Meta illuminator
    102.
    发明授权

    公开(公告)号:US11353626B2

    公开(公告)日:2022-06-07

    申请号:US16199759

    申请日:2018-11-26

    Abstract: Provided are meta illuminators. The meta illuminators according to embodiments include a first light emitter configured to emit pattern light, and a second light emitter configured to emit non-patterned light, wherein the first and second light emitters forms a single body. The first and second light emitters respectively include meta-surfaces that are different from each other, and the different meta-surfaces may be formed on a single material layer. The first light emitter includes a pattern region that transmits a portion of incident light, and the second light emitter does not include the pattern region. A mask may be arranged between the light source and the transparent substrate.

    Structured light projector and electronic apparatus including the same

    公开(公告)号:US10982954B2

    公开(公告)日:2021-04-20

    申请号:US16243742

    申请日:2019-01-09

    Abstract: A structured light projectors includes an illuminator configured to emit illumination light, a pattern mask configured to project structured light by partially transmitting the illumination light, and a lens configured to project the structured light, wherein the pattern mask includes a first lens distortion compensation region including a plurality of opaque first light shielding patterns having a first pattern width, respectively, and a second lens distortion compensation region surrounding the first lens distortion compensation region, the second lens distortion compensation region including a plurality of opaque second light shielding patterns having a second pattern width, respectively, wherein the second pattern width is less than the first pattern width.

    STRUCTURED LIGHT PROJECTOR AND ELECTRONIC APPARATUS INCLUDING THE SAME

    公开(公告)号:US20190383601A1

    公开(公告)日:2019-12-19

    申请号:US16243742

    申请日:2019-01-09

    Abstract: A structured light projectors includes an illuminator configured to emit illumination light, a pattern mask configured to project structured light by partially transmitting the illumination light, and a lens configured to project the structured light, wherein the pattern mask includes a first lens distortion compensation region including a plurality of opaque first light shielding patterns having a first pattern width, respectively, and a second lens distortion compensation region surrounding the first lens distortion compensation region, the second lens distortion compensation region including a plurality of opaque second light shielding patterns having a second pattern width, respectively, wherein the second pattern width is less than the first pattern width.

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