Method of manufacturing semiconductor package using alignment mark on wafer

    公开(公告)号:US11056410B2

    公开(公告)日:2021-07-06

    申请号:US16497283

    申请日:2018-03-28

    Abstract: A method of manufacturing a semiconductor package and a semiconductor package in which positional alignment between a wafer and a substrate until the wafer is mounted and packaged on the substrate is achieved accurately. A wafer is mounted on a package substrate by using first alignment marks and D-cuts as benchmarks, and then a mold resin layer is formed on the wafer in a state in which the first alignment mark is exposed. A part of the mold resin layer is removed by using the D-cuts exposed from the mold resin layer as benchmarks, so that the first alignment marks can be visually recognized. A second alignment marks are formed on the mold resin layer by using the first alignment marks as benchmarks. A Cu redistribution layer to be conducted to a pad portion is formed on a mold resin layer by using the second alignment marks as benchmarks.

    METHOD OF MOLDING PLANT-BASED MATERIAL AND MOLDED BODY

    公开(公告)号:US20210170625A1

    公开(公告)日:2021-06-10

    申请号:US16071223

    申请日:2017-01-24

    Abstract: In order to provide a method of molding plant-based material to mold three-dimensional shape of cross section for relatively long plant-based material while maintaining the continuity of original cell/tissue of the plant-based material by means of simple equipment and process, we obtained a long plant-based material of high density and high strength by continuously giving compressing/drawing deformation to the component tissue of the plant-based material toward the center direction while extruding the plant-based material via the extruding die having a prescribed extrusion ratio and die angle for a relatively long plant-based material long in the fiber direction.

    Marker and posture estimating method using marker

    公开(公告)号:US11030770B2

    公开(公告)日:2021-06-08

    申请号:US16332733

    申请日:2017-09-05

    Inventor: Hideyuki Tanaka

    Abstract: The present invention provides a marker that can uniquely estimate the posture within wide-angle range while maintaining the flatness, and a posture estimating method. The marker includes a two-dimensional pattern code and a posture detection pattern emitting different light depending on an observation direction of the pattern code at around the first axis on a two-dimensional plane formed by the pattern code. The method using the marker has a Step-1 of using a captured image of the marker to identify a color of the light or a pattern drawn by the light, Step-2 of determining, depending on the color or the pattern identified in Step-1, a posture of the marker at around the first axis, and a Step-3 of determining a posture of the marker depending on a positional relation between the posture at around the first axis determined in Step-2 and the elements constituting the captured image.

    Sequence-controlled oligosiloxane and manufacturing method and oligosiloxane synthesizer therefor

    公开(公告)号:US10975107B2

    公开(公告)日:2021-04-13

    申请号:US16490761

    申请日:2018-03-01

    Abstract: The purpose of the present invention is to provide a method for producing an oligosiloxane and an oligosiloxane synthesizer, by which an oligosiloxane can be efficiently produced. An oligosiloxane can be efficiently produced by the method for producing an oligosiloxane, which includes a condensation step for generating a hydrosiloxane having a structure represented by the following Formula (d) by reacting an alkoxysilane having a structure represented by the following Formula (b) with a hydrosilane having a structure represented by the following Formula (c) in the presence of a boron compound having Lewis acidity, and a hydrosilylation step for generating an alkoxysiloxane having a structure represented by the following Formula (f) by reacting the hydrosiloxane having the structure represented by Formula (d) generated in the condensation step with a carbonyl compound represented by the following Formula (E) in the presence of a boron compound having Lewis acidity. Moreover, an oligosiloxane having arbitrary substituent sequences can be produced.

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