摘要:
The invention comprises a PECVD method for the deposition of refractory metal layers or layers containing refractory metal by the in situ formation of refractory metal fluorides. For this purpose, an etch gas, such as CF.sub.4, NF.sub.3, SF.sub.6 etc., is introduced into a plasma deposition chamber which comprises a cathode, with a refractory metal sheet electrically connected thereto, and an anode carrying wafers.In a preferred example, CF.sub.6 is introduced into the chamber and, via a gas shower, into a cathode region. After ignition of a plasma, the ionized etch gas acts on a tungsten sheet, generating WF.sub.x ions that diffuse towards a target with wafers. The WF.sub.x ions thus produced are suitable for the deposition of a tungsten layer or a layer containing tungsten on silicon wafers.
摘要:
The contact probe arrangement includes a stack of perforated plates (1, 1a) through which extend a plurality contact probes. The stack of perforated plates consists of two kinds of plates. The first kind forms the lowermost plates (1a). They have circular or square holes permitting a vertical placing of the contact probes onto the contact pads (4) of the device (5) to be tested. The plates (1) of the second kind have oblong, rectangular, square, circular, elliptical or trapezoidal holes (3). With respect to the stacked plates of the second kind, alternate ones are offset against the two other adjacent plates which are aligned relative to each other, in such a manner that each contact probe is surrounded by part of the lower edge of the upper of two adjacent perforated plates, and part of the upper edge of the lower of two adjacent perforated plates. If axial stress is applied, the contact probe can thus not buckle any farther than to a part of the perforation wall limiting its maximum buckling. This ensures a sufficiently low contact resistance between the contact probe and the contact pad of the device to be tested. By using a corresponding number of perforated plates of the second kind the contact probes can adapt to height differences of the contact pads caused by irregularities in the surface of the device to be tested.
摘要:
The invention relates to a composite magnetic disk for magnetic recording, which consists of an annular core of polymeric material to which is bonded at least one disk of reaction-bonded silicon carbide with a magnetic recording layer on its outer surface. After its processing, the SiSiC disk surface shows optimum planarity and smoothness so that it can be used as a magnetic disk substrate. Furthermore, the material has a low density and an extremely high specific modulus of elasticity so that numbers of revolution higher than obtainable with formerly known AlMg5 disk substrates can be reached.