公开(公告)号：US07488933B2

公开(公告)日：2009-02-10

申请号：US11461929

申请日：2006-08-02

申请人： Jun Ye ,  Yu Cao ,  Guangqing Chen ,  Stefan Hunsche

发明人： Jun Ye ,  Yu Cao ,  Guangqing Chen ,  Stefan Hunsche

IPC分类号： G12B13/00

CPC分类号： G03F7/70516 ,  G03F7/705

摘要： A method for separately calibrating an optical model and a resist model of lithography process using information derived from in-situ aerial image measurements to improve the calibration of both the optical model and the resist model components of the lithography simulation model. Aerial images produced by an exposure tool are measured using an image sensor array loaded into the exposure tool. Multiple embodiments of measuring aerial image information and using the measured aerial image information to calibrate the optical model and the resist model are disclosed. The method of the invention creates more accurate and separable optical and resist models, leading to better predictability of the pattern transfer process from mask to wafer, more accurate verification of circuit patterns and how they will actually print in production, and more accurate model-based process control in the wafer fabrication facility.

摘要翻译： 使用从原位空间图像测量得到的信息分别校准光学模型和光刻工艺的抗蚀剂模型的方法，以改进光刻模拟和光刻模拟模型的抗蚀剂模型组件的校准。 使用装载到曝光工具中的图像传感器阵列来测量由曝光工具产生的空中影像。 公开了测量空间图像信息和使用所测量的空间图像信息来校准光学模型和抗蚀剂模型的多个实施例。 本发明的方法创建更精确和可分离的光学和抗蚀剂模型，导致从掩模到晶片的图案转移过程更好的可预测性，电路图案的更准确的验证以及它们将如何在生产中实际打印，以及更准确的基于模型 晶圆制造设备中的过程控制。

公开(公告)号：US20080301620A1

公开(公告)日：2008-12-04

申请号：US11757805

申请日：2007-06-04

申请人： Jun Ye ,  Yu Cao ,  Hanying Feng

发明人： Jun Ye ,  Yu Cao ,  Hanying Feng

IPC分类号： G06F17/50 ,  G03F1/00

CPC分类号： G03F1/36

摘要： Methods are disclosed to create efficient model-based Sub-Resolution Assist Features (MB-SRAF). An SRAF guidance map is created, where each design target edge location votes for a given field point on whether a single-pixel SRAF placed on this field point would improve or degrade the aerial image over the process window. In one embodiment, the SRAF guidance map is used to determine SRAF placement rules and/or to fine tune already-placed SRAFs. In another embodiment the SRAF guidance map is used directly to place SRAFs in a mask layout.

摘要翻译： 公开了创建有效的基于模型的子分辨率辅助特征（MB-SRAF）的方法。 创建SRAF指南图，其中每个设计目标边缘位置对于给定的场点投票，放置在该场点上的单像素SRAF是否将改善或降级过程窗口上的空中图像。 在一个实施例中，SRAF引导图用于确定SRAF放置规则和/或微调已经放置的SRAF。 在另一个实施例中，SRAF引导图被直接用于将SRAF放置在掩模布局中。

公开(公告)号：US20080238375A1

公开(公告)日：2008-10-02

申请号：US12055577

申请日：2008-03-26

申请人： Zhiliang Chen ,  Xiuhong Zhang ,  Jun Ye ,  Shifeng Zhao ,  Lieyi Fang

发明人： Zhiliang Chen ,  Xiuhong Zhang ,  Jun Ye ,  Shifeng Zhao ,  Lieyi Fang

IPC分类号： G05F1/10

CPC分类号： H02M3/33523 ,  H02M1/44

摘要： Switch mode power converter system and method thereof. The system includes one or more isolation boxes including at least a first isolation box, an input primary winding for receiving an input signal for the switch mode power converter system, and an output secondary winding for generating an output signal for the switch mode power converter system. The switch mode power converter system is configured to convert the input signal to the output signal. One of the input primary winding and the output secondary winding is substantially enclosed in the first isolation box, and the other of the input primary winding and the output secondary winding is not enclosed in the first isolation box. The first isolation box is conductively connected to a constant-voltage source.

