公开(公告)号：US20160103399A1

公开(公告)日：2016-04-14

申请号：US14975513

申请日：2015-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik DE Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

Abstract translation: 浸没式光刻设备具有通过防止气泡从间隙中流入光束路径和/或提取可能在间隙中形成的气泡的方法来适应防止或减少衬底台中的一个或多个间隙中的气泡形成。

公开(公告)号：US09285686B2

公开(公告)日：2016-03-15

申请号：US14586468

申请日：2014-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Johannes Sophia Maria Mertens ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Leon Joseph Marie Van Den Schoor ,  Sjoerd Nicolaas Lambertus Donders ,  Bob Streefkerk

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.

Abstract translation: 在浸没式光刻设备中，浸没液体通过限流器从罐中提供。 保持在罐中的液体保持在限流器上方基本上恒定的高度，以确保液体的恒定流动。

公开(公告)号：US09097987B2

公开(公告)日：2015-08-04

申请号：US13866879

申请日：2013-04-19

Applicant: ASML Netherlands B.V.

Inventor： Christiaan Alexander Hoogendam ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Joeri Lof ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Hans Jansen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Alexander Straaijer ,  Bob Streefkerk

IPC: G03B27/58 ,  G03B27/52 ,  G03B27/42 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Abstract translation: 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。

公开(公告)号：US20150109599A1

公开(公告)日：2015-04-23

申请号：US14403114

申请日：2013-05-17

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Sjoerd Nicolaas Lambertus Donders ,  Menno Fien ,  Antonius Franciscus Johannes De Groot ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Martijn Houben ,  Raymond Wilhelmus Louis Laffarre ,  Jan Steven Christiaan Westerlaken ,  Jim Vincent Overkamp ,  Maarten Van Beijnum ,  Robert De Jong

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70733

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

Abstract translation: 用于光刻设备的支撑设备具有物体保持器和物体保持器径向外侧的提取体。 对象持有者被配置为支持对象。 提取体包括提取开口，其构造成从支撑装置的顶表面提取流体。 提取体与物体保持器间隔开，使得提取体基本上与物体保持器分离。 提取体包括突出部，其被构造为使得其围绕物体保持器并且使得在使用中一层液体保持在突出部上并与支撑在物体保持器上的物体接触。

公开(公告)号：US20140368804A1

公开(公告)日：2014-12-18

申请号：US14374197

申请日：2013-01-17

Applicant: ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg

IPC: G03F7/20 ,  B23Q3/18

CPC classification number: B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

Abstract translation: 用于光刻设备的衬底保持器具有设置在其表面上的薄膜堆叠的主体。 薄膜堆叠形成诸如电极，传感器，加热器，晶体管或逻辑器件的电子或电气部件，并且具有顶部隔离层。 在薄膜叠层或薄膜叠层的孔中形成有用于支撑衬底的多个毛刺。

公开(公告)号：US20140368800A1

公开(公告)日：2014-12-18

申请号：US14375264

申请日：2013-01-25

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Sjoerd Nicolaas Lambertus Donders ,  Petrus Maria Cadee

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70833 ,  G03F7/70858

Abstract: A lithographic apparatus comprises a substrate table for accommodating a substrate; a projection system for imaging a pattern onto the substrate, and a metrology system for measuring a position of the substrate table with respect to the projection system. The metrology system comprises a metrology frame connected to the projection system, a grid positioned stationary with respect to the metrology frame, and an encoder connected to the substrate table and facing the grid for measuring the position of the substrate table relative to the grid. The metrology frame has a surface oriented towards the substrate table, and the surface has been configured, e.g., by writing or etching, so as to form the grid.

Abstract translation: 光刻设备包括用于容纳衬底的衬底台; 用于将图案成像到基板上的投影系统，以及用于测量相对于投影系统的基板台的位置的计量系统。 测量系统包括连接到投影系统的计量框架，相对于计量框架静止定位的格栅，以及连接到基板台并面向格栅的编码器，用于测量基板台相对于格栅的位置。 测量框架具有朝向衬底台的表面，并且表面已经被配置为例如通过书写或蚀刻来形成网格。

公开(公告)号：US20140313494A1

公开(公告)日：2014-10-23

申请号：US14262295

申请日：2014-04-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Timotheus Franciscus SENGERS ,  Sjoerd Nicolaas Lambertus Donders ,  Hans Jansen ,  Arjen Boogaard

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

Abstract translation: 在光刻投影装置中，液体供应系统将液体保持在光刻投影装置的投影系统和基板之间的空间中。 位于衬底台上的传感器，其被固定在衬底上，被配置为当浸入液体中时（例如，在与衬底暴露于辐射相同的条件下）暴露于辐射。 通过具有由不超过一种金属类型形成的传感器的与液体接触的吸收元件的表面，可以获得传感器的长寿命。