公开(公告)号：US07060338B2

公开(公告)日：2006-06-13

申请号：US10874309

申请日：2004-06-24

申请人： Yoshihiro Ikari ,  Akira Kashiwakura ,  Makoto Miyamoto ,  Makoto Iimura ,  Naoki Kitagaki ,  Yutaka Watanabe ,  Mayumi Kurokawa ,  Sonoko Onodera

发明人： Yoshihiro Ikari ,  Akira Kashiwakura ,  Makoto Miyamoto ,  Makoto Iimura ,  Naoki Kitagaki ,  Yutaka Watanabe ,  Mayumi Kurokawa ,  Sonoko Onodera

IPC分类号： B32B3/02

CPC分类号： G11B7/243 ,  G11B7/2403 ,  G11B7/2534 ,  G11B7/2542 ,  G11B7/257 ,  G11B7/266 ,  G11B2007/24312 ,  G11B2007/24314 ,  G11B2007/24316 ,  G11B2007/2571 ,  G11B2007/25713 ,  Y10T428/21

摘要： A phase-change optical recording medium capable of performing recording and reproduction at a high speed is provided, in which a reproduced signal output is not only sufficiently large but the phase-change optical recording medium also has excellent repeated rewriting performance. An interface layer 3, which is composed of a Ge—Si—N-based material, is formed on at least a surface of one side of a recording layer 4 of the phase-change optical recording medium 10. Accordingly, even when a phase-change material having a high melting point, for example, a Bi—Ge—Te-based phase-change material is used for the recording layer 4, it is possible to provide the phase-change optical recording medium in which the reproduced signal output is sufficiently large and the repeated rewriting performance is excellent.

摘要翻译： 提供能够以高速进行记录和再现的相变光学记录介质，其中再现信号输出不仅足够大，而且相变光学记录介质也具有优异的重复重写性能。 在相变光记录介质10的记录层4的一侧的至少一个表面上形成由Ge-Si-N基材料构成的界面层3。 因此，即使使用具有高熔点的相变材料（例如Bi-Ge-Te类相变材料）作为记录层4，也可以提供相变光记录介质 其中再现信号输出足够大并且重复的重写性能优异。

公开(公告)号：US20060046500A1

公开(公告)日：2006-03-02

申请号：US11210737

申请日：2005-08-25

申请人： Makoto Miyamoto

发明人： Makoto Miyamoto

IPC分类号： H01L21/302 ,  H01L21/461 ,  H01L21/4763

CPC分类号： H01L21/02074

摘要： A semiconductor substrate processing apparatus is provided with a cleaning process chamber containing a semiconductor substrate for performing a cleaning process on the semiconductor substrate. Connected to the cleaning process chamber is a cleaning liquid feeding pipe for supplying a cleaning liquid to the semiconductor substrate. A gas dissolving unit is provided in the midpoint of the cleaning liquid feeding pipe for dissolving a prescribed gas in ultrapure water. An inert gas or a reducing gas is dissolved as a prescribed gas in ultrapure water. A control unit is provided having a function of supplying the cleaning liquid with the prescribed gas dissolved therein to the semiconductor substrate subjected to the cleaning process before performing a dry process. Therefore, the surface of the semiconductor substrate is free from stains. Moreover, a metal interconnection does not elude.

摘要翻译： 半导体衬底处理设备设置有包含用于对半导体衬底进行清洁处理的半导体衬底的清洁处理室。 连接到清洁处理室的是用于向半导体衬底供应清洁液体的清洁液体供给管。 在用于将规定气体溶解在超纯水中的清洗液供给管的中点设置有气体溶解单元。 惰性气体或还原气体作为规定的气体溶解在超纯水中。 提供控制单元，其具有在进行干燥处理之前将经过清洗处理的清洗液供给溶解有规定气体的半导体基板的功能。 因此，半导体衬底的表面没有污点。 而且，金属互连并不排除。

公开(公告)号：US06962744B2

公开(公告)日：2005-11-08

申请号：US10851290

申请日：2004-05-24

申请人： Akikazu Amagai ,  Kenzi Ishii ,  Kiyonari Hiramatsu ,  Makoto Miyamoto ,  Daisuke Ohno ,  Katsutoshi Yamazaki ,  Yasumasa Norisue

发明人： Akikazu Amagai ,  Kenzi Ishii ,  Kiyonari Hiramatsu ,  Makoto Miyamoto ,  Daisuke Ohno ,  Katsutoshi Yamazaki ,  Yasumasa Norisue

