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公开(公告)号:US20210151621A1
公开(公告)日:2021-05-20
申请号:US16686973
申请日:2019-11-18
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Steven M. Shank , Vibhor Jain , Anthony K. Stamper , John J. Ellis-Monaghan , John J. Pekarik
IPC: H01L31/074 , H01L31/028 , H01L31/18
Abstract: Structures including a photodetector and methods of fabricating such structures. The photodetector is positioned over the top surface of the substrate. The photodetector includes a portion of a semiconductor layer comprised of a semiconductor alloy, a p-type doped region in the portion of the semiconductor layer, and an n-type doped region in the portion of the semiconductor layer. The p-type doped region and the n-type doped region converge along a p-n junction. The portion of the semiconductor layer has a first side and a second side opposite from the first side. The semiconductor alloy has a composition that is laterally graded from the first side to the second side of the portion of the semiconductor layer.
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公开(公告)号:US11004878B2
公开(公告)日:2021-05-11
申请号:US16544074
申请日:2019-08-19
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Anthony K. Stamper , Vibhor Jain , Steven M. Shank , John J. Ellis-Monaghan , John J. Pekarik
IPC: H01L27/144 , H01L29/04 , H01L29/165 , H01L29/737 , H01L29/06 , H01L29/66 , H01L31/02 , H01L31/105 , H01L31/18 , H01L31/0312 , G01S7/481 , H03F3/08
Abstract: Structures including a photodiode and methods of fabricating such structures. A substrate has a top surface, a well, and a trench extending from the top surface to the well. A photodiode is positioned in the trench. The photodiode includes an electrode that is provided by a first portion of the well. A bipolar junction transistor has an emitter that is positioned over the top surface of the substrate and a subcollector that is positioned below the top surface of the substrate. The subcollector is provided by a second portion of the well.
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公开(公告)号:US20210091236A1
公开(公告)日:2021-03-25
申请号:US16790084
申请日:2020-02-13
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Qizhi Liu , Vibhor Jain , John J. Pekarik , Judson R. Holt
IPC: H01L29/808 , H01L29/06 , H01L29/10 , H01L29/66 , H01L21/02 , H01L21/225 , H01L29/08
Abstract: A junction field effect transistor (JFET) structure includes a doped polysilicon gate over a channel region of a semiconductor layer. The doped polysilicon gate has a first doping type. A raised epitaxial source is on the source region of the semiconductor layer and adjacent a first sidewall of the doped polysilicon gate, and has a second doping type opposite the first doping type. A raised epitaxial drain is on the drain region of the semiconductor layer and adjacent a second sidewall of the doped polysilicon gate, and has the second doping type. A doped semiconductor region is within the channel region of the semiconductor layer and extending from the source region to the drain region, and a non-conductive portion of the semiconductor layer is within the channel region to separate the doped semiconductor region from the doped polysilicon gate.
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公开(公告)号:US10931274B2
公开(公告)日:2021-02-23
申请号:US16252007
申请日:2019-01-18
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Anthony K. Stamper , Vibhor Jain
Abstract: One illustrative device includes, among other things, an active device comprising a first terminal, a first bias resistor connected to the first terminal, and a first resistor comprising a first phase transition material connected in parallel with the first bias transistor, wherein the first phase transition material exhibits a first low conductivity phase for temperatures less than a first phase transition temperature and a first high conductivity phase for temperatures greater than the first phase transition temperature.
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