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129 条记录 (耗时 0.04 秒)

    Endoscope optical system including composition having durability to a sterilization treatment
    124.
    发明授权
    Endoscope optical system including composition having durability to a sterilization treatment 有权
    内窥镜光学系统包括对灭菌处理具有耐久性的组合物

    公开(公告)号：US06558316B2

    公开(公告)日：2003-05-06

    申请号：US09891384

    申请日：2001-06-27

    申请人： Akira Kikuchi ,  Sayaka Konno ,  Hiroaki Kinoshita

    发明人： Akira Kikuchi ,  Sayaka Konno ,  Hiroaki Kinoshita

    IPC分类号： A61B100

    CPC分类号： A61B1/00163 ,  A61B1/00071 ,  C03C3/155

    摘要： A composition has a durability to a sterilization treatment using vapor under high temperature and pressure and capable of transmitting or absorbing light. The composition comprises a group A including 15 to 23 mol % of lanthanum oxide, 3 to 8 mol % of gadolinium oxide, 3 to 8 mol % of tantalum oxide, and 8 mol % or less of yttrium oxide; a group B including 30 to 45 mol % of boron oxide, 20 mol % or less of silicon oxide, and 20 mol % or less of germanium oxide; zero mol % of alkaline metal oxide or alkaline earth metal oxide; and a group D including 0.3 to 15 mol % of niobium oxide and 3 to 15 mol % of zirconium oxide. A mol % ratio A/B between the group A and group B is 80% or more, and a dissolving-out rate of metal ion of the composition is 0.002×10−6 mol/hour or less per square centimeter. In case of applying the composition to an endoscope including an observation system and an illuminating system, an optical element disposed at the outer surface of the observation system and an optical element disposed at the outer surface of the illuminating system are formed of the composition.

    摘要翻译： 组合物对于在高温高压下使用蒸气并且能够透光或吸收光的灭菌处理具有耐久性。 该组合物包含含有15〜23摩尔％的氧化镧，3〜8摩尔％的氧化钆，3〜8摩尔％的氧化钽和8摩尔％以下的氧化钇的基团A， 包含30〜45摩尔％的氧化硼，20摩尔％以下的氧化硅和20摩尔％以下的氧化锗的基团B; 零摩尔％的碱金属氧化物或碱土金属氧化物; 和含有0.3〜15摩尔％的氧化铌和3〜15摩尔％的氧化锆的D族。 A组和B组之间的摩尔％比A / B为80％以上，组合物的金属离子的溶出率为每平方厘米0.002×10 -6 mol /小时以下。 在将构图施加到包括观察系统和照明系统的内窥镜的情况下，设置在观察系统的外表面的光学元件和设置在照明系统的外表面处的光学元件由该组合物形成。

    Flyback transformer
    126.
    发明授权
    Flyback transformer 有权
    反激式变压器

    公开(公告)号：US6002246A

    公开(公告)日：1999-12-14

    申请号：US154700

    申请日：1998-09-17

    申请人： Kiyohiko Gohkon ,  Teruaki Sato ,  Mitsuhiro Kanno ,  Akira Kikuchi

    发明人： Kiyohiko Gohkon ,  Teruaki Sato ,  Mitsuhiro Kanno ,  Akira Kikuchi

    IPC分类号： H01F38/42 ,  H01F40/04 ,  H01F27/28 ,  H01F15/10

    CPC分类号： H01F38/42

    摘要： In a flyback transformer, an insulating cover is interposed between a main body casing and a focusing pack casing. A through-hole is formed through a ceramic resistor accommodated in the focusing pack casing. A fixing hole is formed through the insulating cover in a coaxial relationship with the through-hole. A slider is fixed on a rotatable knob for a variable resistor, which is supported on the focusing pack casing. One of two tongues of the slider is maintained in contact under pressure with a variable resistor of the ceramic resistor, and the other tongue is arranged coaxially with the fixing hole and is maintained in contact under pressure with a wire-shaped output terminal. The terminal is press-fitted in the fixing hole. Another flyback transformer is also disclosed, which comprises a cylindrical holder portion. An exposed portion of a conductor of a voltage output lead wire is formed in an L-shaped bent portion which is press-fitted in the holder portion, whereby the L-shaped bent portion is resiliently held at a basal portion thereof. A conductive rubber is connected to an output terminal. A free end portion of the conductor extends out from the holder portion into the conductive rubber.

    摘要翻译： 在反激式变压器中，绝缘盖插入在主体壳体和聚焦组合壳体之间。 通过容纳在聚焦包装壳体中的陶瓷电阻器形成通孔。 以与通孔同轴的方式穿过绝缘盖形成固定孔。 滑块被固定在用于可变电阻器的可旋转旋钮上，该可变电阻器被支撑在聚焦组合壳体上。 滑块的两个舌片中的一个保持在压力下与陶瓷电阻器的可变电阻器接触，另一个舌片与固定孔同轴地布置，并且在压力下与线形输出端子保持接触。 端子被压配合在固定孔中。 还公开了另一种回扫变压器，其包括圆柱形保持器部分。 电压输出引线的导体的暴露部分形成在压配合在保持器部分中的L形弯曲部分中，由此L形弯曲部分弹性地保持在其基部。 导电橡胶连接到输出端子。 导体的自由端部从保持器部分延伸到导电橡胶中。

