公开(公告)号：US20030190867A1

公开(公告)日：2003-10-09

申请号：US10405421

申请日：2003-04-01

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Manoocher Birang ,  Allan Gleason ,  William L. Guthrie

IPC分类号： B24B049/12

CPC分类号： B24B37/205 ,  B24B37/013 ,  B24B47/12 ,  B24B49/04 ,  B24B49/12 ,  B24B51/00 ,  B24D18/00 ,  G01B11/06 ,  G01B11/0683

摘要： The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

摘要翻译： 用于化学机械抛光装置的抛光垫及其制造方法。 抛光垫具有与抛光表面相邻的覆盖层和与压板相邻的背衬层。 具有第一横截面积的覆盖层中的第一开口和具有第二不同横截面积的背衬层中的第二开口形成穿过抛光垫的孔。 基本上透明的聚氨酯塞被定位在孔中，并且粘合剂材料将塞子固定在孔中。

公开(公告)号：US20030113085A1

公开(公告)日：2003-06-19

申请号：US10017033

申请日：2001-12-14

申请人： Applied Materials, Inc., a Delaware Corporation

发明人： Hichem M'Saad

IPC分类号： G02B006/10 ,  C03B037/018

CPC分类号： C23C16/401 ,  G02B6/132 ,  G02B2006/12097

摘要： An optical waveguide is formed on a substrate by first depositing an undercladding layer over the substrate. At least one core is formed over the undercladding layer. An uppercladding layer is then formed over the cores with a high-density plasma process. Deposition of the uppercladding layer may proceed by flowing an oxygen-containing gas, such as O2, a silicon-containing gas, such as SiH4, and a fluorine-containing gas, such as SiF4, into a process chamber to produce a gaseous mixture. A high-density plasma, i.e. having a density of at least 1011 ions/cm3, is generated from the gaseous mixture and then used to deposit a fluorinated silicate glass layer.

摘要翻译： 通过首先在衬底上沉积下封层，在衬底上形成光波导。 在下封层上形成至少一个芯。 然后用高密度等离子体工艺在芯上形成上层。 通过使诸如O 2的含氧气体，诸如SiH 4的含硅气体和诸如SiF 4的含氟气体流入处理室以产生气体混合物，可以进行上包层的沉积。 从气体混合物产生高密度等离子体，即具有至少1011个离子/ cm 3的密度，然后用于沉积氟化硅酸盐玻璃层。

公开(公告)号：US20030110808A1

公开(公告)日：2003-06-19

申请号：US10020461

申请日：2001-12-14

申请人： APPLIED MATERIALS INC., a Delaware corporation

发明人： Hichem M'Saad ,  Anchuan Wang

IPC分类号： C03B037/07

CPC分类号： C23C16/308 ,  C03C17/02 ,  G02B6/132 ,  G02B6/136 ,  G02B2006/12038 ,  G02B2006/1204 ,  G02B2006/12061 ,  G02B2006/12078 ,  G02B2006/12169

摘要： Embodiments of the present invention provide a highly uniform low cost production worthy solution for manufacturing low propagation loss optical waveguides on a substrate. The method comprises depositing an optical core using a high-density plasma deposition process. The method is particularly advantageous in forming high contrast refractive index optical cores, such as SiOxNy, with drastically reduced propagation loss. In one embodiment the high-density plasma deposition process is an HDP-CVD process. In another embodiment the high-density plasma deposition process is an HDP-ECR process. In one embodiment, a method of forming an optical waveguide comprises forming at least one optical core on an undercladding layer of a substrate using a high-density plasma deposition process.