摘要翻译： 开关电源转换器系统及其方法。 该系统包括一个或多个隔离箱，其包括至少第一隔离箱，用于接收开关模式功率转换器系统的输入信号的输入初级绕组和用于产生开关模式功率转换器系统的输出信号的输出次级绕组 。 开关模式功率转换器系统被配置为将输入信号转换成输出信号。 输入初级绕组和输出次级绕组中的一个基本上封装在第一隔离箱中，另一个输入初级绕组和输出次级绕组未封装在第一隔离箱中。 第一隔离箱与恒压源导电连接。

公开(公告)号：US20080224749A1

公开(公告)日：2008-09-18

申请号：US11692098

申请日：2007-03-27

申请人： Yuan Lin ,  Jun Ye ,  Lieyi Fang

发明人： Yuan Lin ,  Jun Ye ,  Lieyi Fang

IPC分类号： H03H11/26

CPC分类号： H02M1/32 ,  H02M2001/0032 ,  Y02B70/16 ,  Y10S323/901

摘要： System and method for providing stable control for power systems. According to an embodiment, the present invention provides an apparatus for providing one or more control signals for a power system. The apparatus includes an input terminal for receiving an electrical energy, which can be characterized by a first input voltage. The apparatus includes a control component that is configured to generate a first control signal based on at least information associated with the first input voltage. The apparatus additionally includes an output terminal for sending the first control signal. Moreover, the apparatus includes a timing component that is coupled to the control component. The control component is configured to process at least information associated with a first value of the first input voltage at a first time and a first reference voltage and to generate a second control signal.

摘要翻译： 为电力系统提供稳定控制的系统和方法。 根据实施例，本发明提供了一种用于为电力系统提供一个或多个控制信号的装置。 该装置包括用于接收电能的输入端子，其可以由第一输入电压表征。 该装置包括控制部件，其被配置为基于至少基于与第一输入电压相关联的信息生成第一控制信号。 该装置还包括用于发送第一控制信号的输出端子。 此外，该装置包括耦合到控制部件的定时部件。 控制部件被配置为至少处理与第一输入电压的第一值相关联的信息和第一参考电压并产生第二控制信号。

公开(公告)号：US20080212248A1

公开(公告)日：2008-09-04

申请号：US12031242

申请日：2008-02-14

申请人： Zhen Zhu ,  Jun Ye ,  Shifeng Zhao ,  Lieyi Fang ,  Zhiliang Chen

发明人： Zhen Zhu ,  Jun Ye ,  Shifeng Zhao ,  Lieyi Fang ,  Zhiliang Chen

IPC分类号： H02H3/00

CPC分类号： H02M1/32 ,  H02M3/33507

摘要： System and method for protecting a power converter. The system includes a compensation system configured to receive an input signal and generate a control signal, a cycle threshold generator configured to receive the control signal and generate a cycle threshold, and a comparator configured to receive the cycle threshold and a feedback signal and generate a comparison signal. Additionally, the system includes a pulse-width-modulation generator configured to receive the comparison signal and generate a modulation signal in response to the comparison signal, and a switch configured to receive the modulation signal and control an input current for a power converter. The input current is associated with an output power for the power converter. The cycle threshold corresponds to a threshold power level for the output power. The threshold power level is constant, decreases, or increases with respect to the input signal.

摘要翻译： 保护电源转换器的系统和方法。 该系统包括被配置为接收输入信号并产生控制信号的补偿系统，配置成接收控制信号并产生周期阈值的周期阈值发生器，以及配置成接收周期阈值和反馈信号并产生 比较信号。 此外，该系统包括：脉冲宽度调制发生器，被配置为接收比较信号并响应于比较信号产生调制信号;以及开关，被配置为接收调制信号并控制功率转换器的输入电流。 输入电流与功率转换器的输出功率有关。 周期阈值对应于输出功率的阈值功率电平。 阈值功率电平相对于输入信号是恒定的，减小的或增加的。

公开(公告)号：US20070174895A1

公开(公告)日：2007-07-26

申请号：US11323916

申请日：2005-12-30

申请人： Yao Zhigang ,  Qiu Yang ,  Jun Ye ,  Christopher Thomas

发明人： Yao Zhigang ,  Qiu Yang ,  Jun Ye ,  Christopher Thomas

IPC分类号： H04N7/16

CPC分类号： H04N5/4401 ,  H04N5/46 ,  H04N21/4113 ,  H04N21/414 ,  H04N21/42607 ,  H04N21/42638 ,  H04N21/43632

摘要： A Video and Audio Front End Assembly and Method. The device and method of this invention takes advantage of the hardware improvements available in personal computing machines that enable higher speed bus communications and much greater computational capacity. The system converts many of the processes needed to convert analog video and audio inputs so that they are displayable by a personal computer from a hardware integrated circuit to a set of software routines. The system combines a simplified hardware front-end interface between the computer and the analog input signals and a very flexible set of software applications running on the host computer. The hardware front end employs an integrated circuit device that is much lower in complexity and cost than the conventional audio/video decoder integrated circuit. The software back end provides performance that is equal to the prior hardware-based systems, while also having the substantial benefit of being upgradable at virtually no cost to respond to changing user requirements and technological evolutions in the decoding arena.