IPC分类号： C08G65/38 ,  C08G65/44 ,  C08G65/48 ,  H05K1/03 ,  B32B17/04 ,  C08L63/00

CPC分类号： C08G59/063 ,  C08G65/44 ,  C08G65/485 ,  C08G2650/20 ,  C08L2312/00 ,  H05K1/0326 ,  Y10T428/24994 ,  Y10T428/31511

摘要： A bifunctional phenylene ether oligomer of the formula (1), obtained by oxidation polymerization of a bivalent phenol of the formula (2) and a monovalent phenol of the formula (3), (wherein —X— is represented by the formula (2′), and Y—O— is represented by the formula (3), R2, R3, R4, R8, R9, R10 and R11 in the formula (2′) and the formula (3′) being required not to be a hydrogen atom, and its use.

摘要翻译： 通过式（2）的二价苯酚和式（3）的一价苯酚的氧化聚合获得的式（1）的双官能亚苯基醚低聚物（其中-X-由式（2'）表示， ），YO-由式（3）表示，式（2'）和式（3'）中的R 2，R 3，R 4，R 8，R 9，R 10和R 11不需要为氢原子， 及其用途。

公开(公告)号：US06946168B2

公开(公告)日：2005-09-20

申请号：US10271592

申请日：2002-10-17

申请人： Kuniyuki Senga ,  Hiroki Harata ,  Makoto Miyamoto

发明人： Kuniyuki Senga ,  Hiroki Harata ,  Makoto Miyamoto

IPC分类号： C08J3/21 ,  C09D11/00 ,  B32B27/20 ,  B32B27/16 ,  C08F2/50 ,  C09K19/00

CPC分类号： C08J3/21 ,  B41M5/165 ,  B41M5/305 ,  B41M5/3335 ,  B41M5/3375 ,  C08J2367/00 ,  C09D11/101 ,  C09D11/50 ,  Y10S428/913 ,  Y10T428/10 ,  Y10T428/1036 ,  Y10T428/2984

摘要： This invention provides a reversibly thermochromic ultraviolet ray-hardening type ink having good color change sensitivity and excellent light resistance and fastness, and a reversibly thermochromic laminate produced using the same. The present invention also provides a reversibly thermochromic laminate produced by forming a reversibly thermochromic layer on a support using the same. The ink comprises:(1) a microencapsulated pigment comprising a reversibly thermochromic composition comprising (A) an electron-donating compound, (B) an electron-accepting compound and (C) a color change temperature-controlling agent which controls color reaction generation temperature of the former two compounds; and (D) a light resistance-providing agent represented by a specific formula, and(2) a photo-polymerizable composition comprising an ultraviolet ray absorbent, a reactive oligomer, a reactive monomer, and an acylphosphine oxide photo-polymerization initiator,wherein said microencapsulated pigment is dispersed in said photo-polymerizable composition.

摘要翻译： 本发明提供具有良好的变色灵敏度和优异的耐光性和耐光性的可逆热变色紫外线硬化型油墨，以及使用其制造的可逆热变色层压板。 本发明还提供了一种通过在支撑体上形成可逆热变色层而制成的可逆热变色层压板。 油墨包括：（1）包含可逆热变色组合物的微胶囊化颜料，其包含（A）给电子化合物，（B）电子接受性化合物和（C）控制着色反应发生温度的变色温度控制剂 的前两种化合物; 和（D）由特定的式表示的耐光性提供剂，和（2）包含紫外线吸收剂，反应性低聚物，反应性单体和酰基氧化膦光聚合引发剂的光聚合性组合物，其中所述 微胶囊化颜料分散在所述光聚合组合物中。

公开(公告)号：US20050126514A1

公开(公告)日：2005-06-16

申请号：US10514113

申请日：2003-04-10

申请人： Makoto Miyamoto

发明人： Makoto Miyamoto

IPC分类号： C10L1/02 ,  C10L1/18 ,  C10L10/00 ,  C10L10/14

CPC分类号： C10L1/02 ,  C10L1/1824 ,  C10L1/1852 ,  C10L10/04

摘要： A fuel for an internal combustion engine is provided which is environment friendly and arranged to minimize corrosion of the internal combustion engine. The fuel is characterized by 50 to 75 percent by weight of an alcohol component including isopropyl alcohol, isobutyl alcohol, and n-butyl alcohol and 25 to 49.9 percent by weight of a hydrocarbon component, wherein the ignition point is not higher than −20° C. Preferably, the alcohol component is 50 to 60 percent by weight while the hydrocarbon component is 40 to 49.9 percent by weight. Also, the alcohol component contains 15 to 30 percent by weight of isopropyl alcohol, 15 to 25 percent by weight of isobutyl alcohol, and 7 to 20 percent by weight of n-butyl alcohol.

