Abstract:
A process for producing scratch-resistant coatings comprises applying at least one UV-curable coating composition comprising as its photochemically crosslinkable constituent at least one aliphatic urethane (meth)acrylate prepolymer PU having at least two double bonds per molecule, or a mixture of at least one urethane (meth)acrylate prepolymer PU and at least one reactive diluent, to the target substrate and curing the resulting wet coating by exposure to ultraviolet radiation under an inert gas atmosphere.
Abstract:
A radiation-curable composite layered sheet or film comprising at least one substrate layer and one outer layer, said outer layer being composed of a radiation-curable composition having a glass transition temperature of more than 40° C.
Abstract:
The use of phenylglyoxalic esters of the formula I in which the two radicals R1 and A are as defined in the description as photoinitiators in powder coating materials for exterior applications. The compounds of the formula I show little propensity toward yellowing.
Abstract:
A curable composition comprises a prepolymer which comprises, in copolymerized form: (a) an on-average at least bifunctional isocyanate based on a compound of the formula I where R1 and R2 are independently C1-C12-alkylene, (b) an ethylenically unsaturated compound containing isocyanate-reactive groups and (c) if desired, a saturated compound containing isocyanate-reactive groups.
Abstract:
A water-dispersible, radiation-curable polyurethane composed essentially of a) organic, aliphatic or alicyclic polyisocyanates, b) cycloaliphatic diols and/or cycloaliphatic diamines, c) compounds containing at least one isocyanate-reactive group and at least one free-radically polymerizable unsaturated group, d) compounds containing at least one isocyanate-reactive group and at least one dispersing-active group, e) if desired, compounds containing at least two isocyanate-reactive groups having a molecular weight
Abstract:
A process for preparing radiation-curable, urethane-functional prepolymers by reacting an isocyanate-functional component A with an OH-containing component B, wherein either component A embraces two different isocyanate compounds A1 or one isocyanate compound A1 and at least one isocyanate compound A2 or component B embraces at least two different compounds B1. Also, the prepolymers obtainable by the process and the radiation-curable formulations comprising them. Furthermore, the use of the radiation-curable formulations for coating substrates, a method of coating substrates, and the coated substrates themselves.
Abstract:
Radiation-curable compositions based on radiation-curable, free-radically polymerizable compounds comprise .alpha.-olefins having more than 8 carbon atoms.
Abstract:
Radiation-sensitive polymers contain, in the polymer main chain, both acid-labile groups and onium salt groups with nonnucleophilic counterions and are suitable for the production of semiconductor structural elements.
Abstract:
Positive and negative working radiation sensitive mixtures suitable in particular for producing relief patterns contain a polymeric binder and an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also an additional group which upon irradiation forms a strong acid, the polymeric binders being reaction products of polymers that contain phenolic hydroxyl groups with dihydropyran or with alkyl vinyl ethers.
Abstract:
A positive-working, radiation-sensitive mixture and a process for the production of relief images.The radiation-sensitive mixture contains(a) a water-insoluble polymeric binder which is soluble or at least dispersible in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more acid-cleavable groups and in addition a further group which produces a strong acid on exposure to radiation, the polymeric binder (a) consisting a mixture of a phenolic polymer and a resin of the novolak type.The novel mixture is particularly suitable for the production of photoresists.