公开(公告)号：US20240279060A1

公开(公告)日：2024-08-22

申请号：US18570142

申请日：2022-06-20

申请人： MITSUBISHI GAS CHEMICAL COMPANY, INC.

发明人： Kohei SHIGETA ,  Yasuhiro KUSHIDA

IPC分类号： C01B15/013 ,  B01D61/02 ,  B01D69/02

CPC分类号： C01B15/013 ,  B01D61/025 ,  B01D69/02 ,  B01D2325/06 ,  B01D2325/20

摘要： Provided is a method for producing aqueous hydrogen peroxide solution, the method capable of reducing impurities such as organic substances and preventing the occurrence of foaming and odor. The solution for the aforementioned problems is a method for producing a purified aqueous hydrogen peroxide solution, the method including a predetermined osmosis membrane treatment process of bringing a crude aqueous hydrogen peroxide solution containing impurities into contact with a reverse osmosis membrane. That is, the aforementioned problems are solved by a method for producing a purified aqueous hydrogen peroxide solution, in which a first integrated value that is the integrated value of the pressure and the linear velocity are adjusted so that the pressure of reverse osmosis membrane (MPaG) and the linear velocity of the aqueous hydrogen peroxide solution (m3/(m2·h)) is less than 0.15 in the osmosis membrane treatment process.

公开(公告)号：US12060311B2

公开(公告)日：2024-08-13

申请号：US16970581

申请日：2019-03-18

申请人： MITSUBISHI GAS CHEMICAL COMPANY, INC.

发明人： Yutaka Kanbara ,  Yuta Oomori ,  Yoichi Kyuuko ,  Tomoo Tsujimoto ,  Kazunari Yamamoto ,  Tsuyoshi Hatakeyama

IPC分类号： C07C253/28 ,  B01J21/02 ,  B01J21/06 ,  B01J23/26 ,  B01J23/28

CPC分类号： C07C253/28 ,  B01J21/02 ,  B01J21/063 ,  B01J23/26 ,  B01J23/28

摘要： The present invention can provide a method for producing an aromatic nitrile in which a fixed-bed reactor including a plurality of reaction tubes is used to subject a gaseous mixture comprising an aromatic hydrocarbon, ammonia, and oxygen by contact catalytic reaction on a catalyst to thereby produce the corresponding aromatic nitrile, wherein the catalyst is composed of an oxide containing vanadium, chromium, and boron and one or more supports selected from among alumina, silica-alumina, zirconia, and titania. One of the reaction tubes is filled with the catalyst of one kind and examined as to where a hot spot lies therein. An inert substance is filled into that portion of each of the plurality of reaction tubes which corresponds at least to the hot spot, and the catalyst is filled into the remaining portions.

公开(公告)号：US12049541B2

公开(公告)日：2024-07-30

申请号：US17045041

申请日：2019-04-01

申请人： Mitsubishi Gas Chemical Company, Inc.

发明人： Yuichiro Satake ,  Manabu Hirakawa ,  Yasuaki Yoshimura ,  Eiichi Honda

IPC分类号： C08G63/60 ,  C08G63/06 ,  C08K5/13 ,  C08K5/526 ,  C08K5/527 ,  C08L67/02 ,  C08G63/18 ,  C08G63/199

CPC分类号： C08G63/60 ,  C08G63/06 ,  C08K5/13 ,  C08K5/526 ,  C08K5/527 ,  C08L67/02 ,  C08G63/18 ,  C08G63/199

摘要： A polyester resin composition containing:



a polyester resin containing a unit (A) represented by the following general formula (1); and
an antioxidant:








wherein R1 is a hydrogen atom, CH3 or C2H5, R2 and R3 are each independently a hydrogen atom or CH3, and n is 0 or 1.

公开(公告)号：US20240240046A1

公开(公告)日：2024-07-18

申请号：US18562558

申请日：2022-05-31

申请人： MITSUBISHI GAS CHEMICAL COMPANY, INC.

发明人： Fumiaki KAKEYA

IPC分类号： C09D135/02 ,  C08F222/10 ,  C08G18/50 ,  C08G18/67 ,  C08J7/04 ,  C08J7/046 ,  C08J7/18 ,  C09D7/40 ,  C09D7/47 ,  C09D7/61

CPC分类号： C09D135/02 ,  C08F222/1065 ,  C08G18/5015 ,  C08G18/673 ,  C08J7/042 ,  C08J7/046 ,  C08J7/18 ,  C09D7/47 ,  C09D7/61 ,  C09D7/70 ,  C08J2375/14 ,  C08J2400/22

摘要： One embodiment provides an anti-reflection film or the like that is a layered product having low surface reflectivity, excellent thermoformability, and, in particular, satisfactory abrasion resistance.
The anti-reflection film comprises:



a base material layer including a thermoplastic resin; and
a low-refractive-index layer that is arranged on at least one surface of the base material layer and that has a refractive index lower than the refractive index of the base material layer, wherein
the low-refractive-index layer includes a polymer of a resin material including:
a urethane (meth)acrylate derived from

(a1) an aromatic diisocyanate compound and
(a2) one or more (meth)acryloyl compounds having a hydroxyl group and a (meth)acryloyl group per molecule; and


a (meth)acrylate.

公开(公告)号：US20240228912A9

公开(公告)日：2024-07-11

申请号：US18278877

申请日：2022-03-04

申请人： MITSUBISHI GAS CHEMICAL COMPANY, INC.