摘要翻译： 提供一种用于内燃机的燃料，其是环境友好的并且设置成使内燃机的腐蚀最小化。 燃料的特征在于50〜75重量％的醇成分，包括异丙醇，异丁醇和正丁醇，25〜49.9重量％的烃成分，其中点火点不高于-20℃ 优选地，醇组分为50至60重量％，而烃组分为40至49.9重量％。 此外，醇成分含有15〜30重量％的异丙醇，15〜25重量％的异丁醇和7〜20重量％的正丁醇。

公开(公告)号：US06616773B1

公开(公告)日：2003-09-09

申请号：US09686061

申请日：2000-10-11

申请人： Masaki Kuzumoto ,  Seiji Noda ,  Izumi Oya ,  Makoto Miyamoto ,  Hideo Horibe ,  Tatsuo Kataoka ,  Tetsuji Oishi

发明人： Masaki Kuzumoto ,  Seiji Noda ,  Izumi Oya ,  Makoto Miyamoto ,  Hideo Horibe ,  Tatsuo Kataoka ,  Tetsuji Oishi

IPC分类号： B08B300

CPC分类号： H01L21/6708 ,  B08B7/00 ,  G03F7/422 ,  Y10S134/902

摘要： A substrate treatment assembly for treating a work object on a surface of a substrate by supplying to the work object a wet ozone-containing gas wetted with a treatment solution includes a substrate heating device for maintaining a substrate at a temperature higher than room temperature, a wetting device for producing a wet ozone-containing gas by wetting an ozone-containing gas with a treatment solution, a supply device for supplying the wet ozone-containing gas to a work object on a surface of the substrate, a gas conduit connecting the wetting device to the supply device, and a heating device for heating the wet ozone-containing gas to a temperature approximately equal to or greater than the temperature of the substrate.

摘要翻译： 一种基板处理组件，用于通过向处理对象物供给湿润的含臭氧的气体来处理基板表面上的工件，所述基底处理组件包括用于将基板保持在高于室温的温度的基板加热装置， 润湿装置，用于通过用处理溶液润湿含臭氧的气体来产生含湿臭氧的气体;供应装置，用于将湿的含臭氧的气体供应到基板的表面上的工件;连接润湿剂的气体导管 装置，以及用于将含湿臭氧的气体加热到大约等于或大于基板的温度的温度的加热装置。

公开(公告)号：US06524769B1

公开(公告)日：2003-02-25

申请号：US09633099

申请日：2000-08-04

申请人： Kenji Ishii ,  Isao Hagiwara ,  Toru Harada ,  Makoto Miyamoto

发明人： Kenji Ishii ,  Isao Hagiwara ,  Toru Harada ,  Makoto Miyamoto

IPC分类号： G03F7038

CPC分类号： C08G73/0655 ,  G03F7/038

摘要： A photosensitive resin obtained by reacting a reaction product (I) prepared from a biphenyl epoxy acrylate (a) of the formula (1) and a cyanate ester compound (b) with a polybasic acid anhydride (c), and a photosensitive resin and an epoxy compound, wherein each of R1 and R9 is a hydrogen atom or methyl, and n is an integer of 1 or more. The photosensitive resin and the photosensitive resin composition have excellent developability, has high heat resistance and particularly has excellent heat resistance and reliability on electric insulation under moisture absorption lasting for a long period of time.

摘要翻译： 将由式（1）的联苯基环氧丙烯酸酯（a）制备的反应产物（I）和氰酸酯化合物（b）与多元酸酐（c）反应得到的感光树脂和感光性树脂和 环氧化合物，其中R 1和R 9各自为氢原子或甲基，n为1以上的整数。 感光性树脂和感光性树脂组合物具有优异的显影性，耐热性高，特别是在长时间吸湿下的电绝缘性上具有优异的耐热性和可靠性。

公开(公告)号：US06517999B1

公开(公告)日：2003-02-11

申请号：US09614258

申请日：2000-07-12

申请人： Izumi Oya ,  Seiji Noda ,  Makoto Miyamoto ,  Masaki Kuzumoto ,  Masashi Ohmori ,  Tatsuo Kataoka

发明人： Izumi Oya ,  Seiji Noda ,  Makoto Miyamoto ,  Masaki Kuzumoto ,  Masashi Ohmori ,  Tatsuo Kataoka

