子可以被一个或多个卤素原子部分或全部取代的环状C 1-10烷基，或者构成-CH 2 可以被氧原子取代，或者R 1和R 2可以连接在一起形成脂族烃环; R 3表示直链，支链或环状C 1-10烷基或C 1-15酰基或烷氧基羰基，其中氢原子 其一个或多个构成碳原子可以部分或全部被一个或多个卤素原子取代; X表示CH 2，氧或硫; k代表0或1; m表示0〜5的整数。 和具有可从其获得的重复单元的高分子化合物。

    Tertiary alcohol compounds having alicyclic structure
    5.
    发明授权
    Tertiary alcohol compounds having alicyclic structure 有权
    具有脂环结构的叔醇化合物

    公开(公告)号：US06774258B2

    公开(公告)日：2004-08-10

    申请号：US10012419

    申请日：2001-12-12

    申请人： Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho

    发明人： Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho

    IPC分类号： C07C6974

    CPC分类号： C07C69/753 ,  C07C69/608 ,  C07C2602/42 ,  C07C2603/86

    摘要： Tertiary alcohol compounds of formula (1) are novel wherein R1 and R2 are C1-10 alkyl groups which may have halogen substituents, or R1 and R2 may form an aliphatic hydrocarbon ring, Y and Z are a single bond or a divalent C1-10 organic group, and k=0 or 1. Using the tertiary alcohol compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, etching resistance and substrate adhesion.

    摘要翻译： 式（1）的叔醇化合物是新的，其中R 1和R 2是可具有卤素取代基的C 1-10烷基，或R 1和R 2可以形成脂族烃环，Y Z为单键或二价C 1-10有机基团，k = 0或1.使用叔醇化合物作为单体，得到聚合物。 包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率，耐蚀刻性和基材粘合性。

    Polymer, resist composition and patterning process
    8.
    发明授权
    Polymer, resist composition and patterning process 失效
    聚合物，抗蚀剂组合物和图案化工艺

    公开(公告)号：US06509135B2

    公开(公告)日：2003-01-21

    申请号：US09797880

    申请日：2001-03-05

    申请人： Tsunehiro Nishi ,  Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho ,  Jun Hatakeyama

    发明人： Tsunehiro Nishi ,  Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho ,  Jun Hatakeyama

    IPC分类号： G03F7004

    CPC分类号： C08F32/08 ,  G03F7/0045 ,  G03F7/039

    摘要： A polymer comprising recurring units of formula (1) and having a Mw of 1,000-500,000 is provided. R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is alkyl, R4 is H, alkyl, alkoxyalkyl or acyl, R5 and R15 are acid labile groups, and at least one of R6 to R9 is a carboxyl or hydroxyl-containing monovalent hydrocarbon group, and the remainders are H or alkyl, at least one of R10 to R13 is a monovalent hydrocarbon group containing a —CO2— partial structure, and the remainders are H or alkyl, R14 is a polycyclic hydrocarbon group or polycyclic hydrocarbon-containing alkyl group, Z is a trivalent hydrocarbon group, X is —CH2— or —O—, k=0 or 1, x is>0, a, b, c and d are≧0, satisfying x+a+b+c+d=1. A resist composition comprising the polymer has significantly improved sensitivity, resolution and etching resistance and is very useful in microfabrication.

    摘要翻译： 提供了包含式（1）的重复单元并且具有1,000-500,000的Mw的聚合物.R1是H，甲基或CH2CO2R3，R2是H，甲基或CO2R3，R3是烷基，R4是H，烷基，烷氧基烷基或酰基 ，R 5和R 15是酸不稳定基团，R6至R9中的至少一个是含羧基或含羟基的一价烃基，剩余物为H或烷基，R 10至R 13中的至少一个为含有 -CO 2部分结构，其余为H或烷基，R 14为多环烃基或含多环烃基的烷基，Z为三价烃基，X为-CH 2 - 或-O-，k = 0或1 ，x为> 0，a，b，c和d为> = 0，满足x + a + b + c + d = 1。 包含聚合物的抗蚀剂组合物具有显着提高的灵敏度，分辨率和耐蚀刻性，并且在微细加工中非常有用。