发明人： Hiroaki TAKAKUWA ,  Akinobu HORITA ,  Takahiro KIKUNAGA

IPC分类号： C11D3/28 ,  C11D3/00 ,  C11D3/04 ,  C11D3/20 ,  C11D3/30 ,  C11D3/43

CPC分类号： C11D3/28 ,  C11D3/0073 ,  C11D3/044 ,  C11D3/2065 ,  C11D3/30 ,  C11D3/43 ,  C11D2111/22

摘要： A cleaning composition for semiconductor substrates, containing an alkaline compound (A), a corrosion inhibitor (B), and water, wherein the alkaline compound (A) is at least one selected from the group consisting of a quaternary ammonium hydroxide (A1) and potassium hydroxide (A2), and the corrosion inhibitor (B) is at least one selected from the group consisting of 4-substituted pyrazoles, potassium tris(1-pyrazolyl)borohydride, 2-(4-thiazolyl)benzimidazole, and halogenated-8-hydroxyquinolines.

公开(公告)号：US20240207250A1

公开(公告)日：2024-06-27

申请号：US18555822

申请日：2022-03-30

申请人： MITSUBISHI GAS CHEMICAL COMPANY, INC.

发明人： Syafiqah TSUJI ,  Kazuto IKEMOTO

IPC分类号： A61K31/4745 ,  A61P3/04

CPC分类号： A61K31/4745 ,  A61P3/04

摘要： The present invention provides an agent for promoting lipid reduction, containing IPO and/or a salt thereof as an active ingredient.

公开(公告)号：US12017433B2

公开(公告)日：2024-06-25

申请号：US17049754

申请日：2019-04-22

申请人： Mitsubishi Gas Chemical Company, Inc.

发明人： Takanori Miyabe ,  Takafumi Oda ,  Jin Nakamura ,  Masaki Yamanaka

IPC分类号： B32B27/34 ,  B32B27/08 ,  B32B27/36 ,  B29C49/06 ,  B29C49/22

CPC分类号： B32B27/08 ,  B32B27/34 ,  B32B27/36 ,  B29C49/06 ,  B29C49/22 ,  B32B2250/02 ,  B32B2250/24 ,  B32B2270/00 ,  B32B2307/412 ,  B32B2307/518 ,  B32B2307/546 ,  B32B2307/7244 ,  B32B2439/60

摘要： Provided is a multilayered article and a multilayered container having excellent delamination resistance while maintaining an excellent oxygen barrier property. The multilayered article includes a polyester resin layer and a barrier layer, wherein a polyamide resin contained in the barrier layer contains from 90 to 10 parts by mass of a polyamide resin (B) per 10 to 90 parts by mass of a polyamide resin (A). In the polyamide resin (A), 70 mol % or more of structural unit derived from a diamine is derived from xylylenediamine, and over 90 mol % of structural unit derived from a dicarboxylic acid is derived from adipic acid. In the polyamide resin (B), 70 mol % or more of structural unit derived from a diamine is derived from xylylenediamine, and of structural unit derived from a dicarboxylic acid, from 30 to 65 mol % is derived from an am-linear aliphatic dicarboxylic acid having from 4 to 20 carbons and from 70 to 35 mol % is derived from isophthalic acid.

公开(公告)号：US20240199528A1

公开(公告)日：2024-06-20

申请号：US18563031

申请日：2022-05-27

申请人： MITSUBISHI GAS CHEMICAL COMPANY, INC.

发明人： Umi YOKOBORI ,  Wataru HAMAJIMA ,  Atsushi OKAMOTO

IPC分类号： C07C69/73 ,  C11B9/00

CPC分类号： C07C69/73 ,  C11B9/0019

摘要： A fragrance composition contains a compound represented by Formula (1) below as an active ingredient: where, in Formula (1), R1 is a linear or branched olefinically unsaturated hydrocarbon group having from 2 to 4 carbons, and R2 is a linear, branched, or cyclic alkyl group having from 1 to 6 carbons.

公开(公告)号：US11999824B2

公开(公告)日：2024-06-04

申请号：US17271106

申请日：2019-08-21

申请人： MITSUBISHI GAS CHEMICAL COMPANY, INC.

发明人： Yousuke Imagawa ,  Hiroshi Horikoshi

IPC分类号： C08G75/06 ,  G02B1/04

CPC分类号： C08G75/06 ,  G02B1/041

摘要： The present application provides a composition for an optical material containing a compound (a) and/or a compound (b) and a compound (c) which are described below. The proportion of the compound (a) and/or the compound (b) is 0.001-30.0% by mass. The compound (a) is a compound represented by formula (1). The compound (b) is a compound represented by formula (2). The compound (c) is an episulfide compound.

公开(公告)号：US20240170278A1

公开(公告)日：2024-05-23

申请号：US18283083

申请日：2022-03-18

申请人： MITSUBISHI GAS CHEMICAL COMPANY, INC.

发明人： Toshiyuki OIE ,  Tomoyuki ADANIYA

IPC分类号： H01L21/02 ,  H01L21/306

CPC分类号： H01L21/02186 ,  H01L21/02233 ,  H01L21/02658 ,  H01L21/30604

摘要： Provided is a method for producing a semiconductor substrate for high-performance memory elements with high production efficiency.
The method for producing a semiconductor substrate for memory elements, comprising a step (1) of bringing a semiconductor substrate including a titanium-containing film that includes at least one of titanium and a titanium alloy, a metallic tungsten film, and a tungsten oxide film into contact with a pretreatment agent to remove at least a part of the tungsten oxide film; and a step (2) of bringing the semiconductor substrate after being subjected to the step (1) into contact with an etching agent to remove at least a part of the titanium-containing film, wherein the pretreatment agent includes at least one tungsten oxide etchant that is selected from the group consisting of acids, ammonia, and ammonium salts.