摘要翻译： 视频和音频前端组件和方法。 本发明的装置和方法利用个人计算机中可用的硬件改进，其实现更高速的总线通信和更大的计算能力。 该系统转换模拟视频和音频输入转换所需的许多过程，使其可由个人计算机从硬件集成电路显示到一组软件程序。 该系统结合了计算机和模拟输入信号之间的简化硬件前端接口以及在主机上运行的非常灵活的一组软件应用程序。 硬件前端使用的集成电路器件的复杂性和成本比传统的音频/视频解码器集成电路低得多。 软件后端提供的性能等同于以前的基于硬件的系统，同时还具有可实现升级的实质性好处，无需额外的费用来响应不断变化的用户需求和解码领域的技术演进。

公开(公告)号：US07233874B2

公开(公告)日：2007-06-19

申请号：US11041807

申请日：2005-01-24

申请人： Jun Ye ,  Xun Chen

发明人： Jun Ye ,  Xun Chen

IPC分类号： G06F19/00

CPC分类号： H01L21/67276 ,  G01D9/005 ,  H01L21/67253 ,  H01L22/34 ,  H01L2224/48463 ,  H01L2224/49107 ,  H01L2924/13091 ,  H01L2924/3011 ,  H01L2924/00

摘要： In one aspect, the present invention is a sensor unit for sensing process parameters of a process to manufacture an integrated circuit using integrated circuit processing equipment. In one embodiment, the sensor unit includes a substrate having a wafer-shaped profile and a first sensor, disposed on or in the substrate, to sample a first process parameter. The sensor unit of this embodiment also includes a second sensor, disposed on or in the substrate, to sample a second process parameter wherein the second process parameter is different from the first process parameter. In one embodiment, the sensor unit includes a first source, disposed on or in the substrate, wherein first source generates an interrogation signal and wherein the first sensor uses the interrogation signal from the first source to sample the first process parameter. The sensor unit may also include a second source, disposed on or in the substrate, wherein second source generates an interrogation signal and wherein the second sensor uses the interrogation signal from the second source to sample the second process parameter. The first sensor and the first source may operate in an end-point mode or in a real-time mode. In this regard, the first sensor samples the first parameter periodically or continuously while the sensor unit is disposed in the integrated circuit processing equipment and undergoing processing. In one embodiment, the first sensor is a temperature sensor and the second sensor is a pressure sensor, a chemical sensor, a surface tension sensor or a surface stress sensor.

摘要翻译： 一方面，本发明是用于感测使用集成电路处理设备来制造集成电路的工艺参数的传感器单元。 在一个实施例中，传感器单元包括具有晶片形状的衬底和设置在衬底上或衬底中的第一传感器，以对第一工艺参数进行采样。 该实施例的传感器单元还包括设置在基板上或基板中的第二传感器，以对第二处理参数进行采样，其中第二处理参数与第一处理参数不同。 在一个实施例中，传感器单元包括设置在衬底上或衬底中的第一源，其中第一源产生询问信号，并且其中第一传感器使用来自第一源的询问信号对第一过程参数进行采样。 传感器单元还可以包括设置在衬底上或衬底中的第二源，其中第二源产生询问信号，并且其中第二传感器使用来自第二源的询问信号对第二过程参数进行采样。 第一传感器和第一源可以以端点模式或实时模式工作。 在这方面，第一传感器在传感器单元被布置在集成电路处理设备中并进行处理时周期性地或连续地对第一参数进行采样。 在一个实施例中，第一传感器是温度传感器，第二传感器是压力传感器，化学传感器，表面张力传感器或表面应力传感器。

公开(公告)号：US20070061773A1

公开(公告)日：2007-03-15

申请号：US11530409

申请日：2006-09-08

申请人： Jun Ye ,  Stefan Hunsche

发明人： Jun Ye ,  Stefan Hunsche

IPC分类号： G06F17/50 ,  G03F1/00 ,  G21K5/00 ,  G06F19/00

CPC分类号： G06F17/5081 ,  G03F1/36 ,  G03F1/84 ,  G03F7/70441 ,  G03F7/705

摘要： Methods are disclosed for selecting and optimizing an exposure tool using an individual mask error model. In one embodiment, a method includes selecting a model of a lithography process including an optical model of an exposure tool and a resist model, creating an individual mask error model representing a mask manufactured using mask layout data, simulating the lithography process using the model of the lithography process and the individual mask error model to produce simulated patterns, determining differences between the simulated patterns and a design target, and optimizing settings of the exposure tool based on the differences between the simulated patterns and the design target.