摘要翻译： 本发明的实施例提供了用于在衬底上制造低传播损耗光波导的高度均匀的低成本生产有价值的解决方案。 该方法包括使用高密度等离子体沉积工艺沉积光学芯。 该方法特别有利于形成高对比度折射率光学芯，例如SiO x N y，具有显着降低的传播损耗。 在一个实施例中，高密度等离子体沉积工艺是HDP-CVD工艺。 在另一个实施例中，高密度等离子体沉积工艺是HDP-ECR工艺。 在一个实施例中，形成光波导的方法包括使用高密度等离子体沉积工艺在衬底的底层上形成至少一个光学芯。

公开(公告)号：US20030104761A1

公开(公告)日：2003-06-05

申请号：US10342653

申请日：2003-01-14

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Andreas Norbert Wiswesser ,  Walter Schoenleber ,  Boguslaw Swedek

IPC分类号： B24B049/00 ,  B24B051/00

CPC分类号： G01B11/06 ,  B24B37/04 ,  B24B49/12 ,  B24D7/12 ,  G01B9/02021 ,  G01B9/02027

摘要： The thickness of a layer on a substrate is measured in-situ during chemical mechanical polishing. A light beam is divided through a window in a polishing pad, and the motion of the polishing pad relative to the substrate causes the light beam to move in a path across the substrate surface. An interference signal produced by the light beam reflecting off the substrate is monitored, and a plurality of intensity measurements are extracted from the interference signal. Each intensity measurement corresponds to a sampling zone in the path across the substrate surface. A radial position is determined for each sampling zone, and the intensity measurements are divided into a plurality of radial ranges according to the radial positions. The layer thickness is computed for each radial range from the intensity measurements associated with that radial range.

公开(公告)号：US20030022609A1

公开(公告)日：2003-01-30

申请号：US10251302

申请日：2002-09-19

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Ilya Perlov ,  Eugene Gantvarg ,  Sen-Hou Ko

IPC分类号： B24B007/22

CPC分类号： B24B37/30 ,  B24B37/32 ,  B24B47/10 ,  B24B47/12 ,  B24B49/16

摘要： A carrier head with a flexible member connected to a base to define a first chamber, a second chamber and a third chamber. A lower surface of the flexible member provides a substrate receiving surface with an inner portion associated with the first chamber, a substantially annular middle portion surrounding the inner portion and associated with the second chamber, and a substantially annular outer portion surrounding the middle portion and associated with the third chamber. The width of the outer portion may be significantly less than the width of the middle portion. The carrier head may also include a flange connected to a drive shaft and a gimbal pivotally connecting the flange to the base.

公开(公告)号：US20020013058A1

公开(公告)日：2002-01-31

申请号：US09909766

申请日：2001-07-19

申请人： Applied materials, Inc., a Delaware corporation

发明人： Wallace T. Y. Tang

IPC分类号： H01L021/302

CPC分类号： B24B37/013 ,  B24B37/042 ,  G01B11/0683

摘要： A technique and apparatus is disclosed for the optical monitoring and measurement of a thin film (or small region on a surface) undergoing thickness and other changes while it is rotating. An optical signal is routed from the monitored area through the axis of rotation and decoupled from the monitored rotating area. The signal can then be analyzed to determine an endpoint to the planarization process. The invention utilizes interferometric and spectrophotometric optical measurement techniques for the in situ, real-time endpoint control of chemical-mechanical polishing planarization in the fabrication of semiconductor or various optical devices. The apparatus utilizes a bifurcated fiber optic cable to monitor changes on the surface of the thin film.

摘要翻译： 公开了用于在其旋转时经历厚度和其它变化的薄膜（或表面上的小区域）的光学监测和测量的技术和装置。 光信号从被监测区域通过旋转轴线路与被监视的旋转区域分离。 然后可以分析信号以确定平面化过程的端点。 本发明利用干涉测量和分光光度测量技术在半导体或各种光学器件的制造中进行化学机械抛光平面化的原位实时端点控制。 该装置利用分叉光纤电缆来监测薄膜表面的变化。

公开(公告)号：US20010036793A1

公开(公告)日：2001-11-01

申请号：US09874086

申请日：2001-06-04

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Andreas Norbert Wiswesser ,  Judon Tony Pan ,  Boguslaw Swedek

IPC分类号： B24B049/00

CPC分类号： B24B37/013 ,  B24B49/04 ,  B24B49/12 ,  G01B11/0683 ,  H01L21/3212

摘要： An apparatus, as well as a method, determines an endpoint of chemical mechanical polishing a metal layer on a substrate. The method of the apparatus includes bringing a surface of a substrate into contact with a polishing pad that has a window; causing relative motion between the substrate and the polishing pad; directing a light beam through the window, the motion of the polishing pad relative to the substrate causing the light beam to move in a path across the substrate; detecting light beam reflections from the substrate and a retaining ring; generating reflection data associated with the light beam reflections; dividing the reflection data into a plurality of radial ranges; and identifying the predetermined pattern from the reflection data in the plurality of radial ranges to establish the endpoint.