    Optical system for endoscopes
    127.
    发明授权
    Optical system for endoscopes 失效
    内镜光学系统

    公开(公告)号：US4988172A

    公开(公告)日：1991-01-29

    申请号：US303142

    申请日：1989-01-30

    申请人： Iwao Kanamori ,  Akira Kikuchi ,  Minoru Okabe

    发明人： Iwao Kanamori ,  Akira Kikuchi ,  Minoru Okabe

    IPC分类号： G02B23/24

    CPC分类号： G02B23/2446

    摘要： An optical system for endoscopes is provided with an inhomogeneous lens configured, as a relay lens, so that refractive index reduces progressively in going from a center portion toward a periphery and at least one of an entrance end face and an exit end face satisfies the following condition:0.15 P

    摘要翻译： 用于内窥镜的光学系统设置有不均匀透镜，其被配置为中继透镜，使得折射率从中心部分朝向周边逐渐减小，并且入射端面和出射端面中的至少一个满足以下 条件：0.15 P

    Method and apparatus for testing integrated electronic device
    128.
    发明授权
    Method and apparatus for testing integrated electronic device 失效
    集成电子设备测试方法和装置

    公开(公告)号：US4980639A

    公开(公告)日：1990-12-25

    申请号：US166763

    申请日：1988-03-03

    申请人： Masahiro Yoshizawa ,  Akira Kikuchi ,  Kou Wada ,  Minpei Fujinami ,  Nobuo Shimazu

    发明人： Masahiro Yoshizawa ,  Akira Kikuchi ,  Kou Wada ,  Minpei Fujinami ,  Nobuo Shimazu

    IPC分类号： G01Q30/02 ,  G01Q30/04 ,  G01Q80/00 ,  G01Q90/00 ,  G01R31/305

    CPC分类号： G01R31/305

    摘要： A method and apparatus for testing an integrated electronic device wherein the integrated electronic device to be tested is placed on a sample table. A predetermined position of the integrated electronic device is irradiated with the primary charged beam. A substrate current flowing through a substrate of the integrated electronic device is measured upon radiation of the primary charged beam, and then a potential of the predetermined position irradiated with the primary charged beam is nondestructively measured in accordance with secondary electrons emitted from the predetermined position. A function of the integrated electronic device is evaluated in accordance with the substrate current and the predetermined position potential. The function to be evaluated include leakage characteristics and a capacitance.

    摘要翻译： 一种用于测试集成电子设备的方法和装置，其中将要测试的集成电子设备放置在样品台上。 用主充电光束照射集成电子设备的预定位置。 通过一次充电光束的辐射测量流过集成电子器件的衬底的衬底电流，然后根据从预定位置发射的二次电子非破坏性地测量用主充电光束照射的预定位置的电位。 根据衬底电流和预定位置电位来评估集成电子器件的功能。 要评估的功能包括泄漏特性和电容。

    Characteristic test apparatus for electronic device and method for using the same
    129.
    发明授权
    Characteristic test apparatus for electronic device and method for using the same 失效
    电子装置用特征试验装置及其使用方法

    公开(公告)号：US4851768A

    公开(公告)日：1989-07-25

    申请号：US212047

    申请日：1988-06-24

    申请人： Masahiro Yoshizawa ,  Akira Kikuchi ,  Kou Wada ,  Minpei Fujinami ,  Nobuo Shimazu

    发明人： Masahiro Yoshizawa ,  Akira Kikuchi ,  Kou Wada ,  Minpei Fujinami ,  Nobuo Shimazu

    IPC分类号： H01L21/66 ,  G01Q30/02 ,  G01Q30/04 ,  G01Q90/00 ,  G01R31/26 ,  G01R31/302 ,  G01R31/305 ,  G01R31/3183 ,  H01J37/28

    CPC分类号： G01R31/305

    摘要： In a characteristic test apparatus for an electronic device, a number of voltage supply beams are radiated onto predetermined irradiation positions of the electronic device placed on a sample table. In addition, a potential measuring beam is radiated onto a number of irradiation positions including the predetermined irradiation positions of the voltage supply beams. A secondary electron signal based on the potential measuring beam is detected to measure a potential. When the irradiation position of the potential measuring beam coincides with that of the voltage supply beam, the voltage supply beam is controlled to adjust a potential at the irradiation position to a set value by controlling, e.g., an acceleration power source for the voltage supply beam. When the irradiation position of the potential measuring beam is different from that of the voltage supply beam, a potential at this position is measured. Then, characteristics of the electronic device are calculated based on the obtained potentials at the respective irradiation positions.

    摘要翻译： 在用于电子设备的特征测试装置中，多个电压供应光束照射到放置在样品台上的电子设备的预定照射位置上。 此外，将潜在的测量光束照射到包括电压供应光束的预定照射位置的多个照射位置。 检测基于电位测量光束的二次电子信号来测量电位。 当电位测量光束的照射位置与电压供应光束的照射位置一致时，电压供应光束被控制以通过控制例如电压源光束的加速度电源来将照射位置处的电位调整到设定值 。 当电位测量光束的照射位置与电压供应光束的照射位置不同时，测量该位置处的电位。 然后，基于在各个照射位置处获得的电位来计算电子设备的特性。