IPC分类号： G03F742

CPC分类号： H01L21/67075 ,  G03F7/42 ,  G03F7/422 ,  G03F7/423 ,  G03F7/428

摘要： A method of removing photoresist film with high efficiency of removal and friendliness with the environment while reducing the material consumption and the cost for the ventilation facility, and an apparatus used for the method are provided. Particularly the present invention provides a method of removing a photoresist film provided on a surface of a substrate, comprising steps of in a sealed system, disposing the substrate surface having the photoresist film to contact with a photoresist film removing solution, making ozone exist in gas phase and/or solution phase in the vicinity of the liquid surface of the photoresist film removing solution, and changing a relative position between the surface of the substrate and the liquid surface of the solution to decompose or remove the photoresist film from the substarate, characterized in that the relative position is changed continuously or intermittently within a range between a position where a bottom edge of the substrate is present above the liquid surface of the solution, and another position where a top edge of the substrate is present below the liquid surface of the solution. The present invention also provides an apparatus used for the method.

摘要翻译： 提供了一种去除光致抗蚀剂膜的方法，同时降低了通风设备的材料消耗和成本，同时具有高度的去除效率和环境友好性，并且提供了用于该方法的设备。 特别地，本发明提供一种除去设置在基板表面上的光致抗蚀剂膜的方法，包括以下步骤：在密封系统中，设置具有光致抗蚀剂膜的基板表面与光致抗蚀剂膜去除溶液接触，使臭氧存在于气体中 相位和/或溶液相位在光致抗蚀剂膜去除溶液的液面附近，并且改变基板的表面和溶液的液面之间的相对位置，以从底层分解或去除光致抗蚀剂膜，其特征在于 因为相对位置在溶液的液面之上存在基板的底部边缘的位置与基板的上边缘的另一位置之间的范围内连续地或间歇地变化， 解决方案。 本发明还提供了一种用于该方法的装置。

公开(公告)号：US06517998B1

公开(公告)日：2003-02-11

申请号：US09614252

申请日：2000-07-12

申请人： Seiji Noda ,  Masaki Kuzumoto ,  Izumi Oya ,  Makoto Miyamoto

发明人： Seiji Noda ,  Masaki Kuzumoto ,  Izumi Oya ,  Makoto Miyamoto

IPC分类号： G03F742

CPC分类号： G03F7/427 ,  G03F7/42

摘要： A method of removing a photoresist film with high efficiency of removal and friendliness with the environment while reducing material consumption and cost for a ventilation facility, and an apparatus used for the method. The method of removing a photoresist film in a sealed system, includes supplying a photoresist film-removal mixture containing an ozonized gas and a photoresist film-remover to a photoresist film on a surface of a substrate through a photoresist film-remover supplier opposed to the photoresist film.

摘要翻译： 一种去除光致抗蚀剂膜的方法，其具有高的去除效率和环境友好性，同时减少通风设备的材料消耗和成本，以及用于该方法的设备。 在密封系统中除去光致抗蚀剂膜的方法包括通过与光致抗蚀剂膜相反的光致抗蚀剂去除剂供应器将含有臭氧化气体和光致抗蚀剂膜去除剂的光致抗蚀剂膜去除混合物供应到基板表面上的光致抗蚀剂膜 光致抗蚀剂膜。

公开(公告)号：US06411465B1

公开(公告)日：2002-06-25

申请号：US09531587

申请日：2000-03-20

申请人： Shigeo Obata ,  Makoto Miyamoto ,  Atsushi Imai ,  Yoshinobu Ono ,  Shinji Tanaka ,  Hisashi Takahashi ,  Kenji Kawamata

发明人： Shigeo Obata ,  Makoto Miyamoto ,  Atsushi Imai ,  Yoshinobu Ono ,  Shinji Tanaka ,  Hisashi Takahashi ,  Kenji Kawamata

IPC分类号： G11B1561

CPC分类号： G11B15/61 ,  G11B15/62

摘要： A rotary head in which the tape running load is decreased by setting the tape path cylindrical surface of an upper drum (12) in a range of winding of a tape (31) at an inner side relative to the tape path cylindrical surface of a lower drum (11). Alternatively, the tape path cylindrical surface of an inner drum (13) in a range of winding of the tape (31) is positioned at an outer side relative to the tape path cylindrical surface of the upper or lower drum.

摘要翻译： 一种旋转头，其中通过将上滚筒（12）的带路径圆柱形表面设置在带（31）的卷绕范围内，相对于下层的带路径圆柱形表面的内侧而减小了带运行负载 鼓（11）。 或者，在带（31）的卷绕范围内的内鼓（13）的带路径圆柱形表面位于相对于上鼓或下鼓的带路径圆柱形表面的外侧。