摘要翻译： 公开了使用单独的掩模误差模型来选择和优化曝光工具的方法。 在一个实施例中，一种方法包括选择包括曝光工具和抗蚀剂模型的光学模型的光刻工艺的模型，创建表示使用掩模布局数据制造的掩模的单独掩模误差模型，使用模型 光刻过程和单个掩模误差模型，以产生模拟图案，确定模拟图案与设计目标之间的差异，并且基于模拟图案和设计目标之间的差异优化曝光工具的设置。

公开(公告)号：US20070050749A1

公开(公告)日：2007-03-01

申请号：US11466978

申请日：2006-08-24

申请人： Jun Ye ,  Moshe Preil ,  Xun Chen ,  Shauh-Teh Juang ,  James Wiley

发明人： Jun Ye ,  Moshe Preil ,  Xun Chen ,  Shauh-Teh Juang ,  James Wiley

IPC分类号： G06F17/50

CPC分类号： G03F7/70641 ,  G03F1/44 ,  G03F7/705 ,  G03F7/70625

摘要： A method for identifying process window signature patterns in a device area of a mask is disclosed. The signature patterns collectively provide a unique response to changes in a set of process condition parameters to the lithography process. The signature patterns enable monitoring of associated process condition parameters for signs of process drift, analyzing of the process condition parameters to determine which are limiting and affecting the chip yields, analyzing the changes in the process condition parameters to determine the corrections that should be fed back into the lithography process or forwarded to an etch process, identifying specific masks that do not transfer the intended pattern to wafers as intended, and identifying groups of masks that share common characteristics and behave in a similar manner with respect to changes in process condition parameters when transferring the pattern to the wafer.

摘要翻译： 公开了一种用于识别掩模的设备区域中的处理窗口签名图案的方法。 签名图案集合地提供了对一组工艺条件参数对光刻工艺的变化的唯一响应。 签名模式可以监控相关的过程状态参数，以了解过程漂移的迹象，分析过程状态参数，以确定哪些是限制和影响芯片产量，分析过程状态参数的变化以确定应反馈的校正 进入光刻过程或转发到蚀刻工艺，识别不按照预期将预期图案转印到晶片的特定掩模，以及鉴定相对于工艺条件参数的变化共享共同特性并以类似方式表现的掩模组， 将图案转移到晶片。

公开(公告)号：US20070032896A1

公开(公告)日：2007-02-08

申请号：US11461929

申请日：2006-08-02

申请人： Jun Ye ,  Yu Cao ,  Guangqing Chen ,  Stefan Hunsche

发明人： Jun Ye ,  Yu Cao ,  Guangqing Chen ,  Stefan Hunsche

IPC分类号： G06F19/00

CPC分类号： G03F7/70516 ,  G03F7/705

摘要： A method for separately calibrating an optical model and a resist model of lithography process using information derived from in-situ aerial image measurements to improve the calibration of both the optical model and the resist model components of the lithography simulation model. Aerial images produced by an exposure tool are measured using an image sensor array loaded into the exposure tool. Multiple embodiments of measuring aerial image information and using the measured aerial image information to calibrate the optical model and the resist model are disclosed. The method of the invention creates more accurate and separable optical and resist models, leading to better predictability of the pattern transfer process from mask to wafer, more accurate verification of circuit patterns and how they will actually print in production, and more accurate model-based process control in the wafer fabrication facility.

摘要翻译： 使用从原位空间图像测量得到的信息分别校准光学模型和光刻工艺的抗蚀剂模型的方法，以改进光刻模拟和光刻模拟模型的抗蚀剂模型组件的校准。 使用装载到曝光工具中的图像传感器阵列来测量由曝光工具产生的空中影像。 公开了测量空间图像信息和使用所测量的空间图像信息来校准光学模型和抗蚀剂模型的多个实施例。 本发明的方法创建更精确和可分离的光学和抗蚀剂模型，导致从掩模到晶片的图案转移过程更好的可预测性，电路图案的更准确的验证以及它们将如何在生产中实际打印，以及更准确的基于模型 晶圆制造设备中的过程控制。