摘要翻译： 一种装置以及一种方法确定化学机械抛光衬底上的金属层的终点。 该装置的方法包括使基板的表面与具有窗口的抛光垫接触; 引起基板和抛光垫之间的相对运动; 将光束引导通过窗口，抛光垫相对于基底的运动导致光束在穿过基底的路径中移动; 检测来自基板和保持环的光束反射; 产生与光束反射相关联的反射数据; 将反射数据分割成多个径向范围; 以及根据所述多个径向范围内的反射数据识别所述预定图案以建立所述端点。

公开(公告)号：US20010001756A1

公开(公告)日：2001-05-24

申请号：US09729868

申请日：2000-12-04

申请人： Applied Materials, Inc. a Delaware Corporation

发明人： Sasson Somekh

IPC分类号： B24B007/22

CPC分类号： B24B37/245 ,  B24B37/013 ,  B24B37/042 ,  B24B37/205 ,  B24B49/12

摘要： In chemical mechanical polishing, a substrate is planarized with one or more fixed-abrasive polishing pads. Then the substrate is polished with a standard polishing pad to remove scratch defects created by the fixed-abrasive polishing pads.

摘要翻译： 在化学机械抛光中，用一个或多个固定研磨抛光垫将基底平坦化。 然后用标准抛光垫抛光衬底，以消除由固定研磨抛光垫产生的划痕缺陷。

公开(公告)号：US20040014395A1

公开(公告)日：2004-01-22

申请号：US10397633

申请日：2003-03-25

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Manoocher Birang ,  Nils Johansson ,  Allan Gleason

IPC分类号： B24B049/00 ,  B24B051/00 ,  B24B001/00

CPC分类号： B24B47/12 ,  B24B37/013 ,  B24B37/205 ,  B24B49/04 ,  B24B49/12 ,  B24B51/00 ,  G01B11/0683

摘要： An apparatus and method of chemical mechanical polishing (CMP) of a wafer employing a device for determining, in-situ, during the CMP process, an endpoint where the process is to be terminated. This device includes a laser interferometer capable of generating a laser beam directed towards the wafer and detecting light reflected from the wafer, and a window disposed adjacent to a hole formed through a platen. The window provides a pathway for the laser beam during at least part of the time the wafer overlies the window.

摘要翻译： 使用用于在CMP处理期间原地确定终止该过程的端点的装置的晶片的化学机械抛光（CMP）的装置和方法。 该装置包括能够产生朝向晶片的激光束并检测从晶片反射的光的激光干涉仪，以及邻近通过压板形成的孔布置的窗口。 该窗口在晶片覆盖窗口的至少部分时间内为激光束提供通路。

公开(公告)号：US20030181137A1

公开(公告)日：2003-09-25

申请号：US10394599

申请日：2003-03-21

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Fred C. Redeker ,  Manoocher Birang ,  Shijian Li ,  Sasson Somekh

IPC分类号： B24B049/00

CPC分类号： B24B37/005 ,  B24B21/04 ,  B24B49/04 ,  B24B49/12 ,  H01L21/30625

摘要： A polishing article for chemical mechanical polishing. The polishing article includes a generally elongated polishing sheet with a polishing surface. The polishing article is formed from a material that is substantially opaque, and has a discrete region extending substantially the length of the polishing sheet that is at least semi-transparent.

摘要翻译： 用于化学机械抛光的抛光制品。 抛光制品包括具有抛光表面的大致细长的抛光片。 抛光制品由基本上不透明的材料形成，并且具有基本上延伸至少半透明的抛光片的长度的离散区域。